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Proceedings of SPIE Volume 1674

Optical/Laser Microlithography V
Editor(s): John D. Cuthbert
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Volume Details

Volume Number: 1674
Date Published: 1 June 1992
Softcover: 69 papers (930) pages
ISBN: 9780819408297

Table of Contents
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Conjugate twin-shifter masks with multiple focal planes
Author(s): Hiroshi Ohtsuka; Toshio Onodera; Kazuyuki Kuwahara; Takashi Taguchi
Subhalf-micron lithography system with phase-shifting effect
Author(s): Miyoko Noguchi; Masato Muraki; Yuichi Iwasaki; Akiyoshi Suzuki
Effect of condenser tilt on projection images produced by a phase-shifting mask
Author(s): Tsuneo Terasawa; Norio Hasegawa; Souichi Katagiri; Katsunobu Hama
Characterization and performance of advanced i-line photoresists for 0.5-micron CMOS technology
Author(s): Jeffrey R. Johnson; Gregory J. Stagaman; John C. Sardella; Charles R. Spinner; Fu-Tai Liou
Reduction of linewidth variation over reflective topography
Author(s): Steve S. Miura; Christopher F. Lyons; Timothy A. Brunner
Two-dimensional high-resolution stepper image monitor
Author(s): Anton K. Pfau; Richard Hsu; William G. Oldham
Primary processes in e-beam and laser lithographies for phase-shift mask manufacturing
Author(s): Yoichi Takahashi; Hiroshi Fujita; Hisashi Moro-oka; Masa-aki Kurihara; Kazuo Suwa; Hisatake Sano
Optimization of positive novolak-based resists for phase-shift mask technology
Author(s): Peggy M. Spragg; Giang T. Dao; Steven G. Hansen; Robert F. Leonard; Medhat A. Toukhy; Rajeev R. Singh; Kenny K.H. Toh
Deep-UV lithography for prototype 64-megabit DRAM fabrication
Author(s): Maureen A. Hanratty; Michael C. Tipton
New antireflective layer for deep-UV lithography
Author(s): Yurika Suda; Takushi Motoyama; Hideki Harada; Masao Kanazawa
Novel ARC optimization methodology for KrF excimer laser lithography at low K1 factor
Author(s): Tohru Ogawa; Mitsumori Kimura; Yoichi Tomo; Toshiro Tsumori
Polarization studies with broadband deep-UV lithography
Author(s): Birol Kuyel; Eytan Barouch; Uwe Hollerbach; Steven A. Orszag
Chromeless phase mask by resist silylation
Author(s): Lothar Bauch; Joachim J. Bauer; Helge H. Dreger; Ulrich A. Jagdhold; B. Lauche; Georg G. Mehliss
New method of topography simulation in photolithography
Author(s): Joerg Bischoff; Ulrich Glaubitz; Norbert Haase
High-performance wafer stage: simplification delivers performance
Author(s): John F. Cameron; Jacqueline A. Seto; Lawrence A. Wise
Alignment technique using wafer rear surface
Author(s): Souichi Katagiri; Shigeo Moriyama; Tsuneo Terasawa
Lithographic impact of thin film effects on advanced BIMOS semiconductor device layer structures
Author(s): Fourmun Lee; Sandeep Malhotra; Victor Louis; John N. Helbert
Practicing the top antireflector process
Author(s): Christopher F. Lyons; Robert K. Leidy; Gary B. Smith
Narrow band KrF excimer laser for mass production of ULSI ICs
Author(s): Hakaru Mizoguchi; Osamu Wakabayashi; Noritoshi Ito; Masahiko Kowaka; Junichi Fujimoto; Yukio Kobayashi; Takanobu Ishihara; Yoshiho Amada; Yasuhiro Nozue
Shape effects of edge-line phase shifter on light intensity contrast
Author(s): Mitsunori Nakatani; Hirofumi Nakano; Haruhiko Kusunose; Kazuya Kamon; Shuichi Matsuda; Yaichiro Watakabe; Hirozo Takano; Mutuyuki Otsubo
Color centers photomasks produced by electron-beam lithography
Author(s): Raul Almeida Nunes; Sidnei Paciornik; Luiz C. Scavarda do Carmo
Planarization of spin-coated films
Author(s): Loni M. Peurrung; David B. Graves
Gradient phase-shifter transitions fabricated by ion milling
Author(s): Anton K. Pfau; Edward W. Scheckler; David M. Newmark; Andrew R. Neureuther
Novel laser microlithography system
Author(s): Guan-Qun Shen; Binchu Wu; Kangzhe Cai; Xuanshao Huang; Paiqi Cao
Novel 0.2-um i-line lithography using phase-shifting on the substrate
Author(s): Hiroki Tabuchi; Takayuki Taniguchi; Hiroyuki Moriwaki; Makoto Tanigawa; Keichiro Uda; Keizo Sakiyama
Some problems in 1:1 broadband excimer laser lithography
Author(s): Haixing Zou; Yudong Zhang
Small-field stepper for 193-nm lithography process development
Author(s): David C. Shaver; David M. Craig; C. A. Marchi; Mark A. Hartney; Francis N. Goodall
Two-photon lithography for microelectronic application
Author(s): En-Shinn Wu; James H. Strickler; W. R. Harrell; Watt W. Webb
Holographic mask-aligner
Author(s): Francis S. M. Clube; Simon Gray; Massoud Hamidi; Basil Arthur Omar; Denis Struchen; Jean-Claude Tisserand
Resolution enhancement of stepper by complementary conjugate spatial filter
Author(s): Minori N. Noguchi; Yasuhiro Yoshitake; Yukio Kembo
High-spectral-brightness 1.0-pm bandwidth DUV lithography excimer laser
Author(s): Peter Lokai; Ulrich Rebhan; Uwe Stamm; Hermann Buecher; Hans-Juergen Kahlert; Dirk Basting
Evaluation of methods to reduce linewidth variation due to topography for i-line and deep-UV lithography
Author(s): Miles J. Gehm; Patrick Jaenen; Veerle Van Driessche; Anne-Marie Goethals; Nandasiri Samarakone; Luc Van den Hove; Bart Denturck
New design of silicon organic materials and processes for microelectronics (Invited Paper)
Author(s): P. A. Averichkin; A. I. Maslakov; Kamil A. Valiev; Leonid V. Velikov

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