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Proceedings of SPIE Volume 1809

12th Annual BACUS Symposium on Photomask Technology and Management
Editor(s): Scott Landstrom; Richard LaFrance
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Softcover $105.00 * $105.00 *

*Available as a photocopy reprint only. Allow two weeks reprinting time plus standard delivery time. No discounts or returns apply.


Volume Details

Volume Number: 1809
Date Published: 26 March 1993
Softcover: 26 papers (296) pages
ISBN: 9780819410092

Table of Contents
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Performance testing and results of the first Etec CORE-2564
Author(s): C. Edward Franks; Asao Shikata; Catherine A. Baker
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Performance and perspective of the newly developed high-accuracy mask-making EB lithography system JBX-7000MV designed for 64M DRAM production
Author(s): Tadashi Komagata; Hitoshi Takemura; Nobou Goto; Ron Espeseth; Michael Hassel Shearer
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Performance data from the EBES4 high-speed reticle generator
Author(s): D. C. Fowlis; Darryl Peters; C. M. Rose; A. R. von Neida; Herbert A. Waggener; William P. Wilson
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Rational argument for the impracticability of 1x reticles
Author(s): Gerry Owen; Roger Fabian W. Pease; Nadim I. Maluf; Robert L. Hsieh; Jun Ye; C. Neil Berglund
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Primary processes in e-beam and laser lithographies for phase-shift mask manufacturing II
Author(s): Masa-aki Kurihara; Masumi Arai; Hiroshi Fujita; Hisashi Moro-oka; Yoichi Takahashi; Hisatake Sano
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Understanding CD error sources in optical mask processing
Author(s): Peter D. Buck
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Initial manufacturing performance of an actively controlled PBS resist development process
Author(s): Anthony E. Novembre; Regine G. Tarascon; Larry F. Thompson; Wallace T. Tang; C. Otis Tange; R. A. Bostic; D. H. Ahn
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Chrome dry-etching for photomask fabrication
Author(s): Warren W. Flack; Ken E. Tokunaga; Kenneth D. Edwards
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Implications of 64-MB reticle specifications on metrology tool requirements
Author(s): Bert F. Plambeck; Scott Landstrom; Barry Rockwell
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New approach for 5X reticle CD methodology
Author(s): An Tran; Christine K. Clevenger
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Coherence probe metrology for phase-shift masks: initial results
Author(s): Mark Allen Neil; Robert J. Monteverde; Stephen D. Kirkish
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Interferometer for phase measurements in phase-shift masks
Author(s): Derek B. Dove; T. C. Chieu; Amalkumar P. Ghosh
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Defect reduction methodologies: pellicle yield improvement
Author(s): Susan V. Daugherty
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Printability of particles on 5x reticles
Author(s): Robert W. Murphy; David S. Flesberg; Terrence W.O. Reilly; James A. Reynolds
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Point-of-use laser inspection
Author(s): Mimi L. Koehler
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Vector modeling of defects and defect repair for phase-shifting masks
Author(s): Kevin D. Lucas; Andrzej J. Strojwas
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Status and trends of laser mask-repair technologies
Author(s): James K. Tison; John M. O'Connor
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New role of high-sensitivity database inspection
Author(s): Rosanne LaVoy
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Status of x-ray mask inspection and repair
Author(s): Steven C. Nash; James P. Levin; O. De Hodgins
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Optimizing continuous improvement in the semiconductor industry
Author(s): Patrick Reilly
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Bottom-line empowerment: lessons from the firing line
Author(s): J. P. Miller
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Edge effects in phase-shifting masks for 0.25-um lithography
Author(s): Alfred K. K. Wong; Andrew R. Neureuther
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Simple method for rim shifter design: the biased self-aligned rim shifter
Author(s): Chris A. Mack
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Real and imaginary phase-shifting masks
Author(s): Franklin M. Schellenberg; David Levenson
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Application of laser scatterometry to characterize phase-shifting masks
Author(s): Susan M. Wilson; Gary A. Peterson; S. Sohail H. Naqvi; John Robert McNeil
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Alignment technique for second-level exposure of phase-shifting masks using 10-kV raster-scan electron-beam lithography system
Author(s): Frank E. Abboud; Jorge L. Freyer; Andrew J. Muray; Robert J. Naber; John T. Poreda; John R. Thomas
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