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PROCEEDINGS VOLUME 1604

11th Annual BACUS Symposium on Photomask Technology
Editor(s): Kevin C. McGinnis
Format Member Price Non-Member Price
Softcover $105.00 * $105.00 *

*Available as a photocopy reprint only. Allow two weeks reprinting time plus standard delivery time. No discounts or returns apply.


Volume Details

Volume Number: 1604
Date Published: 1 January 1992
Softcover: 26 papers (356) pages
ISBN: 9780819407337

Table of Contents
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Automated critical dimension and registration communication
Author(s): Paul DePesa; Todd E. Pegelow
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Positional errors due to substrate charging in e-beam lithography tools
Author(s): Maris A. Sturans; Jacek G. Smolinski; Jeffrey A. Robinson
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Pattern generator specification for phase-shift 5X reticles
Author(s): Jacques Trotel
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Improved performance of a CORE-2100 through a joint development program
Author(s): Brett Schafman; Claudia H. Geller; C. Edward Franks
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Reflective masks for 1X deep ultraviolet lithography
Author(s): Robert L. Hsieh; Julienne Yu-Hey Lee; Nadim I. Maluf; Raymond Browning; Paul Jerabek; Roger Fabian W. Pease; Gerry Owen
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Advanced e-beam lithography system in producing high-quality reticle for 64M-DRAM
Author(s): Katsuhiro Kawasaki; Kazumitsu Nakamura; Takashi Matsuzaka; Hiroya Ohta; Norio Saitou; Toshihiko Kohno; Morihisa Hoga
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Comparison of reflective mask technologies for soft x-ray projection lithography
Author(s): Donald M. Tennant; John E. Bjorkholm; Ludwig Eichner; Richard R. Freeman; Tanya E. Jewell; Alastair A. MacDowell; J. Z. Pastalan; L. H. Szeto; Warren K. Waskiewicz; Donald L. White; David L. Windt; Obert R. Wood
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Printability of pellicle defects in DUV 0.5-um lithography
Author(s): Pei-yang Yan; Michael S. Yeung; Henry T. Gaw
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New look at incoming pellicle inspection
Author(s): Robert W. Murphy; James A. Reynolds
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Alternative to die-to-database mask inspection
Author(s): Parkson W Chen
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Next generation laser-based mask repair tool
Author(s): John M. O'Connor; Zbigniew M. Drozdowicz; James K. Tison
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Reticle defect sizing and printability
Author(s): Brian J. Grenon; Karen D. Badger; Michael J. Trybendis
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Zero-bias PBS process for 5X reticles
Author(s): Regine G. Tarascon-Auriol; Christophe Pierrat; Michael W. Stohl; Christopher P. Braun; James Burdorf; Sheila Vaidya
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Two-dimensional photomask standards calibration
Author(s): Wolfgang Haessler-Grohne; Hans-Helmut Paul
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Phase-shifting mask design tool
Author(s): David M. Newmark; Andrew R. Neureuther
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Issues associated with the commercialization of phase-shift masks
Author(s): John L. Nistler; Greg P. Hughes; Andrew J. Muray; James N. Wiley
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Optimization of real phase-mask performance
Author(s): Franklin M. Schellenberg; David Levenson; Phillip J. Brock
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Evaluation of practical properties of a spin-on-glass for a shifter of phase-shift masks
Author(s): Hiroyuki Miyashita; Koichi Mikami; Hisatake Sano
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Focusing on continuous improvement
Author(s): Ord Elliott
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Organizational dynamics and the pursuit of total quality
Author(s): Dennis M. Bradley
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Economic survival in the '90s
Author(s): James W. Giffin
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Continuous-slope phase-shift transition
Author(s): Anton K. Pfau; Edward W. Scheckler; David M. Newmark; Andrew R. Neureuther
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Specifying phase-shift mask image quality parameters
Author(s): Peter D. Buck; Michael L. Rieger
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Discriminating submicron lithography process variations with a white light confocal scanning optical microscope
Author(s): Frank S. Menagh; Guoqing Xiao; Mircea V. Dusa
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Evolution of the photomask industry
Author(s): A. Travis White
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