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Proceedings of SPIE Volume 2337

Optical Characterization Techniques for High-Performance Microelectronic Device Manufacturing
Editor(s): Jagdish P. Mathur; John K. Lowell; Ray T. Chen
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Volume Details

Volume Number: 2337
Date Published: 14 September 1994
Softcover: 22 papers (210) pages
ISBN: 9780819416704

Table of Contents
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Monitoring metallic contamination in the ultra large scale integration (ULSI) era
Author(s): Norm Armour
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Surface charge effects in silicon wafer cleaning using surfactant-containing solutions
Author(s): Joong-Suck Jeon; Srini Raghavan; John K. Lowell; Valerie Wenner
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Single-photon ionization: laser optical probe technique for semiconductor growth
Author(s): Adina K. Kunz; April L. Alstrin; Sean M. Casey; Stephen R. Leone
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Computer-generated hologram (CGH) in optical computing and neural network
Author(s): Roger A. Lessard; Guylain Lemelin
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TDR-like low-frequency circuit test and characterization system for package and module interconnects utilizing transient thermal signals
Author(s): Robert H. Flake; D. B. Halstadt; Anthony Wong; Greg Pitner; Hosam Alhafez
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Low-cost laser scanning technique for CMOS latchup detection
Author(s): Donald L. Parker
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Optical profilometer featuring multiple virtual styli for the packaging and interconnect environment
Author(s): Royce Clark; Robert H. Flake; Asif Siddique
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Ex-situ and in-situ probing of Column IV interfaces using optical second harmonic generation
Author(s): Jerry I. Dadap; N. M. Russell; X. F. Hu; John G. Ekerdt; Michael C. Downer; Bruce Doris; John K. Lowell; Alain C. Diebold
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Display and analysis of 2D and 3D images obtained on semiconductor devices using a laser scanner
Author(s): George A. Stanciu; Catalin Miu; Sergiu Stejar
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Characterization of polycrystalline silicon grain boundary structures by optical second harmonic generation
Author(s): Chun Hu; Truc Q. Vu; Guann-pyng Li
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Investigation of stress/strain of silicon on insulator using optical second harmonic generation method
Author(s): Yifan Gu; Chun Hu; Li-Jen Cheng; De Yu Zang; Guann-pyng Li
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Photocurrent imaging of silicon wafers using electrolyte contacts
Author(s): Thomas Falter; Dietmar Hellmann; Peter Eichinger
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Optical investigations of thin hydrogenated carbon (C:H) films
Author(s): Valerie A. Ligachov; Anatolyi I. Popov; Sergei N. Stuokach
Practical, nondestructive method to profile near-surface and subsurface defects in semiconductor wafers
Author(s): Mark A. Nokes; Pamela Flesher; Peter Borden; Damon K. DeBusk; John K. Lowell; Dale E. Hill; Gary Allen
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New surface minority carrier lifetime measurement technique
Author(s): William Goldfarb
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Limitations of submicron holographic lithography
Author(s): Ray T. Chen
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Lifetime effects of iron and iron complexes in silicon
Author(s): Kamal K. Mishra; M. Banan; Jerry Moody; S. Chandrasekhar
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New approach to measuring oxide charge and mobile ion concentration
Author(s): Piotr Edelman; Andrew M. Hoff; Lubek Jastrzebski; Jacek J. Lagowski
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Passive optical detection of ion implantation processing
Author(s): Mohammed Anjum; Valerie Wenner; John K. Lowell
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Small-spot thin-film thickness-measurements with Brewster's angle reflectometer
Author(s): Duane C. Holmes; Rodney P. Johnson
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