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PROCEEDINGS VOLUME 10961 • new

Optical Microlithography XXXII
Editor(s): Jongwook Kye; Soichi Owa
For the purchase of this volume in printed format, please visit Proceedings.com

Volume Details

Volume Number: 10961
Date Published: 17 June 2019

Table of Contents
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Front Matter: Volume 10961
Author(s): Proceedings of SPIE
Software in semiconductor manufacturing: peripeteias and prospects (Conference Presentation)
Author(s): Yuri Granik
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Automatic correction of lithography hotspots with a deep generative model
Author(s): Woojoo Sim; Kibok Lee; Dingdong Yang; Jaeseung Jeong; Ji-Suk Hong; Sooryong Lee; Honglak Lee
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Predictable etch model using machine learning
Author(s): Youngchang Kim; Sunwook Jung; DooHwan Kwak; Vlad Liubich; Germain Fenger
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Investigation on MBOPC convergence improvement with location-dependent correction factors aided by machine learning
Author(s): Sheng-Wei Chien; Jia-Syun Cai; Chien-Lin Lee; Kuen-Yu Tsai; James Shiely; Matt St. John
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Pairing wafer leveling metrology from a lithographic apparatus with deep learning to enable cost effective dense wafer alignment metrology
Author(s): Emil Schmitt-Weaver; Kaustuve Bhattacharyya
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Improved wafer alignment model algorithm for better on-product overlay
Author(s): Ik-Hyun Jeong; Hyun-Sok Kim; Yeong-Oh Kong; Ji-Hyun Song; Jae-Wuk Ju; Young-Sik Kim; Cees Lambregts; Miao Yu; Rizvi Rahman; Leendertjan Karssemeijer; Elliott McNamara; Paul Böcker; Jong-Cheol Choi; Nang-Lyeom Oh; Kang-San Lee; Jin-Seo Lee
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Efficient search of layout hotspot patterns for matching SEM images using multilevel pixelation
Author(s): Sean Shang-En Tseng; Wei-Chun Chang; Iris Hui-Ru Jiang; Jun Zhu; James P. Shiely
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Analytical solutions for the deformation of a photoresist film
Author(s): Yuri Granik
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Physical and compact modeling of resist deformation (Conference Presentation)
Author(s): Gurdaman Khaira; Yuri Granik; Kostas Adam; Germain Fenger
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Compact modeling of negative tone development resist with photo decomposable quencher
Author(s): Ao Chen; Kar Kit Koh; Yee Mei Foong; Bradley Morgenfeld; Jun Chen; Sandra Lee; Xi Chen; Hesham Omar; Mu Feng; ChangAn Wang; Keith Gronlund; Jun Lang; James Guerrero; Yiqiong Zhao
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Improved validation and optimization of physics-based NTD compact modeling flows
Author(s): Folarin Latinwo; Delian Yang; Cheng-En (Rich) Wu; Peter Brooker; Yulu Chen; Hua Song; Kevin Lucas
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Thin film characterization for advanced patterning
Author(s): Zhimin Zhu; Xianggui Ye; Sean Simmons; Catherine Frank; Tim Limmer; James Lamb
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A study on stepper's performance enhancements
Author(s): Ken-Ichiro Mori; Atsushi Shigenobu; Junichi Motojima; Hiromi Suda
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Quantifying global and local CD variation for an advanced 3D NAND layer (Conference Presentation)
Author(s): Will Conley; Yaobin Feng; Zhiyang Song; Moran Guo; Jun He; Longxia Guo; Gang Xu; Simon Hsieh; James Bonafede; Stephen Hsu; Austin Peng; Jun Wei Lu; Victor Peng; Beeri Nativ; Fei Jia; Herman Nicolai; Ijen van Mil
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Holistic feedforward control for the 5 nm logic node and beyond
Author(s): Henry Megens; Ralph Brinkhof; Igor Aarts; Haico Kok; Leendertjan Karssemeijer; Gijs ten Haaf; Shawn Lee; Daan Slotboom; Chris de Ruiter; Irina Lyulina; Simon Huisman; Stefan Keij; Evert Mos; Wim Tel; Manouk Rijpstra; Emil Schmitt-Weaver; Kaustuve Bhattacharyya; Robert Socha; Boris Menchtchikov; Michael Kubis; Jan Mulkens
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Next generation ArF lightsource "T65A" for cutting-edge immersion lithography providing both high in productivity and performance (Conference Presentation)
Author(s): Tommy Oga; Taku Yamazaki; Takeshi Ohta; Hiroaki Tsushima; Satoru Bushida
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Automatic parameter setting for lens aberration control during product lot exposure
Author(s): Yutaka Kanakutsu; Yukio Koizumi; Hironori Ikezawa; Shigeru Eto; Junji Ikeda; Takenori Takeuchi; Tomoyuki Matsuyama; Edward Stan; Ronald Hiltunen
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Metrology and deep learning integrated solution to drive OPC model accuracy improvement
Author(s): Wei Yuan; Yifei Lu; Yuhang Zhao; Shoumian Chen; Ming Li; Hongmei Hu; Shuxin Yao; Zhunhua Liu; Qiaoqiao Li; Yu Tian; Zhiquan Zhou; Lirong Gu; Jinze Wang; Xichen Sheng; Guanyong Yan; Yazhong Zheng; Yueliang Yao; Yanjun Xiao; Liang Liu; Qian Zhao; Mu Feng; Jun Chen; Jun Lang
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Optimal feature vector design for computational lithography
Author(s): Xuelong Shi; YuHang Zhao; Shoumian Cheng; Ming Li; Wei Yuan; Leon Yao; Wenhao Zhao; Yanjun Xiao; Xiaohui Kang; Angmar Li
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SRAF rule extraction and insertion based on inverse lithography technology
Author(s): Xiaojing Su; Pengzheng Gao; Yayi Wei; Weijie Shi
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Localized source and mask optimization with narrow-band level-set method
Author(s): Yijiang Shen
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An OPC approach to improve logic gate features corner fidelity
Author(s): Ping-Hung Lin; Tzu-Chi Chao; Shin-Shing Yeh; Yung-Ching Mai; Lawrence Lin; Nelson Lai
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A programmable UVLED array with a collimated optics as transform lens as light field adjustable source
Author(s): Jiun-Woei Huang
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Modeling of dynamic image performance for lithographic projection lens
Author(s): Zhiyong Yang; Yating Shi; Hao Jiang; Shiyuan Liu
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Extremely long life excimer laser chamber technology for multi-patterning lithography
Author(s): Hiroaki Tsushima; Yousuke Fujimaki; Yasuaki Kiyota; Makoto Tanaka; Takashi Itou; Takeshi Asayama; Akihiko Kurosu; Satoshi Tanaka; Takeshi Ohta; Satoru Bushida; Takashi Saitou; Hakaru Mizoguchi
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Robust alignment mark design for DRAM using a holistic computational approach
Author(s): Danying Li; Stella Zhang; Chia-Huang Chen; Youping Zhang; Alex Huang; David Xu; Yufeng Wang; Zhen Shi; Shi-lu Wang; Sheng-Tsung Tsao; Angmar Li; Andy Yang; Junwei Lu
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Improvement of spectrum measurement accuracy by high resolution spectrometer for DUV laser
Author(s): Masakazu Hattori; Sophia Hu; Takehito Kudo; Toshihiri Oga; Hakaru Mizoguchi
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