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Proceedings of SPIE Volume 1264

Optical/Laser Microlithography III
Editor(s): Victor Pol
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Volume Details

Volume Number: 1264
Date Published: 1 June 1990
Softcover: 49 papers (342) pages
ISBN: 9780819403117

Table of Contents
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Assessment of high-contrast G- and I-line resists using high-numerical-aperture exposure tools
Author(s): Alois Gutmann; Johann Binder; Guenther Czech; Juergen Karl; Leonhard Mader; Daniel Sarlette; Wolfgang Henke
Deep-ultraviolet lithography for 500-nm devices
Author(s): Steven J. Holmes; Ruth Levy; Albert S. Bergendahl; Karey L. Holland; John G. Maltabes; Stephen E. Knight; Katherine C. Norris; Denis Poley
High-numerical-aperture I-line stepper
Author(s): Barton A. Katz; James S. Greeneich; Mark G. Bigelow; Ann Katz; Frits J. van Hout; Jos F. Coolsen
Dry etching for high-resolution maskmaking
Author(s): Serge V. Tedesco; Christophe Pierrat; Jean Michel Lamure; C. Sourd; Jean-Luc Martin; Jean Charles Guibert
New phase-shifting mask with highly transparent SiO2 phase shifters
Author(s): Isamu Hanyu; Satoru Asai; Kinjiro Kosemura; Hiroshi Ito; Mitsuji Nunokawa; Masayuki Abe
Heterodyne holographic nanometer alignment for a half-micron wafer stepper
Author(s): Kazuhiro Yamashita; Noboru Nomura; Keiji Kubo; Yuichirou Yamada; Masaki Suzuki
Chip leveling and focusing with laser interferometry
Author(s): Yoshitada Oshida; Minoru Tanaka; Tetsuzou Tanimoto; Toshiei Kurosaki
0.10-um overlay for DRAM production using step and scan
Author(s): Harry Sewell; Scott J. Smith; Daniel N. Galburt
Comprehensive 3-D notching simulator with nonplanar substrates
Author(s): Eytan Barouch; Brian D. Bradie; Uwe Hollerbach; George Karniadakis; Steven A. Orszag
Evaluation of resists using ArF excimer laser projection lithography
Author(s): Masaru Sasago; Yoshiyuki Tani; Masayuki Endo; Noboru Nomura
Effect of central obscuration on image formation in projection lithography
Author(s): Steven T. Yang; Robert L. Hsieh; Y.-H. Lee; Roger Fabian W. Pease; Gerry Owen
Advances in deep-UV lithography
Author(s): Setha G. Olson; Christopher Sparkes
High-repetition-rate KrF lithography excimer laser with narrow bandwidth below 2 pm
Author(s): Peter Lokai; Ulrich Rebhan; Peter Oesterlin; Hans-Juergen Kahlert; Dirk Basting
Deep-UV wafer stepper with through-the-lens wafer to reticle alignment
Author(s): Stefan Wittekoek; Martin A. van den Brink; Henk F.D. Linders; Judon M. D. Stoeldraijer; J. W.D. Martens; Douglas R. Ritchie
Design and performance of a production-oriented deep-UV wafer stepper
Author(s): Richard F. Hollman; Frederick Cleveland; Elvino M. Da Silveira; Roger W. McCleary; Robert W. Strauten
Reduction lens and illumination system for deep-UV aligners
Author(s): Juergen W. Liegel; Gerhard P. Ittner; Erhard Glatzel; Johannes Wangler
Characterization methods for excimer exposure of deep-UV pellicles
Author(s): William N. Partlo; William G. Oldham
Direct writing on structured substrate by pyrolytic laser deposition
Author(s): Janos Farkas; Andras Hamori; Zsolt Szabo
New indexes of the 0.5-um resolution resist for optical lithography
Author(s): Aritoshi Sugimoto; Tetsuo Ito; Sadao Okano; Masahiro Nozaki; Takeshi Kato; Kazuyuki Suko; Masayasu Tsunematsu; Kazuya Kadota
Image-height offset in TTL on-axis alignment method
Author(s): Noriaki Ishio; Keiji Fujiwara; Hitoshi Nagata
High-power and narrow-band excimer laser with a polarization-coupled resonator
Author(s): Nobuaki Furuya; Takuhiro Ono; Naoya Horiuchi; Keiichiro Yamanaka; Takeo Miyata
Simulation and experimental results in O.6-um lithography using an I-line stepper
Author(s): Joachim J. Bauer; Wolfgang Mehr; Ulrich Glaubitz; H. Baborski; Norbert Haase; Jens-Ullrich Mueller
Recent advances in prepellicle mask cleaning
Author(s): Bert F. Plambeck; Mark D. Cerio; James A. Reynolds
Plasma etching of chrome masks using PBS resist
Author(s): Guido Bell; H. Spierer

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