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Proceedings of SPIE Volume 1595

Rapid Thermal and Integrated Processing
Editor(s): Mehrdad M. Moslehi; Rajendra Singh; Dim-Lee Kwong
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Volume Details

Volume Number: 1595
Date Published: 1 February 1992
Softcover: 18 papers (218) pages
ISBN: 9780819407269

Table of Contents
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Modeling and control of rapid thermal processing
Author(s): Charles D. Schaper; Young Man Cho; Poogyeon Park; Stephen A. Norman; Paul Gyugyi; G. Hoffmann; S. Balemi; Stephen P. Boyd; Gregory Franklin; Thomas Kailath; Krishna C. Saraswat
Review of rapid thermal processing: system design and applications
Author(s): Xiao-Li Xu; Jim J. Wortman; Mehmet C. Ozturk; Furman Yates Sorrell
Influence of pyrometer signal absorption due to process gas on temperature control in rapid thermal processing
Author(s): Julius C. Chang; Tue Nguyen; James S. Nakos; Josef W. Korejwa
Application of modern quality improvement techniques to rapid thermal processing
Author(s): Joseph C. Davis; Ronald S. Gyurcsik; Jeng-Chang Lu; Richard H. Perkins
Wafer emissivity correction using dual-color pyrometry
Author(s): David Mordo; Yuval Wasserman; Arnon Gat
Improved wafer temperature measurements
Author(s): David W. Voorhes; Deirdre M. Hall
Uniformity characterization of rapid thermal processor thin films
Author(s): Charles B. Yarling; Dawn-Marie Cook
Damage and RTA kinetics in Ar+ and Si+ ion-implanted CZ silicon characterized by thermal wave modulated optical reflectance
Author(s): Sookap Hahn; Walter Lee Smith; Tohru Hara; H. Hagiwara; H. Suzuki; Yeong-Keun Kwon; Kwang-Il Kim; Y.-H. Bae; W. J. Chung; Charles B. Yarling; L. A. Larson; Richard Meinecke
RTP for advanced CMOS process integration
Author(s): Mehrdad M. Moslehi; John Kuehne; Lino Velo; David Yin; Dick Yeakley; Steve S.H. Huang; Rhett Barry Jucha; Terence Breedijk
Chemically modified ultrathin oxides fabricated by rapid thermal processing
Author(s): Atul B. Joshi; G. Q. Lo; J. Ahn; Windsor Ting; Dim-Lee Kwong

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