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Proceedings of SPIE Volume 1593

Dry Etch Technology
Editor(s): Deepak Ranadive
Format Member Price Non-Member Price
Softcover $105.00 * $105.00 *

*Available as a photocopy reprint only. Allow two weeks reprinting time plus standard delivery time. No discounts or returns apply.

Volume Details

Volume Number: 1593
Date Published: 1 February 1992
Softcover: 22 papers (230) pages
ISBN: 9780819407245

Table of Contents
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Evaluation of silicon surface damage induced by plasma radiation
Author(s): Masahiro Yoneda; K. Kawai; Hiroshi Miyatake; Nobuo Fujiwara; K. Nishioka; Haruhiko Abe
Wafer charging in different types of plasma etchers
Author(s): Takashi Namura; Hirofumi Uchida; Hiroyuki Okada; Atsushi Koshio; Satoshi Nakagawa; Yoshihiro Todokoro; Morio Inoue
In-situ auto ash: a key to reducing process-generated particles
Author(s): Zia Hasan; Joseph A. Maher; James E. Nulty; Larry Krynski
Surface contamination control during plasma etching
Author(s): Hiroshi Miyatake; K. Kawai; Nobuo Fujiwara; Masahiro Yoneda; K. Nishioka; Haruhiko Abe
Consideration on the resolution limit of the resist silylated process
Author(s): Keisuke Tanimoto; Hiroyuki Komeda; Daisuke Takehara; Ryohei Kawabata; Hikou Shibayama
Application-specific integrated processing for ULSI
Author(s): James E. Nulty; Joseph A. Maher
Etching of copper at high rates via generation of volatile copper species
Author(s): Kai-Ming Chi; Janos Farkas; Toivo T. Kodas; Mark J. Hampden-Smith
Mechanisms of silicon oxide etching in a highly polymerized fluorocarbon plasma
Author(s): Naokatsu Ikegami; Nobuo Ozawa; Yasuhiro Miyakawa; Jun Kanamori
Photochemical etching and oxidation of GaSb stimulated by pulsed UV laser irradiations
Author(s): Etienne J. Petit; Y. Caudano; A. Gouskov; Georges Bougnot
In-situ monitoring of GaAs MBE by low-energy ion scattering
Author(s): Minoru Kubo; Tadashi Narusawa
Studies of low-pressure helical resonator discharges for advanced etching
Author(s): Dale E. Ibbotson; Chorng Ping Chang
Protection of aluminum alloy films from after corrosion using H2O down stream ashing
Author(s): Fukashi Harada; T. Kondo; J. Konno; Shuzo Fujimura; K. Shinagawa; T. Takada

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