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PROCEEDINGS VOLUME 1463

Optical/Laser Microlithography IV
Editor(s): Victor Pol
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Volume Details

Volume Number: 1463
Date Published: 1 July 1991
Softcover: 65 papers (766) pages
ISBN: 9780819405623

Table of Contents
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Deep-UV photolithography linewidth variation from reflective substrates
Author(s): Diana D. Dunn; James A. Bruce; Michael S. Hibbs
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Improving the performance and usability of a wet-developable DUV resist for sub-500nm lithography
Author(s): Nandasiri Samarakone; Veerle Van Driessche; Patrick Jaenen; Luc Van den Hove; Douglas R. Ritchie; Paul Frank Luehrmann
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Use of antireflective coatings in deep-UV lithography
Author(s): Satyendra S. Sethi; Romelia G. Distasio; David H. Ziger; James E. Lamb; Tony D. Flaim
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Optimum numerical aperture for optical projection microlithography
Author(s): Burn Jeng Lin
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Process enhancement for a new generation g-line photolithographic system
Author(s): Wayne H. Ostrout; William Mark Hiatt; Alan E. Kozlowski
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Optical lithography with chromeless phase-shifted masks
Author(s): Kenny K.H. Toh; Giang T. Dao; Rajeev R. Singh; Henry T. Gaw
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Fabrication of grooved-glass substrates by phase-mask lithography
Author(s): Phillip J. Brock; David Levenson; James M. Zavislan; James R. Lyerla; John C. Cheng; Carl V. Podlogar
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Conjugate twin-shifter for the new phase-shift method to high-resolution lithography
Author(s): Hiroshi Ohtsuka; Kazutoshi Abe; Toshio Onodera; Kazuyuki Kuwahara; Takeshi Taguchi
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Exploration of fabrication techniques for phase-shifting masks
Author(s): Anton K. Pfau; William G. Oldham; Andrew R. Neureuther
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Phase-shifting structures for isolated features
Author(s): Joseph G. Garofalo; Robert L. Kostelak; Tungsheng Yang
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Impact of phase masks on deep-UV lithography
Author(s): Harry Sewell
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Improvement of focus and exposure latitude by the use of phase-shifting masks for DUV applications
Author(s): Maaike Op de Beeck; Akira Tokui; Masato Fujinaga; Nobuyuki Yoshioka; Kazuya Kamon; Tetsuro Hanawa; Katsuhiro Tsukamoto
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Variable phase-shift mask for deep-submicron optical lithography
Author(s): Tsuneo Terasawa; Norio Hasegawa; Akira Imai; Toshihiko P. Tanaka; Souichi Katagiri
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Phase-shifting photolithography applicable to real IC patterns
Author(s): Yuichiro Yanagishita; Naoyuki Ishiwata; Yasuko Tabata; Kenji Nakagawa; Kazumasa Shigematsu
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Study of the relationship between exposure margin and photolithographic process latitude and mask linearity
Author(s): Steven G. Hansen; Giang T. Dao; Henry T. Gaw; Qi-De Qian; Peggy M. Spragg; Rodney J. Hurditch
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Investigation of interlevel proximity effects case of the gate level over LOCOS
Author(s): Gilles Festes; Jean-Paul E. Chollet
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64-Mbit DRAM production with i-line stepper
Author(s): Hisatsugu Shirai; Katsuyoshi Kobayashi; Kenji Nakagawa
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Two-layer 1.2-micron pitch multilevel metal demonstrator using resist patterning by surface imaging and dry development
Author(s): Brian Martin; Ian M. Snowden; Simon H. Mortimer
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Astigmatism and field curvature from pin-bars
Author(s): Joseph P. Kirk
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Laser alignment modeling using rigorous numerical simulations
Author(s): Gregory L. Wojcik; David K. Vaughan; John Mould; Francisco A. Leon; Qi-De Qian; Michael A. Lutz
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New alignment sensors for wafer stepper
Author(s): Kazuya Ota; Nobutaka Magome; Kenji Nishi
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Experimental and simulation studies of alignment marks
Author(s): Alfred K. K. Wong; Takeshi Doi; Diana D. Dunn; Andrew R. Neureuther
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Computer simulation of 0.5-micrometer lithography for a 16-megabit DRAM
Author(s): John G. Maltabes; Katherine C. Norris; Dean Writer
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Simulation of an advanced negative i-line photoresist
Author(s): Eytan Barouch; Uwe Hollerbach; Steven A. Orszag; Mary Tedd Allen; Gary S. Calabrese
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Simulation analysis of deep-UV chemically amplified resist
Author(s): Takeshi Ohfuji; Masanobu Soenosawa; Hiroshi Nozue; Kunihiko Kasama
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Three-dimensional simulation of optical lithography
Author(s): Kenny K.H. Toh; Andrew R. Neureuther
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Effects of higher order aberrations on the process window
Author(s): Joseph E. Gortych; David M. Williamson
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Binary and phase-shifting image design for optical lithography
Author(s): Yong Liu; Avideh Zakhor
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Investigation of self-aligned phase-shifting reticles by simulation techniques
Author(s): Christoph Noelscher; Leonhard Mader
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Design methodology for dark-field phase-shifted masks
Author(s): Kenny K.H. Toh; Giang T. Dao; Henry T. Gaw; Andrew R. Neureuther; Larry R. Fredrickson
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Origins of asymmetry in spin-cast films over topography
Author(s): Loni M. Manske; David B. Graves
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Fabrication of phase-shifting mask
Author(s): Naoyuki Ishiwata; Takao Furukawa
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Improvements in 0.5-micron production wafer steppers
Author(s): Paul Frank Luehrmann; Chris G. M. de Mol; Frits J. van Hout; Richard A. George; Harrie B. van der Putten
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Optimization of partial coherence for half-micron i-line lithography
Author(s): Paolo Canestrari; Giorgio A. L. M. Degiorgis; Paolo De Natale; Lucia Gazzaruso; Giovanni Rivera
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Excimer laser photolithography with a 1:1 broadband catadioptric optics
Author(s): Yudong Zhang; Dunwu Lu; Haixing Zou; ZhiJiang Wang
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Simulations of bar printing over a MOSFET device using i-line and deep-UV resists
Author(s): Eytan Barouch; Uwe Hollerbach; Steven A. Orszag; Charles R. Szmanda; James W. Thackeray
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Phase-shift mask applications
Author(s): Peter D. Buck; Michael L. Rieger
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Overlay and matching strategy for large-area lithography
Author(s): David S. Holbrook; J. Casey Donaher
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Reduction of the standing wave effect in positive photoresist using an antireflection coating
Author(s): Ranjana Mehrotra; Bhvanesh P. Mathur; Sunil Sharan
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Evaluation of a photoresist process for 0.75-micron g-line lithography
Author(s): Jack S. Kasahara; Mircea V. Dusa; Thiloma Perera
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Control of proximity effects on CD uniformity through the use of process parameters derived from a statistically designed experiment
Author(s): Lorna D.H. Christensen; Ken L. Bell
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I-line lithography for highly reproducible fabrication of surface acoustic wave devices
Author(s): Stefan Berek; Ulrich Knauer; Helmut Zottl
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Process optimization: a case study on the application of Taguchi methods in optical lithography
Author(s): Khalil I. Arshak; Eamonn Murphy; Arousian Arshak
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Primary research for mechanism of forming PLH
Author(s): Lurong Guo; Xiao-Chun Zhang; Yongkang Guo
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Disk-shaped VUV+O source used as resist asher and resist developer
Author(s): Shuzo Hattori; George J. Collins; Zenqi Yu; Dai Sugimoto; Masahiro Saita
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Results of photolithographic cluster cells in actual production
Author(s): Sandra Clifford; Bruce L. Hayes; Richard Brade
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Photoresist bake conditions and their effects on lithography process control
Author(s): David H. Norbury; John C. Love
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Deep-UV diagnostics using continuous tone photoresist
Author(s): Joseph P. Kirk; Michael S. Hibbs
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Comparison of 248-nm line narrowing resonator optics for deep-UV lithography lasers
Author(s): Hans-Juergen Kahlert; Ulrich Rebhan; Peter Lokai; Dirk Basting
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Argon fluoride excimer laser source for sub-0.25 mm optical lithography
Author(s): Richard L. Sandstrom
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High-average-power narrow-band KrF excimer laser
Author(s): Osamu Wakabayashi; Masahiko Kowaka; Yukio Kobayashi
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0.5-micron deep-UV lithography using a Micrascan-90 step-and-scan exposure tool
Author(s): Birol Kuyel; Mark William Barrick; Alex Hong; Joseph C. Vigil
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Novel high-resolution large-field scan-and-repeat projection lithography system
Author(s): Kanti Jain
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Multispot scanning exposure system for excimer laser stepper
Author(s): Yasuhiro Yoshitake; Yoshitada Oshida; Tetsuzou Tanimoto; Minoru Tanaka; Minoru Yoshida
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New family of 1:1 catadioptric broadband deep-UV high-Na lithography lenses
Author(s): Yudong Zhang; Haixing Zou; ZhiJiang Wang
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New i-line lens for half-micron lithography
Author(s): Kazuhiro Takahashi; Masakatsu Ohta; Toshiyuki Kojima; Miyoko Noguchi
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New 0.54 aperture i-line wafer stepper with field-by-field leveling combined with global alignment
Author(s): Martin A. van den Brink; Barton A. Katz; Stefan Wittekoek
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New i-line and deep-UV optical wafer stepper
Author(s): ; Peter A. DiSessa
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Selected performance parameters and functional principles of a new stepper generation
Author(s): Karl-Heinz Kliem; Volker Sczepanski; Uwe Michl; Reiner Hesse
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Highly accurate pattern generation using acousto-optical deflection
Author(s): Torbjoern Sandstrom; James K. Tison
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Focus considerations with high-numerical-aperture widefield lenses
Author(s): David H. Leebrick
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Poly(bis-alkylthio-acetylen): a dual-mode laser-sensitive material
Author(s): Reinhard R. Baumann; Joachim Bargon; Hans-Klaus Roth
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Transparent phase-shifting mask with multistage phase shifter and comb-shaped shifter
Author(s): Hisashi Watanabe; Yoshihiro Todokoro; Yoshihiko Hirai; Morio Inoue
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Al203 etch-stop layer for a phase-shifting mask
Author(s): Isamu Hanyu; Mitsuji Nunokawa; Satoru Asai; Masayuki Abe
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Is phase-shift mask technology production-worthy?
Author(s): Mung Chen
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