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PROCEEDINGS VOLUME 10960 • new

Advances in Patterning Materials and Processes XXXVI
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Volume Details

Volume Number: 10960
Date Published: 17 June 2019

Table of Contents
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Front Matter: Volume 10960
Author(s): Proceedings of SPIE
Metal-containing resists for EUV lithography (Conference Presentation)
Author(s): Robert L. Brainard
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Increased regulatory scrutiny of photolithography chemistries: the need for science and innovation (Conference Presentation)
Author(s): Brooke Tvermoes; David Speed
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Model studies on the metal salt sensitization of chemically amplified photoresists (Conference Presentation)
Author(s): Gregory M. Wallraff; Hoa D. Truong; Martha I. Sanchez; Noel Arellno; Alexander M. Friz; Wyatt Thornley; Oleg Kostko; Dan S. Slaughter; Frank Ogletree
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Model reactivity of inorganic and organometallic materials in EUV (Conference Presentation)
Author(s): Wyatt Thornley; Hoa D. Truong; Martha I. Sanchez; Daniel P. Sanders; Gregory M. Wallraff; Oleg Kostko; D. Frank Ogletree; Daniel S. Slaughter
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Then a miracle occurs: A description of the issues of EUV radiolysis process and the relationship to stochastic print failures (Conference Presentation)
Author(s): John S. Petersen
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Measuring extreme-ultraviolet secondary electron blur (Conference Presentation)
Author(s): Steven Grzeskowiak; Robert L. Brainard; Gregory H. Denbeaux
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Multiscale approach for modeling EUV patterning of chemically amplified resist
Author(s): Hyungwoo Lee; Muyoung Kim; Junghwan Moon; Sungwoo Park; Byunghoon Lee; Changyoung Jeong; Maenghyo Cho
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The hidden energy tail of low energy electrons in EUV lithography
Author(s): Roberto Fallica; Seyed Javid Rezvani; Stefano Nannarone; Sergei Borisov; Danilo De Simone; Sergey Babin; Gian Lorusso; Geert Vandenberghe
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PSCAR optimization to reduce EUV resist roughness with sensitization using Resist Formulation Optimizer (RFO)
Author(s): Seiji Nagahara; Cong Que Dinh; Gosuke Shiraishi; Yuya Kamei; Kathleen Nafus; Yoshihiro Kondo; Michael Carcasi; Yukie Minekawa; Hiroyuki Ide; Yuichi Yoshida; Kosuke Yoshihara; Ryo Shimada; Masaru Tomono; Kazuhiro Takeshita; Serge Biesemans; Hideo Nakashima; Danilo De Simone; John S. Petersen; Philippe Foubert; Peter De Bisschop; Geert Vandenberghe; Hans-Jürgen Stock; Balint Meliorisz
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Advanced EUV negative tone resist and underlayer approaches exhibiting sub-20nm half-pitch resolution
Author(s): Thomas Gädda; Nguyen Dang Luong; Markus Laukkanen; Kimmo Karaste; Oskari Kähkönen; Emilia Kauppi; Dimitrios Kazazis; Yasin Ekinci; Juha Rantala
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Multi-trigger resist: novel synthesis improvements for high resolution EUV lithography
Author(s): G. O'Callaghan; C. Popescu; A. McClelland; D. Kazazis; J. Roth; W. Theis; Y. Ekinci; Alex P. G. Robinson
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Improvement of dual insolubilization resist performance through the incorporation of various functional units
Author(s): Satoshi Enomoto; Takumi Yoshino; Kohei Machida; Takahiro Kozawa
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New PSCAR concept promising high sensitivity resist overcoming problems of RLS trade-off, LER and stochastic defects (Conference Presentation)
Author(s): Seiichi Tagawa
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Understanding the photoacid generator distribution at nanoscale using massive cluster secondary ion mass spectrometry
Author(s): Xisen Hou; Mingqi Li; Michael J. Eller; Stanislav V. Verkhoturov; Emile A. Schweikert; Peter Trefonas
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Nanoscale polymer property measurement using single-molecule fluorescence (Conference Presentation)
Author(s): J. Alexander Liddle; Muzhou Wang; Stephen Stranick; Abhishek Kumar; Jeffrey W. Gilman
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Roughness power spectral density as a function of aerial image and basic process/resist parameter
Author(s): Charlotte Cutler; Choong Bong Lee; James W. Thackeray; John Nelson; Jason DeSisto; Rochelle Rena; Peter Trefonas; Chris Mack
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Pitch division photolithography at I-line (Conference Presentation)
Author(s): Paul Meyer; Ji Yeon Kim; Nathaniel Lynd; C. Grant Willson
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Addressing challenges in the mitigation of stochastic effects
Author(s): Hidetami Yaegashi; Arisa Hara
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Exploration of EUV-based self-aligned multipatterning options targeting pitches below 20nm
Author(s): S. Decoster; F. Lazzarino; D. Vangoidsenhoven; V. M. B. Carballo; A.-H. Tamaddon; E. Kesters; C. Lorant
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Self-aligned fin cut last patterning scheme for fin arrays of 24nm pitch and beyond
Author(s): S. Baudot; A. Soussou; A. P. Milenin; T. Hopf; S. Wang; P. Weckx; B. Vincent; J. Ervin; S. Demuynck
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Area-selective atomic layer deposition of dielectric-on-dielectric for Cu/low-k dielectric patterns
Author(s): Tzu-Ling Liu; Stacey F. Bent
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Defectivity reduction in area selective atomic layer deposition by monolayer design (Conference Presentation)
Author(s): Rudy J. Wojtecki; Magi A. Mettry; Noah Frederick Fine Nathel; Alexander M. Friz; Anuja De Silva; Noel Arellano; Hosadurga Shobha
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Selective spin-on deposition of polymers on heterogeneous surfaces
Author(s): Yuanyi Zhang; Colton D'Ambra; Reika Katsumata; Rachel A. Segalman; Craig J. Hawker; Christopher M. Bates
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Ultra-thin conformal coating for spin-on doping applications
Author(s): Mingqi Li; Bhooshan Popere; Peter Trefonas; Andrew T. Heitsch; Ratchana Limary; Reika Katsumata; Yuanyi Zhang; Rachel A. Segalman
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Design of selective brush chemistry and surface functionalization for directed self-assembly of block copolymers (Conference Presentation)
Author(s): Ji Yeon Kim; Natsuko Ito; XiaoMin Yang; Stephen M. Sirard; Austin P. Lane; Gregory Blachut; Yusuke Asano; Christopher J. Ellison; Nathaniel A. Lynd; C. Grant Willson
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Post-polymerization modification of PS-b-PMMA for achieving directed self-assembly with sub-10nm feature size
Author(s): Takuya Isono; Kohei Yoshida; Hiroaki Mamiya; Ken Miyagi; Akiyoshi Yamazaki; Toshifumi Satoh
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Kinetics of defect annihilation in chemo-epitaxy directed self-assembly
Author(s): Jiajing Li; Paulina Rincon-Delgadillo; Hyo Seon Suh; Geert Mannaert; Paul F. Nealey
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Pattern defect reduction for chemo-epitaxy DSA process
Author(s): Makoto Muramatsu; Takanori Nishi; Gen You; Yasuyuki Ido; Takahiro Kitano
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Defect mitigation in sub-20nm patterning with high-chi, silicon-containing block copolymers
Author(s): Jan Doise; Geert Mannaert; Hyo Seon Suh; Paulina Rincon; Jai Hyun Koh; Ji Yeon Kim; Qingjun Zhu; Geert Vandenberghe; C. Grant Willson; Christopher J. Ellison
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Accelerate the analysis and optimization of lamellar BCP process using machine learning
Author(s): A. Derville; S. Martinez; G. Gey; J. Baderot; G. Bernard; X. Chevalier; J. Foucher
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ToF-SIMS analysis of antimony carboxylate EUV photoresists
Author(s): Michael Murphy; Shaheen Hasan; Steven Novak; Greg Denbeaux; Robert L. Brainard
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Modeling of novel resist technologies
Author(s): Luke Long; Andrew R. Neureuther; Patrick P. Naulleau
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Imaging behavior of highly fluorinated molecular resists under extreme UV radiation
Author(s): Hyuntaek Oh; Seok-Heon Jung; Jeong-Seok Mun; Kanghyun Kim; Sangsul Lee; Jin-Kyun Lee
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Evolution of lithographic materials enabling the semiconductor industry
Author(s): James W. Thackeray; Cheng Bai Xu; James F. Cameron
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Aqueous materials for advanced lithography (Conference Presentation)
Author(s): Yi Cao; Tatsuro Nagahara; Taku Hirayama
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Development of metal organic cluster EUV photoresists
Author(s): Kazunori Sakai; Seok Heon Jung; Wenyang Pan; Emmanuel P. Giannelis; Christopher K. Ober
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Advances in metal oxide resist performance and production (Conference Presentation)
Author(s): Jason K. Stowers; Peter de Schepper; Michael Kocsis; Andrew Grenville
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Expanding the lithographer's toolkit to reduce variability: filtration considerations
Author(s): V. Goel; A. Wu; J. Braggin
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Start-up performance and pattern defectivity improvement using 2nm rated nylon filter developed with lithography filtration expertise
Author(s): Toru Umeda; Eric Shiu; Takehito Mizuno; Hisashi Nakagawa; Tetsuya Murakami; Shuichi Tsuzuki
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High temperature spin on carbon materials with excellent planarization and CVD compatibility
Author(s): Keren Zhang; Li Cui; Shintaro Yamada; Jim Cameron; Sabrina Wong; Lawrence Chen; Suzanne Coley; Dan Greene; Joshua Kaitz; Iou-Sheng Ke; Bhooshan Popere; Paul LaBeaume; Benjamin Foltz; Lei Zhang; Kenneth Kearns; Johnpeter Ngunjiri
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Improved hemicellulose spin on carbon hardmask
Author(s): Kazuyo Morita; Kimiko Yamamoto; Hiroki Tanaka; Yasuaki Tanaka; Masahiko Harumoto; Yuji Tanaka; Chisayo Nakayama; You Arisawa; Tomohiro Motono; Harold Stokes; Masaya Asai; Charles Pieczulewski
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Towards pure carbon: ultra-high carbon fullerene based spin-on organic hardmasks
Author(s): A. G. Brown; G. Dawson; A. L. McClelland; T. Lada; W. Montgomery; A. P. G. Robinson
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Development of novel thick spin-on carbon hardmask
Author(s): Byeri Yoon; Seungwook Shin; Youngmin Kim; Yumi Heo; Soyeon Park; Sungho Choi; Miyeon Han; Sanghak Lim
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Micro-phase separation behavior study of the same system of a novel block copolymer (PS-b-PC)
Author(s): Baolin Zhang; Weichen Liu; Zhengping Zhang; Lingkuan Meng
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Influence of PDI and composition ratio for micro phase separation about PS-b-PMMA block copolymer
Author(s): Terumasa Kosaka; Ryota Matsuki; Yukio Kawaguchi; Ryosuke Ogaki
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Phase behavior of polymer blend materials for polystyrene-b-polycarbonate (PS-b-PC) block copolymers and corresponding homopolymer polystyrene
Author(s): Weichen Liu; Baolin Zhang; Libin Zhang; Xiaobin He; Yayi Wei; Xin Wu; Junyan Dai; Ruicheng Ran; Guoping Mao
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Block copolymer line roughness and annealing kinetics as a function of chain stiffness
Author(s): Caleb L. Breaux; Peter J. Ludovice; Clifford L. Henderson
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Mitigation of line edge roughness and line width roughness in block copolymer directed self-assembly through polymer composition molecular weight manipulation
Author(s): Jakin B. Delony; Peter J. Ludovice; Clifford L. Henderson
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Defect conscious approaches in EUV patterning
Author(s): Arisa Hara; Hidetami Yaegashi
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Robustness of interactive pattern fidelity error as a quality metric for integrated patterning
Author(s): Soichiro Okada; Shinji Kobayashi; Satoru Shimura; Masashi Enomoto; Shota Yoshimura; Kiyohito Ito; Shinya Morikita
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Oligomers of MORE: Molecular Organometallic Resists for EUV
Author(s): Shaheen Hasan; Michael Murphy; Maximilian Weires; Steven Grzeskowiak; Greg Denbeaux; Robert L. Brainard
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Radical sensitive zinc-based nanoparticle EUV photoresists
Author(s): Kou Yang; Hong Xu; Kazunori Sakai; Vasiliki Kosma; Emmanuel P. Giannelis; Christopher K. Ober
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An exploration of the use of fluoropolymers in photofiltration
Author(s): A. Wu; A. Xia
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Bridging the defect gap in EUV photoresist
Author(s): T. Kohyama; Fumiya Kaneko; Alketa Gjoka; Jad Jaber
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Filter technology developments to address defectivity in leading-edge photoresists
Author(s): T. Kohyama; F. Kaneko; K. Miura; A. Gjoka; J. Jaber
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A new tailored point-of-use filter to reduce immersion lithography downtime and defects
Author(s): Aiwen Wu; Annie Xia; Hareen Bayana
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Study of outgassing from the ArF CA chemically amplified resist ArF (193 nm) exposure
Author(s): Hiroko Minami; Yoko Matsumoto; Atsushi Sekiguchi; Tomoki Nishino
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Contact hole shrink of 193nm NTD immersion resist
Author(s): Joshua Kaitz; Janet Wu; Vipul Jain; Iou-Sheng Ke; Mingqi Li; Amy Kwok; James Park; Jong Park; Jin Wuk Sung; Cong Liu
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Ordered polymer-based spin-on dopants
Author(s): Bhooshan C. Popere; Peter Trefonas; Andrew T. Heitsch; Mingqi Li; Ratchana Limary; Megan L. Hoarfrost; Kiniharu Takei; Victor Ho; Ali Javey; Yuanyi Zhang; Reika Katsumata; Rachel A. Segalman
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Development of new maleimides applied to spin-on carbon hardmask with characteristics of high heat resistance and good planarization
Author(s): Junya Horiuchi; Takashi Makinoshima; Takashi Sato; Yasushi Miki; Masatoshi Echigo; Masayoshi Ueno; Koichi Yamada
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New silicon hard mask material development for sub-5nm node
Author(s): Tomoaki Seko; Tatsuya Kasai; Ryuuichi Serizawa; Satoshi Dei; Tatsuya Sakai
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Application of downstream plasma generated radical methylation treatment to passive amorphous Si surface from TMAH etching during lithography process
Author(s): Qi Zhang; Haochen Li; Xinliang Lu; Ting Xie; Hua Chung; Shawming Ma; Michael Yang
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Charge dissipation by use of a novel aqueous based quaternary ammonium compound for use in electron beam lithography on non-conductive substrates
Author(s): Gerald Lopez; Glen de Villafranca; Grant Shao; Meiyue Zhang; Andrew Thompson
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