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PROCEEDINGS VOLUME 2254

Photomask and X-Ray Mask Technology
Editor(s): Hideo Yoshihara
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Softcover $105.00 * $105.00 *

*Available as a black-and-white photocopy reprint only. Allow two weeks reprinting time plus standard delivery time. No discounts or returns apply.


Volume Details

Volume Number: 2254
Date Published: 3 November 1994
Softcover: 48 papers (496) pages
ISBN: 9780819415639

Table of Contents
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Ever-increasing role of mask technology in deep submicron lithography
Author(s): Fu-Chang Lo; Giang T. Dao; Marc Berube; Nelson Tam; Robert F. Hainsey; Jeff N. Farnsworth; Jim DeWitt; Rosanne LaVoy; Susan V. Daugherty
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Practical method of phase-shifting mask fabrication
Author(s): Morihisa Hoga; Yasuhiro Koizumi; Fumio Mizuno; H. Nakaune
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Masks for 0.25-um lithography
Author(s): Wilhelm Maurer; Donald J. Samuels
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New method of CD control for 64 Mbit-DRAM reticles
Author(s): Masahiro Uraguchi; Hideaki Hasegawa; Yuhichi Yamamoto; Hideyuki Kanemitsu; Eiichi Hoshino; Akira Morishige
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New novolak-based positive EB resist, EBR(reg.)-900 M-1
Author(s): Mutsuo Kataoka; S. Kanetsuki; Kazutaka Tamura; Kyoichi Yamamoto; M. Asano
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Attenuated phase-shift mask blanks with oxide or oxinitride of Cr or MoSi absorptive shifter
Author(s): Yoshihiro Saito; Susumu Kawada; Tsuneo Yamamoto; Atsushi Hayashi; Akihiko Isao; Yasuo Tokoro
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Attenuated phase-shifting photomasks fabricated from Cr-based embedded shifter blanks
Author(s): Franklin D. Kalk; Roger H. French; H. Ufuk Alpay; Greg P. Hughes
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Development of novel W/Si materials for the single-layered attenuated phase-shifting mask
Author(s): Hideaki Mitsui; Hideki Suda; Yoichi Yamaguchi; Kenji Matsumoto; Masaru Mitsui; S. Mitsui; Yasushi Okubo
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Large-area optical design rule checker for logic PSM application
Author(s): John L. Nistler; Chris A. Spence; Eytan Barouch; Uwe Hollerbach
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SR irradiation stability of x-ray mask
Author(s): Yoshio Yamashita; Hiroshi Okuyama; Kinya Ashikaga; Tomiyuki Arakawa
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Development of Si frame-mounting x-ray masks
Author(s): Hitoshi Noguchi; Meguru Kashida; Yoshihiro Kubota
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Printability of organic defects on an x-ray mask
Author(s): Yasunao Saitoh; Ikuo Okada; Misao Sekimoto; Takashi Ohkubo; Tadahito Matsuda
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Silicon shaping mask for electron-beam cell projection lithography
Author(s): Hidetoshi Satoh; Yoshinori Nakayama; Norio Saitou; T. Kagami
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Supporting 256-Mb and 1-Gb DRAM mask-making requirements with the Lepton EBES4 e-beam reticle generator
Author(s): C. M. Rose; Darryl Peters; Herbert A. Waggener; David M. Walker
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EB-X1: an accurate x-ray mask writer using a variable-shaped beam
Author(s): Nobuo Shimazu; Takashi Watanabe; Tetsuo Morosawa; Hirofumi Morita; Youichi Kuriyama; Tatsuya Kunioka
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Next generation mask coordinate measuring technology
Author(s): Taro Ototake; Masaya Iwasaki
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Focused ion beams for x-ray mask repair
Author(s): Diane K. Stewart; Thomas K. Olson; Andrew F. Doyle
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Development of 0.35-um generation reticles using advanced mask blanks
Author(s): Yoshiyuki Tanaka; M. Matsuda; Tsuyoshi Tanaka; Ryoichi Kobayashi
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Fabrication and pattern transfer of optical proximity correction (OPC) mask
Author(s): Emiko Sugiura; Hisashi Watanabe; Tadashi Imoriya; Yoshihiro Todokoro
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Possibility of real-time proximity effect correction for reticle writing
Author(s): Takayuki Abe
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Analysis of mask distortion induced by heating during e-beam writing
Author(s): Alberto Moel; Yoshio Gomei
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MEBES IV position accuracy improvement on the 5-inch mask
Author(s): Ki Jong Kim; Kun-Taek Park; Jung K. Oh; Hong S. Chun
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New mask optimization methodology using exposure-defocus and mask fabrication latitude
Author(s): Keisuke Tsudaka; Minoru Sugawara; Hiroichi Kawahira; Akihiro Ogura; Satoru Nozawa
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Poly(cyclohexyl 2-cyanoacrylate-co-ethoxyethyl 2-cyanoacrylate) as a positive-tone electron beam resist for phase-shift mask fabrication
Author(s): Akira Tamura; Masaji Yonezawa; Mitsuyoshi Sato; T. Okuyama
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Manufacturing of half-tone phase-shift masks I: blank
Author(s): Hiroshi Mohri; Keiji Hashimoto; T. Tominaga; Yasutaka Morikawa; Junji Fujikawa; Hiroyuki Inomata; Y. Iimura; Wataru Gotoh; Masahiro Takahashi; Hisatake Sano
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Manufacturing of half-tone phase-shift masks II: writing and process
Author(s): Hiroyuki Miyashita; Minoru Naitoh; Toshiharu Nishimura; T. Tomita; M. Katoh; Kazuo Suwa; Masa-aki Kurihara; N. Tarumoto; D. Tagaya; S. Ishikita; Hiroyuki Nakamura; Naoya Hayashi
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Manufacturing of half-tone phase-shift masks III: inspection, repair, and quality assurance
Author(s): Toshifumi Yokoyama; Y. Suzuki; K. Hanzawa; K. Oda; Katsuhide Tsuchiya; Shigeru Noguchi; Minoru Komada; Hisashi Moro-oka
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Development of practical attenuated phase-shifting mask
Author(s): Akihiro Ogura; Hiroichi Kawahira; Minoru Sugawara; Keisuke Tsudaka; Takehiko Gunji; Satoru Nozawa
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Topography effect in half-tone phase-shift mask for window formation
Author(s): Shinji Ishida; Yohko Iwabuchi; Tadao Yasuzato; Kunihiko Kasama
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Phase measurement system with transmitted UV light for phase-shifting mask inspection
Author(s): Haruhiko Kusunose; Hiroyuki Nakae; Junji Miyazaki; Nobuyuki Yoshioka; Hiroaki Morimoto; Keiichi Murayama; Katsuhiro Tsukamoto
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Fabrication of reliable x-ray mask using high-temperature deposited SiN membrane by low-pressure chemical vapor deposition system
Author(s): Tsuneaki Ohta; R. Kumar; Shuichi Noda; Masanori Kasai; Hiroshi Hoga
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Optical properties of polycrystalline -SiC membrane for x-ray mask
Author(s): Tsutomu Shoki; Yoichi Yamaguchi; Noromichi Annaka; Isao Amemiya
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X-ray mask distortion induced by final back-etching process
Author(s): Tadashi Matsuo; Nobuhiko Fukuhara; F. Noguchi; S. Tanaka
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X-ray mask for optical heterodyne alignment
Author(s): Masanori Suzuki; Mitsuo Fukuda; F. Omata; H. Tsuyuzaki; Takashi Ohkubo; Ikuo Okada
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Sub-halfmicron lithography mask metrology: matching of the optical and mask system
Author(s): Mircea V. Dusa; Erik H. Rauch
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Using the Leitz LMS 2000 for monitoring and improvement of an e-beam
Author(s): Carola Blaesing-Bangert; Klaus-Dieter Roeth; Yoichi Ogawa
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Advanced die-to-database reticle machine for 64-Mbit DRAMs
Author(s): Yair Eran; Gideon Rossman
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Application of conventional defect repair technique to phase-shifting masks
Author(s): Katsuhiro Takushima; Hideyuki Jinbo; Taro Saito; Itsuji Ashida; Yoshio Tanaka
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Ultra-clean fabrication techniques
Author(s): Carl Johnson; Abdu Boudour; Eric T. Chase
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Evolution of pellicles
Author(s): Naofumi Inoue; Hiroaki Nakagawa; Masahiro Kondou
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Development of the pellicle for KrF excimer laser photolithography
Author(s): Toru Shirasaki; S. Kawakami; Y. Hamada; Y. Nagata; Meguru Kashida; Yoshihiro Kubota
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Data preparation for CORE system in a MEBES environment
Author(s): Ming-Huei Lin
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Novel defect inspection method for the LSI mask pattern data
Author(s): Touru Miyauchi; Kenichi Kobayashi; Kazumasa Shigematsu
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Subresolution artifacts optimized for use with Canon's CQUEST illumination system, and their cost effective realization using the Lepton EBES4 e-beam reticle generator
Author(s): Charles S. Biechler; C. M. Rose; David M. Walker; Akiyoshi Suzuki; Kazuhiro Takahashi
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State-of-the-art material handler for the EBES4 e-beam reticle generator: key contributor to accuracy
Author(s): H. A. Khoury
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Soft-handed vacuum chuck
Author(s): Atsunobu Une; Masatoshi Oda; F. Omata; Akinori Shibayama
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Newly developed mask observation SEM JWS-7800
Author(s): Kazuhiro Honda; Hiroshi Shimada; S. Norioka; Tatsuya Matsuo
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MEBES(reg.) reticle writers for 350-nm and 250-nm design rules
Author(s): Frank E. Abboud; Robert J. Naber; Robert L. Dean; Charles A. Sauer
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