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Proceedings of SPIE Volume 1464

Integrated Circuit Metrology, Inspection, and Process Control V
Editor(s): William H. Arnold
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Volume Details

Volume Number: 1464
Date Published: 1 July 1991
Softcover: 55 papers (640) pages
ISBN: 9780819405630

Table of Contents
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Charging effects in low-voltage SEM metrology
Author(s): Kevin M. Monahan; Jozef P. H. Benschop; Tom A. Harris
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Monte Carlo modeling of secondary electron signals from heterogeneous specimens with nonplanar surfaces
Author(s): John C. Russ; Bruce W. Dudley; Susan K. Jones
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Figure of merit for calibration and comparison of linewidth measurement instruments
Author(s): Robert R. Hershey; Terrence E. Zavecz
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Application of transmission electron detection to x-ray mask calibrations and inspection
Author(s): Michael T. Postek; Robert D. Larrabee; William J. Keery; Egon Marx
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Linewidth measurement comparison between a photometric optical microscope and a scanning electron microscope backed with Monte Carlo trajectory computations
Author(s): John W. Nunn; Nicholas P. Turner
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High-speed stepper setup using a low-voltage SEM
Author(s): Jozef P. H. Benschop; Kevin M. Monahan; Tom A. Harris
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Electron-beam metrology: the European initiative
Author(s): James J. Jackman
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Cross-sectional imaging in SEM: signal formation mechanism and CD measurements
Author(s): Leon A. Firstein; Arthur Noz
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Extending electrical measurements to the 0.5 µm regime
Author(s): Patrick M. Troccolo; Lynda Clark Hannemann-Mantalas; Richard A. Allen; Loren W. Linholm
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0.50 µm contact measurement and characterization
Author(s): Tracy K. Lindsay; Kevin J. Orvek; Richard T. Mumaw
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Half-micrometer linewidth metrology
Author(s): Stephen E. Knight; Dean C. Humphrey; Reginald R. Bowley; Robert M. Cogley
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Optical metrology for integrated circuit fabrication
Author(s): Stanley S. C. Chim; Gordon S. Kino
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Pattern recognition approach to trench bottom-width measurement
Author(s): Ching-Hua Chou; John L. Berman; Stanley S. C. Chim; Timothy R. Piwonka-Corle; Guoqing Xiao; Gordon S. Kino
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Linearity of coherence probe metrology: simulation and experiment
Author(s): Mark P. Davidson; Kevin M. Monahan; Robert J. Monteverde
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Understanding metrology of polysilicon gates through reflectance measurements and simulation
Author(s): Karim H. Tadros; Andrew R. Neureuther; Roberto Guerrieri
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Numerical simulation of thick-linewidth measurements by reflected light
Author(s): Gregory L. Wojcik; John Mould; Robert J. Monteverde; Jerry Prochazka; John R. Frank
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Resist tracking: a lithographic diagnostic tool
Author(s): Clifford H. Takemoto; David H. Ziger; William Connor; Romelia G. Distasio
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Critical dimension control using development end point detection for wafers with multilayer structures
Author(s): Toshiyuki Hagi; Yoshimitsu Okuda; Tohru Ohkuma
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Optimal control of positive optical photoresist development
Author(s): Thomas A. Carroll; W. Fred Ramirez
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Photoresist dissolution rates: a comparison of puddle, spray, and immersion processes
Author(s): Stewart A. Robertson; J. Tom M. Stevenson; Robert J. Holwill; Mark Thirsk; Ivan S. Daraktchiev; Steven G. Hansen
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Use of diffracted light from latent images to improve lithography control
Author(s): Kirt C. Hickman; Susan M. Gaspar; Kenneth P. Bishop; S. Sohail H. Naqvi; John Robert McNeil; Gary D. Tipton; Brian R. Stallard; B. L. Draper
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"Golden standard" wafer design for optical stepper characterization
Author(s): Kevin G. Kemp; Charles Fredrick King; Wei Wu; Charles W. Stager
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Characterization of automatic overlay measurement technique for sub-half-micron devices
Author(s): Akira Kawai; Keiji Fujiwara; Kouichirou Tsujita; Hitoshi Nagata
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Experimental assessment of 150-mm P/P+ epitaxial silicon wafer flatness for deep-submicron applications
Author(s): Howard R. Huff; Harrison Weed
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Applications of latent image metrology in microlithography
Author(s): Thomas Evans Adams
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Phase-shift mask technology: requirements for e-beam mask lithography
Author(s): Steven K. Dunbrack; Andrew J. Muray; Charles A. Sauer; Richard L. Lozes; John L. Nistler; William H. Arnold; David F. Kyser; Anna Maria Minvielle; Moshe E. Preil; Bhanwar Singh; Michael K. Templeton
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New phase-shifting mask structure for positive resist process
Author(s): Junji Miyazaki; Kazuya Kamon; Nobuyuki Yoshioka; Shuichi Matsuda; Masato Fujinaga; Yaichiro Watakabe; Hitoshi Nagata
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Edge-profile, materials, and protective coating effects on image quality
Author(s): Takeshi Doi; Karim H. Tadros; Birol Kuyel; Andrew R. Neureuther
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Phase-shift mask pattern accuracy requirements and inspection technology
Author(s): James N. Wiley; Tao-Yi Fu; Takashi Tanaka; Susumu Takeuchi; Satoshi Aoyama; Junji Miyazaki; Yaichiro Watakabe
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Using the Atomic Force Microscope to measure submicron dimensions of integrated circuit devices and processes
Author(s): Mark R. Rodgers; Kevin M. Monahan
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Applications of an automated particle detection and identification system in VLSI wafer processing
Author(s): Takeshi Hattori; Sakuo Koyata
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Techniques for characterization of silicon penetration during DUV surface imaging
Author(s): Peter Freeman; John F. Bohland; Edward K. Pavelchek; Susan K. Jones; Bruce W. Dudley; Stephen M. Bobbio
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Semiconductor thin-film optical constant determination and thin-film thickness measurement equipment correlation
Author(s): Anne M. Kaiser
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Thickness measurement of combined a-Si and Ti films on c-Si using a monochromatic ellipsometer
Author(s): Chue-San Yoo; Jan C. Jans
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Statistical approach to optimizing advanced low-voltage SEM operation
Author(s): Peter J. Apostolakis
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Charging phenomena in e-beam metrology
Author(s): Dorron D. Levy; Karl L. Harris
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Metrology issues associated with submicron linewidths
Author(s): Khoi A. Phan; John L. Nistler; Bhanwar Singh
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Advanced confocal technique for submicron CD measurements
Author(s): Axel Rohde; Ralf Saffert; John Fitch
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Effect of operating points in submicron CD measurements
Author(s): Mircea V. Dusa; Christoph Jung; Paul Jung; Detlef Hogenkamp; Klaus-Dieter Roeth
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Computational model of the imaging process in scanning-x microscopy
Author(s): Harry S. Gallarda; Ramesh C. Jain
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Submicron linewidth measurement using an interferometric optical profiler
Author(s): Katherine Creath
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X-ray laminography analysis of ultra-fine-pitch solder connections on ultrathin boards
Author(s): John A. Adams
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Using an expert system to interface mainframe computing resources with an interactive video system
Author(s): Raymond Carey; Sheryl F. Wible; Wayne H. Gaynor; Timothy G. Hendry
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Adaptive control of photolithography
Author(s): Oscar D. Crisalle; Robert A. Soper; Duncan A. Mellichamp; Dale E. Seborg
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Effects of wafer cooling characteristics after post-exposure bake on critical dimensions
Author(s): Teresa L. Lauck; Masafumi Nomura; Tsutae Omori; Kazutoshi Yoshioka
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Wafer alignment based on existing microstructures
Author(s): Geert J. Wijntjes; Michael Hercher
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Characterization of wavelength offset for optimization of deep-UV stepper performance
Author(s): Susan K. Jones; Bruce W. Dudley; Charles R. Peters; Mark D. Kellam; Edward K. Pavelchek
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Optical polysilicon over oxide thickness measurement
Author(s): Anne M. Kaiser
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Measuring films on and below polycrystalline silicon using reflectometry
Author(s): Herbert L. Engstrom; Stanley E. Stokowski
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Surface roughness effects on light scattered by submicron particles on surfaces
Author(s): Edward J. Bawolek; E. Dan Hirleman
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In-line wafer inspection using 100-megapixel-per-second digital image processing technology
Author(s): Gary Dickerson; Rick P. Wallace
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Automated wafer inspection in the manufacturing line
Author(s): Jeanne E. Harrigan; Meryl D. Stoller
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Automated approach to the correlation of defect locations to electrical test results to determine yield reducing defects
Author(s): M. Michael Slama; Angela C. Patterson
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Semiwafer metrology project
Author(s): Marylyn Hoy Bennett; William Mark Hiatt; Laurie J. Lauchlan; Lynda Clark Hannemann-Mantalas; Hans Rottmann; Mark A. Seliger; Bhanwar Singh; Don E. Yansen
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Sequential experimentation strategy and response surface methodologies for photoresist process optimization
Author(s): Gary E. Flores; David H. Norbury
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