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PROCEEDINGS VOLUME 1674

Optical/Laser Microlithography V
Editor(s): John D. Cuthbert
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Volume Details

Volume Number: 1674
Date Published: 1 June 1992
Softcover: 69 papers (930) pages
ISBN: 9780819408297

Table of Contents
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Computer-aided design tool for phase-shifting masks
Author(s): David M. Newmark; Andrew R. Neureuther; Anton K. Pfau
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Systematic design of phase-shifting masks with extended depth of focus and/or shifted focus plane
Author(s): Yong Liu; Anton K. Pfau; Avideh Zakhor
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Conjugate twin-shifter masks with multiple focal planes
Author(s): Hiroshi Ohtsuka; Toshio Onodera; Kazuyuki Kuwahara; Takashi Taguchi
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Computer-aided optimal design of phase-shifting masks
Author(s): Chih-Yuan Chang; Charles D. Schaper; Thomas Kailath
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Exploring the limits of phase-shift lithography: Part I--the alternating shifter
Author(s): Shane R. Palmer; Cesar M. Garza; Craig B. Sager; Patrick Reynolds
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Subhalf-micron lithography system with phase-shifting effect
Author(s): Miyoko Noguchi; Masato Muraki; Yuichi Iwasaki; Akiyoshi Suzuki
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Advanced i-line resist performance with and without phase-shift masks
Author(s): Nicholas K. Eib; Eytan Barouch; Uwe Hollerbach; Steven A. Orszag
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Effect of condenser tilt on projection images produced by a phase-shifting mask
Author(s): Tsuneo Terasawa; Norio Hasegawa; Souichi Katagiri; Katsunobu Hama
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Characterization and performance of advanced i-line photoresists for 0.5-micron CMOS technology
Author(s): Jeffrey R. Johnson; Gregory J. Stagaman; John C. Sardella; Charles R. Spinner; Fu-Tai Liou
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Reduction of linewidth variation over reflective topography
Author(s): Steve S. Miura; Christopher F. Lyons; Timothy A. Brunner
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New process technology for CD control in deep-submicron optical lithography
Author(s): Aritoshi Sugimoto; Osamu Suga; Kazuyuki Suko; Hitoshi Arakawa
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Process solutions for the global proximity effect on submicron lithography
Author(s): Daniel Hao-Tien Lee; Ronfu Chu
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Two-dimensional high-resolution stepper image monitor
Author(s): Anton K. Pfau; Richard Hsu; William G. Oldham
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Polarization effects in mask transmission
Author(s): Alfred K. K. Wong; Andrew R. Neureuther
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Improving stepper alignment capability through phase-shifting techniques
Author(s): Mircea V. Dusa; Maciej W. Rudzinski
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Primary processes in e-beam and laser lithographies for phase-shift mask manufacturing
Author(s): Yoichi Takahashi; Hiroshi Fujita; Hisashi Moro-oka; Masa-aki Kurihara; Kazuo Suwa; Hisatake Sano
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Novel process for phase-shifting mask fabrication
Author(s): Haruhiko Kusunose; Satoshi Aoyama; Kunihiro Hosono; Susumu Takeuchi; Shuichi Matsuda; Maaike Op de Beeck; Nobuyuki Yoshioka; Yaichiro Watakabe
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Fabrication and evaluation of chromium/phase-shifter/quartz structure phase-shift mask
Author(s): Tadao Yasuzato; Haruo Iwasaki; Hiroshi Nozue; Kunihiko Kasama
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Optimization of positive novolak-based resists for phase-shift mask technology
Author(s): Peggy M. Spragg; Giang T. Dao; Steven G. Hansen; Robert F. Leonard; Medhat A. Toukhy; Rajeev R. Singh; Kenny K.H. Toh
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Phase and transmission error study for the alternating-element (Levenson) phase-shifting mask
Author(s): Ahmad D. Katnani; Burn Jeng Lin
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Understanding focus effects in submicron optical lithography: Part 3--methods for depth-of-focus improvement
Author(s): Chris A. Mack
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Using multiple focal planes to enhance depth of focus
Author(s): Chris A. Spence; Daniel C. Cole; Barbara Peck
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Efficient numerical simulation of high-NA i-line lithography processes
Author(s): Chi-Min Yuan; Steve S. Miura; Nicholas K. Eib
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Effect of chromatic aberration in excimer laser lithography
Author(s): Pei-yang Yan; Qi-De Qian; Joseph C. Langston; Paco Leon
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Deep-UV lithography for prototype 64-megabit DRAM fabrication
Author(s): Maureen A. Hanratty; Michael C. Tipton
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Fundamental differences between positive- and negative-tone imaging
Author(s): Chris A. Mack; James E. Connors
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Strategies for deep-UV patterning of half-micron contacts using negative photoresists
Author(s): Susan K. Jones; Elliott Sean Capsuto; Bruce W. Dudley; Satyendra S. Sethi; Charles R. Peters
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New antireflective layer for deep-UV lithography
Author(s): Yurika Suda; Takushi Motoyama; Hideki Harada; Masao Kanazawa
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Novel ARC optimization methodology for KrF excimer laser lithography at low K1 factor
Author(s): Tohru Ogawa; Mitsumori Kimura; Yoichi Tomo; Toshiro Tsumori
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Polarization studies with broadband deep-UV lithography
Author(s): Birol Kuyel; Eytan Barouch; Uwe Hollerbach; Steven A. Orszag
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Modeling spray/puddle dissolution processes for DUV acid-hardened resists
Author(s): John M. Hutchinson; Siddhartha Das; Qi-De Qian; Henry T. Gaw
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Chromeless phase mask by resist silylation
Author(s): Lothar Bauch; Joachim J. Bauer; Helge H. Dreger; Ulrich A. Jagdhold; B. Lauche; Georg G. Mehliss
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New method of topography simulation in photolithography
Author(s): Joerg Bischoff; Ulrich Glaubitz; Norbert Haase
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High-performance wafer stage: simplification delivers performance
Author(s): John F. Cameron; Jacqueline A. Seto; Lawrence A. Wise
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Characterization of mask fabrication for submicron geometries using a shaped vector electron-beam system
Author(s): Warren W. Flack; David H. Dameron; Richard A. Mann; Valerie J. Alameda
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Trend and limitation of process using the simulation and experimental method for phase-shift mask
Author(s): Young-Mog Ham; YoungSik Kim; H. K. Oh; Dong-Jun Ahn; K. S. Oh
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Advanced krypton fluoride excimer laser for microlithography
Author(s): Toshihiko Ishihara; Richard L. Sandstrom; Christopher Reiser; Uday K. Sengupta
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I-line, DUV, VUV, or x ray?
Author(s): Donald W. Johnson; Chris A. Mack
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Wavelength tuning for optimization of deep-UV excimer laser performance
Author(s): Susan K. Jones; Elliott Sean Capsuto; Bruce W. Dudley; Charles R. Peters; Gary C. Escher
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Alignment technique using wafer rear surface
Author(s): Souichi Katagiri; Shigeo Moriyama; Tsuneo Terasawa
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Lithographic impact of thin film effects on advanced BIMOS semiconductor device layer structures
Author(s): Fourmun Lee; Sandeep Malhotra; Victor Louis; John N. Helbert
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Practicing the top antireflector process
Author(s): Christopher F. Lyons; Robert K. Leidy; Gary B. Smith
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Narrow band KrF excimer laser for mass production of ULSI ICs
Author(s): Hakaru Mizoguchi; Osamu Wakabayashi; Noritoshi Ito; Masahiko Kowaka; Junichi Fujimoto; Yukio Kobayashi; Takanobu Ishihara; Yoshiho Amada; Yasuhiro Nozue
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Shape effects of edge-line phase shifter on light intensity contrast
Author(s): Mitsunori Nakatani; Hirofumi Nakano; Haruhiko Kusunose; Kazuya Kamon; Shuichi Matsuda; Yaichiro Watakabe; Hirozo Takano; Mutuyuki Otsubo
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Color centers photomasks produced by electron-beam lithography
Author(s): Raul Almeida Nunes; Sidnei Paciornik; Luiz C. Scavarda do Carmo
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Intermix technology: the key to optimal stepper productivity and cost efficiency
Author(s): Mark A. Perkins; Jonathan M. Stamp
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Planarization of spin-coated films
Author(s): Loni M. Peurrung; David B. Graves
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Gradient phase-shifter transitions fabricated by ion milling
Author(s): Anton K. Pfau; Edward W. Scheckler; David M. Newmark; Andrew R. Neureuther
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In-process image detection technique for determination of overlay and image quality for ASM-L wafer stepper
Author(s): Rainer Pforr; Stefan Wittekoek; Roland Van Den Bosch; Luc Van den Hove; Rik M. Jonckheere; Theo Fahner; Rolf Seltmann
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Lithographic alternatives to PSM repair
Author(s): Michael L. Rieger; Peter D. Buck; Mark Shaw
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Laser-induced damage in pellicles at 193 nm
Author(s): Mordechai Rothschild; Jan H. C. Sedlacek
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Novel laser microlithography system
Author(s): Guan-Qun Shen; Binchu Wu; Kangzhe Cai; Xuanshao Huang; Paiqi Cao
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Novel 0.2-μm i-line lithography using phase-shifting on the substrate
Author(s): Hiroki Tabuchi; Takayuki Taniguchi; Hiroyuki Moriwaki; Makoto Tanigawa; Keichiro Uda; Keizo Sakiyama
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Modeling of optical images in resists by vector potentials
Author(s): Hiroyoshi Tanabe
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Some problems in 1:1 broadband excimer laser lithography
Author(s): Haixing Zou; Yudong Zhang
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Design and performance of a production-worthy excimer-laser-based stepper
Author(s): ; Christopher Sparkes; Peter A. DiSessa; David J. Elliott
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Evaluation of high-numerical-aperture wide-field steppers for 0.35-micron design rules
Author(s): Barton A. Katz; James S. Greeneich; Richard Rogoff; Steve D. Slonaker; Stefan Wittekoek; Paul Frank Luehrmann; Martin A. van den Brink; Douglas R. Ritchie
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New imaging technique for 64M-DRAM
Author(s): Naomasa Shiraishi; Shigeru Hirukawa; Yuichiro Takeuchi; Nobutaka Magome
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Resolution improvement with annular illumination
Author(s): Keiichiro Tounai; Hiroyoshi Tanabe; Hiroshi Nozue; Kunihiko Kasama
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Small-field stepper for 193-nm lithography process development
Author(s): David C. Shaver; David M. Craig; C. A. Marchi; Mark A. Hartney; Francis N. Goodall
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Two-photon lithography for microelectronic application
Author(s): En-Shinn Wu; James H. Strickler; W. R. Harrell; Watt W. Webb
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Holographic mask-aligner
Author(s): Francis S. M. Clube; Simon Gray; Massoud Hamidi; Basil Arthur Omar; Denis Struchen; Jean-Claude Tisserand
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Rigorous and practical vector model for phase-shifting masks in optical lithography
Author(s): Kevin D. Lucas; Chi-Min Yuan; Andrzej J. Strojwas
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Resolution enhancement of stepper by complementary conjugate spatial filter
Author(s): Minori N. Noguchi; Yasuhiro Yoshitake; Yukio Kembo
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High-spectral-brightness 1.0-pm bandwidth DUV lithography excimer laser
Author(s): Peter Lokai; Ulrich Rebhan; Uwe Stamm; Hermann Buecher; Hans-Juergen Kahlert; Dirk Basting
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Evaluation of methods to reduce linewidth variation due to topography for i-line and deep-UV lithography
Author(s): Miles J. Gehm; Patrick Jaenen; Veerle Van Driessche; Anne-Marie Goethals; Nandasiri Samarakone; Luc Van den Hove; Bart Denturck
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Overview of lithography and process modeling: Part I--modeling of photonic processes (optical lithography, x-ray lithography, photoassisted chemical vapor deposition) (Invited Paper)
Author(s): Dmitrii R. Ilkayev; Tariel M. Makhviladze; Kamil A. Valiev
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New design of silicon organic materials and processes for microelectronics (Invited Paper)
Author(s): P. A. Averichkin; A. I. Maslakov; Kamil A. Valiev; Leonid V. Velikov
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Solid state laser for photolithography
Author(s): Nikolay Andreev; A. A. Babin; Nikita M. Bityurin; Guerman A. Pasmanik; Efim A. Khazanov; Felix I. Feldchtein
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