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Proceedings of SPIE Volume 2197

Optical/Laser Microlithography VII
Editor(s): Timothy A. Brunner
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Volume Details

Volume Number: 2197
Date Published: 17 May 1994
Softcover: 90 papers (1022) pages
ISBN: 9780819414922

Table of Contents
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Overlay and lens distortion in a modified illumination stepper
Author(s): Chul-Seung Lee; Jeong Soo Kim; Ikboum Hur; Young-Mog Ham; Soo-Han Choi; YeonSeon Seo; Scott M. Ashkenaz
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Zone-by-zone optimization of the dummy diffraction mask with auxiliary phase gratings
Author(s): Yong-Ho Oh; Byung-Sun Park; Hai Bin Chung; Sang-Soo Choi; Seong-Hak Choi; Hyung Joun Yoo; Sin-Chong Park
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Effective light source optimization with the modified beam for depth-of-focus enhancements
Author(s): Tohru Ogawa; Masaya Uematsu; Toshiyuki Ishimaru; Mitsumori Kimura; Toshiro Tsumori
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Optimization of modified illumination for 0.25-um resist patterning
Author(s): Keiichiro Tounai; Shuichi Hashimoto; Seiichi Shiraki; Kunihiko Kasama
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Characteristics of standing-wave effect of off-axis illumination depending on two different resist systems and the polarization effect of stepper
Author(s): Keeho Kim; Woo-Sung Han; Chul Hong Kim; Hoyoung Kang; Choon-Geun Park; Young-Bum Koh
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Quarter-micrometer i-line lithography using an alternating phase-shift mask
Author(s): Hung-Eil Kim; YoungSik Kim; Chul-Seung Lee; Young-Mog Ham; Dong-Jun Ahn; Soo-Han Choi
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Improvement of the focus exposure latitude using optimized illumination and mask design
Author(s): Rainer Pforr; Kurt G. Ronse; Patrick Jaenen; Rik M. Jonckheere; Luc Van den Hove; Peter van Oorschot; Paul Frank Luehrmann
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Optimization of the optical phase shift in attenuated phase-shifting masks and application to quarter-micrometer deep-UV lithography for logics
Author(s): Kurt G. Ronse; Rainer Pforr; Ki-Ho Baik; Rik M. Jonckheere; Luc Van den Hove
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Optimization of optical properties for single-layer halftone masks
Author(s): Shinichi Ito; Hiroaki Hazama; Takashi Kamo; Hideya Miyazaki; Hiroyuki Sato; Kenji Hayashi; Fumiaki Shigemitsu; Ichiro Mori
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Attenuated phase-shifting mask with a single-layer absorptive shifter of CrO, CrON, MoSiO, and MoSiON film
Author(s): Masayuki Nakajima; Nobuyuki Yoshioka; Junji Miyazaki; Haruhiko Kusunose; Kunihiro Hosono; Hiroaki Morimoto; Wataru Wakamiya; Keiichi Murayama; Yaichiro Watakabe; Katsuhiro Tsukamoto
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Phase-shifter edge effects on attenuated phase-shifting mask image quality
Author(s): Alfred K. K. Wong; Richard A. Ferguson; Andrew R. Neureuther
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Impact of attenuated mask topography on lithographic performance
Author(s): Richard A. Ferguson; William J. Adair; David S. O'Grady; Ronald M. Martino; Antoinette F. Molless; Brian J. Grenon; Alfred K. K. Wong; Lars W. Liebmann; Alessandro Callegari; Douglas C. LaTulipe; Donna M. Sprout; Christopher M. Seguin
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Overcoming global topography and improving lithographic performance using a transmittance controlled mask
Author(s): Woo-Sung Han; Chang-Jin Sohn; Hoyoung Kang; Young-Bum Koh; Moon-Yong Lee
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Combination of transmission and absorption mask for 0.3-um lithography
Author(s): Lothar Bauch; Joachim J. Bauer; Monika Boettcher; Ulrich A. Jagdhold; Ulrich Haak; Walter Spiess
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Effect of shifter edge angle and lens aberration on the pattern profile in the edge-line phase-shift method
Author(s): Mitsunori Nakatani; Hiroshi Matsuoka; Hirofumi Nakano; Kazuya Kamon; Kazuhiko Sato; Osamu Ishihara; Shigeru Mitsui
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Techniques for improving overlay on multilayer phase-shift masks
Author(s): Henry Chris Hamaker; Michael J. Bohan; Peter D. Buck; Claudia H. Geller; Takashi Makiyama; Francis P. Mathew; William S. Neeland
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Fabrication of phase-shifting masks employing multilayer films
Author(s): T. C. Chieu; Kwang Kuo Shih; Derek B. Dove
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Attenuating phase-shift mask by thermal oxidation of chrome
Author(s): David S. O'Grady; Phil B. Wilber
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Phase-shift mask issues for 193-nm lithography
Author(s): Bruce W. Smith; Suleyman Turgut
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Estimation of attenuated phase-shifting mask fabrication latitude using an optical exposure-defocus methodology
Author(s): Minoru Sugawara; Hiroichi Kawahira; Keisuke Tsudaka; Akihiro Ogura; Satoru Nozawa; Fumikatsu Uesawa; Hideo Shimizu
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Effects of transparent and transmission reduction reticle defects
Author(s): Larry S. Zurbrick; Steven J. Schuda; James N. Wiley
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Experimental study of phase-shifting mask defect detection using phase-shifting interferometry
Author(s): Yiping Xu; Donald K. Cohen; John M. O'Connor; Kuo-Ching Liu; Martin G. Cohen
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Fundamental analysis on fabrication of 256-MB DRAM using phase-shift mask technology
Author(s): Young-Mog Ham; YoungSik Kim; Ikboum Hur; Ki-Yeop Park; Hung-Eil Kim; Dong-Jun Ahn; Soo-Han Choi
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Comparison of phase-shift mask types for submicrometer contact hole definition
Author(s): Zheng Cui; Brian Martin; Philip D. Prewett; Steve Johnson; Philip Herman
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Exposure of a halftone mask by conventional and off-axis illumination
Author(s): Hye-Keun Oh; Jung-Woung Goo; Sug-Soon Yim; Tak-Hyun Yoon; Seung-Wook Park; Byoung Sub Nam; Hoyoung Kang; Cheol-Hong Kim; Woo-Sung Han
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Automated optical proximity correction: a rules-based approach
Author(s): Oberdan W. Otto; Joseph G. Garofalo; K. K. Low; Chi-Min Yuan; Richard C. Henderson; Christophe Pierrat; Robert L. Kostelak; Sheila Vaidya; P. K. Vasudev
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Fast proximity correction with zone sampling
Author(s): John P. Stirniman; Michael L. Rieger
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Automated determination of CAD layout failures through focus: experiment and simulation
Author(s): Chris A. Spence; John L. Nistler; Eytan Barouch; Uwe Hollerbach; Steven A. Orszag
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Phase-shifting masks: automated design and mask requirements
Author(s): Yagyensh C. Pati; Yao-Ting Wang; Jen-Wei Liang; Thomas Kailath
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Comparative study on optical proximity effect correction with various types of dummy patterns and its application to DRAM devices
Author(s): Chang-Jin Sohn; Woo-Sung Han; Hoyoung Kang; Young-Bum Koh; Moon-Yong Lee
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Investigation of proximity effects for a rim phase-shifting mask printed with annular illumination
Author(s): David M. Newmark; Eric Tomacruz; Sheila Vaidya; Andrew R. Neureuther
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Large-area phase-shift mask design
Author(s): Nicolas B. Cobb; Avideh Zakhor
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Correcting for proximity effect widens process latitude
Author(s): Richard C. Henderson; Oberdan W. Otto
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Using behavior modeling for proximity correction
Author(s): Michael L. Rieger; John P. Stirniman
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Systematic design of phase-shifting masks
Author(s): Yao-Ting Wang; Yagyensh C. Pati; Jen-Wei Liang; Thomas Kailath
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Comparison of I-line and deep-UV technologies for 0.35-um lithography
Author(s): Kevin J. Orvek; Joseph J. Ferrari; Sasha K. Dass; Daniel A. Corliss; James R. Buchanan; MaryAnn Piasecki
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Aerial image analysis of quarter-micrometer patterns on a 0.5-NA excimer stepper
Author(s): Ulrich C. Boettiger; Thomas Fischer; Andreas Grassmann; Holger Moritz
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Practical 0.35-um i-line lithography
Author(s): Paul Frank Luehrmann; Stefan Wittekoek; Steven G. Hansen
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Lithographic performance at sub-300-nm design rules using a high-NA I-line stepper with optimized NA and (sigma) in conjunction with advanced PSM technology
Author(s): Barton A. Katz; Richard Rogoff; James Foster; William T. Rericha; J. Brett Rolfson; Richard D. Holscher; Craig B. Sager; Patrick Reynolds
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Optimizing numerical aperture and partial coherence to reduce proximity effect in deep-UV lithography
Author(s): Raymond A. Cirelli; Eric L. Raab; Robert L. Kostelak; Sheila Vaidya
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Some image modeling issues for I-line, 5X phase-shifting masks
Author(s): Gregory L. Wojcik; John Mould; Richard A. Ferguson; Ronald M. Martino; K. K. Low
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Experimental verification of high-numerical-aperture effects in photoresist
Author(s): Donis G. Flagello; Tomas D. Milster
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Sample-3D benchmarks including high-NA and thin-film effects
Author(s): John Joseph Helmsen; Michael S. Yeung; Derek Lee; Andrew R. Neureuther
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Enhanced lumped parameter model for photolithography
Author(s): Chris A. Mack
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Programming of phase-shift mask simulation software and some important aspects
Author(s): Long Que; Guoliang Sun; Feng Boru
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Polarization and edge effects in photolithographic masks using three-dimensional rigorous simulation
Author(s): Alfred K. K. Wong; Andrew R. Neureuther
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New mask evaluation tool: the microlithography simulation microscope aerial image measurement system
Author(s): Russell A. Budd; Derek B. Dove; John L. Staples; H. Nasse; Wilhelm Ulrich
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Quantitative stepper metrology using the focus monitor test mask
Author(s): Timothy A. Brunner; Alexander Lee Martin; Ronald M. Martino; Christopher P. Ausschnitt; Thomas H. Newman; Michael S. Hibbs
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Analyzing deep-UV lens aberrations using aerial image and latent image metrologies
Author(s): Eric L. Raab; Christophe Pierrat; Charles H. Fields; Robert L. Kostelak; William G. Oldham; Sheila Vaidya
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Scattered light in photolithographic lenses
Author(s): Joseph P. Kirk
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Application of the aerial image measurement system (AIMS)TM to the analysis of binary mask imaging and resolution enhancement techniques
Author(s): Ronald M. Martino; Richard A. Ferguson; Russell A. Budd; John L. Staples; Lars W. Liebmann; Antoinette F. Molless; Derek B. Dove; J. Tracy Weed
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Aerial image measurements on a commercial stepper
Author(s): Charles H. Fields; William N. Partlo; William G. Oldham
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Application of subresolution phase-shift mask with G-line stepper for sub-half-micrometer gate GaAs circuits
Author(s): Yih-Cheng Shih; Joseph G. Garofalo
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Comprehensive evaluation of major phase-shift mask technologies for isolated gate structures in logic designs
Author(s): Lars W. Liebmann; Thomas H. Newman; Richard A. Ferguson; Ronald M. Martino; Antoinette F. Molless; Mark O. Neisser; J. Tracy Weed
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I-line photoresist evaluations for contact hole performance with attenuated phase-shift reticles
Author(s): William L. Krisa; Cesar M. Garza; Anthony Yen; Jing S. Shu
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Process optimization for 0.35-um i-line lithography
Author(s): Cesar M. Garza; William L. Krisa; Anthony Yen; Jing S. Shu
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Analysis of microlithography in an open-architecture TCAD system
Author(s): Valery Axelrad; Victor V. Boksha; Yuri Granik; Ognjen Milic; Juan C. Rey; D. Ward; Eduard I. Tochitsky
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Comparison of deep-UV reflection control methods for interconnect layers
Author(s): Joseph J. Ferrari; Sasha K. Dass
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Determining metal interconnect imaging capability
Author(s): Stuart E. Brown; Greg A. Goodwin; Wayne H. Ostrout
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Wide-field variable NA lens analysis for high-volume 0.5-um manufacturing
Author(s): Paul W. Ackmann; Stuart E. Brown; Richard D. Edwards
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SiOxNy:H, high-performance antireflective layer for current and future optical lithography
Author(s): Tohru Ogawa; Hiroyuki Nakano; Tetsuo Gocho; Toshiro Tsumori
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0.5-um deep-UV photolithography manufacturing
Author(s): Diana D. Dunn; Katherine C. Norris; Linda K. Somerville
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Optimized registration model for 2:1 stepper field matching
Author(s): Warren W. Flack; Gary E. Flores; Joseph C. Pellegrini; Mark Andrew Merrill
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Minimization of total overlay errors when matching nonconcentric exposure fields
Author(s): Moshe E. Preil; Terry M. Manchester; Anna Maria Minvielle; Robert J. Chung
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Reticle specific compensations to meet production overlay requirements for 64 MB and beyond
Author(s): Richard Rogoff; Syi-Sying Hong; Doug Schramm; Gregg D. Espin
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Substrate contamination effects in the processing of chemically amplified DUV photoresists
Author(s): John L. Sturtevant; Steven J. Holmes; Stephen E. Knight; Denis Poley; Paul A. Rabidoux; Linda K. Somerville; Thomas L. McDevitt; Anthony Stamper; Ed Valentine; Will Conley; Ahmad D. Katnani; James T. Fahey
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Interpreting cost of ownership for mix-and-match lithography
Author(s): Alan L. Levine; Albert S. Bergendahl
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Manufacturing engineering use of data management to analyze and control stepper performance in existing fabs and on stepper evaluations for new tools
Author(s): Paul W. Ackmann; Stuart E. Brown; Richard D. Edwards; Staci Oshelski
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Application of CVD antireflective-layer process for sub-half-micrometer devices
Author(s): Hideaki Mito; Yoshiyuki Tani; Yoshimitsu Okuda; Yoshihiro Todokoro; Toshiaki Tatsuta; Mikio Sawai; Osamu Tsujii
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Near-field nanofabrication with pipette-guided ArF excimer laser
Author(s): Michael Rudman; Anatoly Shchemelinin; Klony S. Lieberman; Aaron Lewis
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New phase-shifting method for high-resolution microlithography
Author(s): Motoi Kido; Gabor Szabo; Joseph R. Cavallaro; William L. Wilson; Frank K. Tittel
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Innovative image formation: coherency controlled imaging
Author(s): Koichi Matsumoto; Naomasa Shiraishi; Yuichiro Takeuchi; Shigeru Hirukawa
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Quarter-micrometer lithography system with oblique illumination and pupil filter
Author(s): Seiji Orii; Tetsuya Sekino; Masakatsu Ohta
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Multiple-exposure interferometric lithography
Author(s): Saleem H. Zaidi; Steven R. J. Brueck
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Small-field projection imaging system for deep-UV development
Author(s): Richard F. Hollman; David J. Elliott
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Optimizing distortion for a large-field submicrometer lens
Author(s): Shiow-Hwei Hwang; Bruce J. Ruff
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1:1 catadioptric deep-UV optics with a full-circle available field
Author(s): Yudong Zhang
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Recent advances of a KrF excimer laser on a plant's practical requirements
Author(s): Yukio Kobayashi; Takanobu Ishihara; Hiroaki Nakarai; Noritoshi Ito; Tomokazu Takahashi; Osamu Wakabayashi; Hakaru Mizoguchi; Yoshiho Amada; Junichi Fujimoto; Masahiko Kowaka; Yasuhiro Nozue
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High-repetition-rate lasers for advanced DUV exposure tools
Author(s): Ulrich Rebhan; Rainer Paetzel; Hermann Buecher; Michael W. Powell
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High-spectral-brightness operation of narrow-linewidth KrF laser for microlithography
Author(s): Alexander N. Novoselov; Boris A. Konstantinov; Victor G. Nikiforov; Boris F. Trinchuk
Micrascan II overlay error analysis
Author(s): David J. Cronin; Gregg M. Gallatin
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Deep-UV photolithography cluster performance
Author(s): Noreen Harned
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Simulations on step-and-scan optical lithography
Author(s): Joerg Bischoff; Wolfgang Henke; Jan van der Werf; Peter Dirksen
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Progression of overlay performance on a 0.5-NA broadband DUV wafer exposure system
Author(s): Joseph C. Vigil; Gerald B. Elder; David J. Cronin; Stan Drazkiewicz; Timothy J. Wiltshire
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Focusing and leveling based on wafer surface profile detection with interferometry for optical lithography
Author(s): Masahiro Watanabe; Yoshitada Oshida; Yasuhiko Nakayama; Minoru Yoshida; Ryuichi Funatsu; Akira Fujii; Taku Ninomiya
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Stepper stability improvement by a perfect self-calibration system
Author(s): Shinji Kuniyoshi; Susumu Komoriya; Koohei Sekiguchi; Takeshi Katoo
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Focusing and leveling system using position-sensitive detectors for the wafer steppers
Author(s): Dohoon Kim; Won-Ick Jang; Boo-Yeon Choi; Youngjik I. Lee; Jong-Hyun Lee; Hyung Joun Yoo; S. W. Kang; Jin Hyuk Kwon
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Metal layer resist process optimization by design of experiment
Author(s): Gwo-Yuh Shiau; Daniel Hao-Tien Lee; Hwang-Kuen Lin
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