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Proceedings of SPIE Volume 2091

Microelectronic Processes, Sensors, and Controls
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Volume Details

Volume Number: 2091
Date Published: 15 February 1994
Softcover: 41 papers (470) pages
ISBN: 9780819413628

Table of Contents
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Recent developments in RT-CVD technology for ULSI material processing and device fabrication: an overview
Author(s): G. W. Yoon; Jin-ha Kim; Unnikrishnan Sreenath; Dim-Lee Kwong
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Benchmarking of temperature measurement and control capability of commercially available rapid thermal processor (RTP) systems
Author(s): Ankineedu Velaga; Jim Brown; Donald W. Lindholm
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Application of RTA to a 0.8-um BiCMOS process
Author(s): Robert H. Reuss
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Comparison of rapid thermal processing and furnace processing for quarter-micrometer CMOS
Author(s): Badih El-Kareh; Ashwin Ghatalia; Mark D. Kellam; Philippe Maillot; Carlton M. Osburn; Xiaoqiang Zhang
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Characterization of rapid thermally grown dielectrics by surface charge analysis and atomic force microscopy
Author(s): John M. Grant; Lynn R. Allen
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Fabrication of sub-40-nm p-n junctions for 0.18-um MOS device applications using a cluster-tool-compatible, nanosecond thermal doping technique
Author(s): Kurt H. Weiner; Anthony M. McCarthy
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Manufacturing parameters of large-batch, small-batch, and single-wafer cluster tools for poly-gate applications
Author(s): Marinus A. van Driel
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Low-thermal-budget MOS gate stack formation using a cluster tool rapid-thermal-processing module
Author(s): A. M. Bayoumi; J. Montgomery; R. T. Kuehn; F. S. Johnson; John R. Hauser
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Application of a cluster tool for control of bipolar polysilicon emitter transistor characteristics
Author(s): Robert H. Reuss; Chris J. Werkhoven
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Dry patterning of resistive masks and topological structures
Author(s): Victor V. Boksha; Anatoly I. Sharendo; Vyjacheslav E. Obukhov; Eduard I. Tochitsky; A. V. Baranov
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Influence of adjustment accuracy on the image quality for laser cluster systems of microlithography
Author(s): Victor V. Boksha; Anatoly I. Sharendo; Vyjacheslav E. Obukhov; Eduard I. Tochitsky
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Ultrashallow p+-n junctions formed by diffusion from an RTCVD-deposited B:Ge layer
Author(s): Byung G. Park; Clifford A. King; David J. Eaglesham; T. W. Sorsch; B. Weir; H. S. Luftman; Jeffrey Bokor; Y. O. Kim
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Variable energy neutral beam design and kinetic energy etching
Author(s): Lee Chen
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Native oxide removal on Si surface by NF3-added hydrogen plasma downstream treatment
Author(s): Jun Kikuchi; Masao Iga; Shuzo Fujimura; Hiroshi Yano
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Sub-0.5-um polysilicon etching on a MERIE system: a case study in manufacturing
Author(s): Steve W. Swan; Graham W. Hills
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Magnetically enhanced reactive ion etching of silylated resist in O2/Ar mixtures
Author(s): Myung-Seon Kim; Jin-Woong Kim; Jun-mo Kim; Yeo-Song Seol; Hae-Sung Park; Soo-Han Choi
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Manufacturing integration of real-time laser interferometry to isotropically etch silicon oxide films for contacts and vias
Author(s): Jake Pope; Robert Woodburn; J. Watkins; Roger B. Lachenbruch; Gregory Viloria
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High-selectivity magnetically enhanced reactive ion etching of boron nitride films
Author(s): Donna R. Cote; Sonny Nguyen; David Dobuzinsky; Cathy Basa; Bernhard Neureither
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Optical emission spectroscopy on the GEC reference cell
Author(s): Melisa J. Buie; Jeremiah T.P. Pender; T. Vincent; J. Holloway; Mary L. Brake; Michael E. Elta
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Al-Cu alloy etching using in-reactor aluminum chloride formation in static magnetron triode reactive ion etching
Author(s): Masaaki Sato
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Reactive ion etching of Al alloy and silicon dioxide films in a rotating magnetic field
Author(s): Masafumi Tanabe; Akio Matsuda; Takeshi Sunada; Taro Nomura; Hideki Fujimoto; Toshio Hayashi
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Charge-buildup damage to gate oxide
Author(s): Calvin Gabriel
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Process modification to reduce damage to reactive ion etched surfaces
Author(s): Durga Misra; O. W. Purbo; C. R. Selvakumar
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High-density plasma etching: a gate oxide damage study
Author(s): Calvin Gabriel
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Modeling the properties of PECVD silicon dioxide films using neural networks
Author(s): Seung-Soo Han; Martin Ceiler; Sue Ann Bidstrup Allen; Paul A. Kohl; Gary Stephen May
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Characterization of organometallic polymers generated post-RIE/ECR etching followed by in-situ microwave ashing
Author(s): Debbie Switalski; Randy Solis
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Electrical sensors for monitoring rf plasma sheaths
Author(s): Mark A. Sobolewski; James K. Olthoff
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Rapid themal processing using in-situ wafer thermal expansion measurement for temperature control
Author(s): Bruce W. Peuse; Allan Rosekrans
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Emissivity compensated radiance-contrast-tracking pyrometry for semiconductor processing
Author(s): Michael E. Adel; Shmuel Mangan; Yaron Ish-Shalom
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Monitoring of submicrometer linewidths using diffraction gratings
Author(s): Phillip Chapados
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Use of an electrochemical sensor for controlling the etching of silicon dioxide films in aqueous HF processing baths
Author(s): Ronald A. Carpio; Suresh K. Bhat
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Real-time image analysis and control of the solid/liquid interface during zone-melting recrystallization of thin films
Author(s): Peter Y. Wong; Ioannis N. Miaoulis
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Practical use of an in-line vacuum metrology cluster in a minifactory environment
Author(s): Steven A. Henck; Phillip Chapados; Sonny Maung; Walter M. Duncan
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Run-to-run control framework for VLSI manufacturing
Author(s): James R. Moyne; Hossein Etemad; Michael E. Elta
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First-wafer effect on ellipsometer metrics and spatial etch pattern of polysilicon gate etch
Author(s): Stephanie Watts Butler; Jerry A. Stefani
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Software integration of in-situ spectroscopic ellipsometry
Author(s): Sonny Maung; Steven A. Henck; Walter M. Duncan; Doug Mahlum; Chyi Sheng
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On-line optimization of stop-etch time
Author(s): Songling Cao; R. Russell Rhinehart
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Generic operational models and factory control
Author(s): Margeret Pratt
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Real-time feedback control of reactive ion etching
Author(s): Michael E. Elta; J. P. Fournier; James S. Freudenberg; M. D. Giles; Jessy W. Grizzle; Pramod P. Khargonekar; Brian A. Rashap; Fred Lewis Terry; T. Vincent
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Empirical models in semiconductor processing: optimization and assessment as simulators
Author(s): Steve W. Lavelle; David Wood; A. J. Hydes
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Integrated system of optical sensors for plasma monitoring and plasma process control
Author(s): Harold M. Anderson; Michael P. Splichal
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