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PROCEEDINGS VOLUME 1393

Rapid Thermal and Related Processing Techniques
Editor(s): Rajendra Singh; Mehrdad M. Moslehi
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Volume Details

Volume Number: 1393
Date Published: 1 April 1991
Softcover: 34 papers (432) pages
ISBN: 9780819404626

Table of Contents
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Economic impact of single-wafer multiprocessors
Author(s): Samuel C. Wood; Krishna C. Saraswat; J. Michael Harrison
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Multichamber rapid thermal processing
Author(s): Paul J. Rosser; P. Moynagh; Kevin B. Affolter
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Rapid thermal processing in the manufacturing technology of contacts to InP-based photonic devices
Author(s): Avishay Katz
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Integrated rapid isothermal processing
Author(s): Rajendra Singh; Sanjai Sinha; Randhir P. S. Thakur; N. J. Hsu
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Low-temperature in-situ dry cleaning process for epitaxial layer multiprocessing
Author(s): Mehrdad M. Moslehi
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Single-wafer integrated processing as a manufacturing tool using rapid thermal chemical vapor deposition technology
Author(s): Ahmad Kermani
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Performance and reliability of ultrathin reoxidized nitrided oxides fabricated by rapid thermal processing
Author(s): Atul B. Joshi; G. Q. Lo; Dennis Ku Shih; Dim-Lee Kwong
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High-temperature degradation-free rapid thermal annealing of GaAs and InP
Author(s): Stephen J. Pearton; Avishay Katz; Michael Geva
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Rapid thermal annealing of the through-Ta5Si3 film implantation on GaAs
Author(s): Fon-Shan Huang; W. S. Chen; Tzu-min Hsu
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Anomalous diffusion phenomena in two-step rapid thermal diffusion of phosphorus
Author(s): Byung-Jin Cho; Choong-Ki Kim
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Investigation of rapid thermal process-induced defects in ion-implanted Czochralski silicon
Author(s): Charles B. Yarling; Sookap Hahn; David T. Hodul; Hisaaki Suga; Walter Lee Smith
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Rapid thermal processing induced defects and gettering effects in silicon
Author(s): Bouchaib BH Hartiti; Jean-Claude Muller; Paul Siffert; Thuong-Quat Vu
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RTP-induced defects in silicon studied by positron annihilation technique
Author(s): N. M. Kulkarni; Revati N. Kulkarni; Arvind D. Shaligram
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Multiple photo-assisted CVD of thin-film materials for III-V device technology
Author(s): Yves I. Nissim; Jean Marie Moison; Francoise Houzay; F. Lebland; C. Licoppe; M. Bensoussan
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Low-resistivity contacts to silicon using selective RTCVD of germanium
Author(s): D. T. Grider; Mehmet C. Ozturk; Jim J. Wortman; Michael A. Littlejohn; Y. Zhong
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Si-based epitaxial growth by rapid thermal processing chemical vapor deposition
Author(s): Kissoo H. Jung; T. Y. Hsieh; Dim-Lee Kwong; D. B. Spratt
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Control of oxygen incorporation and lifetime measurement in Si1-xGex epitaxial films grown by rapid thermal chemical vapor deposition
Author(s): James C. Sturm; P. V. Schwartz; Erwin J. Prinz; Charles W. Magee
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Selective deposition of polycrystalline SixGe1-x by rapid thermal processing
Author(s): Mehmet C. Ozturk; Y. Zhong; D. T. Grider; M. Sanganeria; Jim J. Wortman; Michael A. Littlejohn
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Noninvasive sensors for in-situ process monitoring and control in advanced microelectronics manufacturing
Author(s): Mehrdad M. Moslehi
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Systems-oriented survey of noncontact temperature measurement techniques for rapid thermal processing
Author(s): David Peyton; Hiroyuki Kinoshita; G. Q. Lo; Dim-Lee Kwong
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Fundamental mechanisms and doping effects in silicon infrared absorption for temperature measurement by infrared transmission
Author(s): James C. Sturm; Casper M. Reaves
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Emissivity of silicon wafers during rapid thermal processing
Author(s): Peter Vandenabeele; Karen Maex
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Pyrometer modeling for rapid thermal processing
Author(s): Samuel C. Wood; Pushkar P. Apte; Tsu-Jae King; Mehrdad M. Moslehi; Krishna C. Saraswat
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In-situ interferometric measurements in a rapid thermal processor
Author(s): Jean-Marie R. Dilhac; Christian Ganibal; N. Nolhier; L. Amat
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RTP temperature uniformity mapping
Author(s): W. Andrew Keenan; Walter H. Johnson; David T. Hodul; David Mordo
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Noncontacting acoustics-based temperature measurement techniques in rapid thermal processing
Author(s): Yong Jin Lee; Ching-Hua Chou; Butrus T. Khuri-Yakub; Krishna C. Saraswat
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Round-robin comparison of temperature nonuniformity during RTP due to patterned layers
Author(s): Peter Vandenabeele; Karen Maex
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Adaptive process control for a rapid thermal processor
Author(s): Jean-Marie R. Dilhac; Christian Ganibal; J. Bordeneuve; B. Dahhou; L. Amat; Antoni Picard
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Analysis of temperature distribution and slip in rapid thermal processing
Author(s): Hyouk Lee; Young-Don Yoo; Hyun-Dong Shin; Youn Young Earmme; Choong-Ki Kim
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Uniformity characterization of rapid thermal processor thin films
Author(s): Charles B. Yarling; Dawn-Marie Cook
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High-dose boron implantation and RTP anneal of polysilicon films for shallow junction diffusion sources and interconnects
Author(s): Bruha Raicu; W. Andrew Keenan; Michael I. Current; David Mordo; Roger Brennan
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Epitaxial regrowth of silicon on sapphire by rapid isothermal processing
Author(s): R. Madarazo; A. G. Pedrine; Allison A. S. Sol; Vitor Baranauskas
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