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PROCEEDINGS VOLUME 1496

10th Annual Symp on Microlithography
Editor(s): James N. Wiley
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Softcover $105.00 * $105.00 *

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Volume Details

Volume Number: 1496
Date Published: 1 March 1991
Softcover: 22 papers (322) pages
ISBN: 9780819406057

Table of Contents
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Competitiveness
Author(s): Charles E. Minihan
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What IS a phase-shifting mask?
Author(s): David Levenson
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Photomask fabrication utilizing a Philips/Cambridge vector scan e-beam system
Author(s): William C. McCutchen
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E-beam data compaction method for large-capacity mask ROM production
Author(s): Toyomi Kanemaru; Takashi Nakajima; Tadanao Igarashi; Rika Masuda; Nobuyuki Orita
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Performance appraisal of the ATEQ CORE-2500 in production
Author(s): Monica L. Mechtenberg; Larry J. Watson
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Proximity effect correction on MEBES for 1x mask fabrication: lithography issues and tradeoffs at 0.25 micron
Author(s): Andrew J. Muray; Robert L. Dean
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5X reticle fabrication using MEBES multiphase virtual address and AZ5206 resist
Author(s): Kathy S. Milner; Paul S. Chipman
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Continuous flow manufacturing
Author(s): George H. Bowers
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Sophisticated masks
Author(s): Roger Fabian W. Pease; Gerry Owen; Raymond Browning; Robert L. Hsieh; Julienne Yu-Hey Lee; Nadim I. Maluf; C. Neil Berglund
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EBES4: mask/reticle writer for the 90's
Author(s): George C. K. Chen
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Metamorphosis of laser writer
Author(s): Michael A.I. Wilson
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Chromeless phase-shifted masks: a new approach to phase-shifting masks
Author(s): Kenny K.H. Toh; Giang T. Dao; Rajeev R. Singh; Henry T. Gaw
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Phase-shifting and other challenges in optical mask technology
Author(s): Burn Jeng Lin
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Modeling phase-shifting masks
Author(s): Andrew R. Neureuther
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Capability assessment and comparison of the Nikon 2i, Nikon 3i, and IMS-2000 registration measurement devices
Author(s): Robert K. Henderson
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Improving submicron CD measurements through optimum operating points
Author(s): Mircea V. Dusa; Klaus-Dieter Roeth; Christoph Jung
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Application of a reduced area electrical test pattern to precise pattern registration measurements
Author(s): James P. Rominger
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Issues in the repair of x-ray masks
Author(s): Diane K. Stewart; John A. Doherty
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Evaluation of a high-resolution negative-acting electron-beam resist GMC for photomask manufacturing
Author(s): Wen-Chih Chen; Anthony E. Novembre
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Improvements in sensitivity and discrimination capability of the PD reticle/mask inspection system
Author(s): Juichi Saito; Yutaka Saijo
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Pelliclizing technology
Author(s): Takashi Yamauchi
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Hitachi e-beam lithography tools for advanced applications
Author(s): William V. Colbran
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