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PROCEEDINGS VOLUME 10957 • new

Extreme Ultraviolet (EUV) Lithography X
Editor(s): Kenneth A. Goldberg
For the purchase of this volume in printed format, please visit Proceedings.com

Volume Details

Volume Number: 10957
Date Published: 17 June 2019

Table of Contents
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Front Matter: Volume 10957
Author(s): Proceedings of SPIE
The Future is Quantum
Author(s): Dario Gil
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EUV insertion strategy into logic technology on the horizon of scaling paradigm change
Author(s): Ryoung-Han R. Kim
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High-NA EUV lithography exposure tool progress
Author(s): Jan van Schoot; Eelco van Setten; Kars Troost; Frank Bornebroek; Rob van Ballegoij; Sjoerd Lok; Judon Stoeldraijer; Jo Finders; Paul Graeupner; Joerg Zimmermann; Peter Kuerz; Marco Pieters; Winfried Kaiser
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Overview and status of the 0.5NA EUV microfield exposure tool at Berkeley Lab
Author(s): Christopher Anderson; Arnaud Allezy; Weilun Chao; Carl Cork; Will Cork; Rene Delano; Jason DePonte; Michael Dickinson; Geoff Gaines; Jeff Gamsby; Eric Gullikson; Gideon Jones; Stephen Meyers; Ryan Miyakawa; Patrick Naulleau; Senajith Rekawa; Farhad Salmassi; Brandon Vollmer; Daniel Zehm; Wenhua Zhu
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High NA EUV lithography: Next step in EUV imaging
Author(s): Eelco van Setten; Gerardo Bottiglieri; John McNamara; Jan van Schoot; Kars Troost; Joseph Zekry; Timon Fliervoet; Stephen Hsu; Joerg Zimmermann; Matthias Roesch; Bartosz Bilski; Paul Graeupner
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Progress in EUV resists towards high-NA EUV lithography
Author(s): Xiaolong Wang; Zuhal Tasdemir; Iacopo Mochi; Michaela Vockenhuber; Lidia van Lent-Protasova; Marieke Meeuwissen; Rolf Custers; Gijsbert Rispens; Rik Hoefnagels; Yasin Ekinci
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The role of the organic shell in hybrid molecular materials for EUV lithography
Author(s): Lianjia Wu; Michaela Vockenhuber; Yasin Ekinci; Sonia Castellanos
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Analysis of line-and-space patterns of ZrO2 nanoparticle resist on the basis of EUV sensitization mechanism
Author(s): Takahiro Kozawa; Teppei Yamada; Ayako Nakajima; Yusa Muroya; Julius Joseph Santillan; Toshiro Itani
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Zinc-based metal oxoclusters: towards enhanced EUV absorptivity
Author(s): Neha Thakur; Michaela Vockenhuber; Yasin Ekinci; Sonia Castellanos
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Stochastic printing failures in EUV lithography
Author(s): P. De Bisschop; E. Hendrickx
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Fundamentals of resist stochastics effect for single-expose EUV patterning
Author(s): Anuja De Silva; Luciana Meli; Dario L. Goldfarb; Nelson M. Felix
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Impact of asymmetrically localized and cascading secondary electron generation on stochastic defects in EUV lithography
Author(s): Hiroshi Fukuda
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Impact of local variability on defect-aware process windows
Author(s): Mark John Maslow; Hidetami Yaegashi; Andreas Frommhold; Guido Schiffelers; Felix Wahlisch; Gijsbert Rispens; Bram Slachter; Keisuke Yoshida; Arisa Hara; Noriaki Oikawa; Abhinav Pathak; Dorin Cerbu; Eric Hendrickx; Joost Bekaert
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Unraveling the EUV photoresist reactions: which, how much, and how do they relate to printing performance
Author(s): Ivan Pollentier; John S. Petersen; Peter De Bisschop; Danilo De Simone; Geert Vandenberghe
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OPC strategies to reduce failure rates with rigorous resist model stochastic simulations in EUVL
Author(s): Alessandro Vaglio Pret; Trey Graves; David Blankenship; Stewart A. Robertson; Patrick Lee; John J. Biafore
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Towards ultimate image placement accuracy for EUV mask writing with pattern shift process
Author(s): Vadim Sidorkin; Stephan Zimmermann; Stefan Proske; Michael Finken; G. R. Cantrell; Markus Bender
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EUV mask challenges and requirements for ultimate single exposure interconnects
Author(s): Chris Progler; Michael Green; Ravi Bonam; Henry Kamberian; Mohamed Ramadan; Derren Dunn; Young Ham; Yohan Choi; Luciana Meli; Nelson Felix; Daniel Corliss; Bryan Kasprowicz
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Influence of mask line width roughness on programmed pattern defect printability
Author(s): Takeshi Yamane; Yasutaka Morikawa; Takashi Kamo
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Impact of EUV absorber variations on wafer patterning
Author(s): Lawrence S. Melvin III; Yudhishthir Kandel; Tim Fühner; Ulrich Welling; Emily Gallagher; Andreas Frommhold; Yoshitake Shusuke
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Ion beam etching of new absorber materials for sub-5nm EUV masks
Author(s): Narasimhan Srinivasan; Katrina Rook; Vincent Ip; Meng H. Lee; Sandeep Kohli; Frank Cerio; Adrian J. Devasahayam
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Printability study of EUV double patterning for CMOS metal layers
Author(s): Danilo De Simone; Arjun Singh; Geert Vandenberghe
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LCDU optimization of STT-MRAM 50nm pitch MTJ pillars for process window improvement
Author(s): Murat Pak; Davide Crotti; Farrukh Yasin; Monique Ercken; Sandip Halder; Danilo De Simone; Pieter Vanelderen; Laurent Souriau; Hubert Hody; Gouri Sankar Kar
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Impact of sequential infiltration synthesis (SIS) on roughness and stochastic nano-failures for EUVL patterning
Author(s): Pieter Vanelderen; Victor Blanco; Ming Mao; Yoann Tomczak; David de Roest; Nicola Kissoon; Paulina Rincon Delgadillo; Gijsbert Rispens; Guido Schiffelers; Abhinav Pathak; Frederic Lazzarino; Danilo De Simone; Etienne de Poortere; Moyra Mc Manus; Daniele Piumi; Eric Hendrickx; Geert Vandenberghe
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Staggered pillar patterning using 0.33NA EUV lithography
Author(s): Danilo De Simone; Romuald Blanc; Jeroen Van de Kerkhove; Amir-Hossein Tamaddon; Roberto Fallica; Lieve Van Look; Nouredine Rassoul; Frederic Lazzarino; Nadia Vandenbroeck; Pieter Vanelderen; Gian Lorusso; Frieda Van Roey; Anne-Laure Charley; Geert Vandenberghe; Kurt Ronse; Kilyoung Lee; Junghyung Lee; Sarohan Park; Chang-Moon Lim; Chan-Ha Park
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Advanced particle contamination control in EUV scanners
Author(s): Mark van de Kerkhof; Tjarko van Empel; Michael Lercel; Christophe Smeets; Ferdi van de Wetering; Andrey Nikipelov; Christian Cloin; Andrei Yakunin; Vadim Banine
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Upgrade to the SHARP EUV mask microscope
Author(s): Markus Benk; Weilun Chao; Ryan Miyakawa; Kenneth Goldberg; Patrick Naulleau
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Absorber and phase defect inspection on EUV reticles using RESCAN
Author(s): Iacopo Mochi; Sara Fernandez; Ricarda Nebling; Uldis Locans; Patrick Helfenstein; Rajendran Rajeev; Atoosa Dejkameh; Dimitrios Kazazis; Li-Ting Tseng; Yasin Ekinci
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Actinic metrology platform for defect review and mask qualification: flexibility and performance
Author(s): Renzo Capelli; Martin Dietzel; Dirk Hellweg; Markus Koch; Grizelda Kersteen; Klaus Gwosch; Daniel Pagel
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EUV pellicle qualification on transmission and reflectance
Author(s): Rainer Lebert; Christian Pampfer; Andreas Biermanns-Foeth; Thomas Missalla; Christoph Phiesel; Christian Piel
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3D mask effects in high NA EUV imaging
Author(s): Andreas Erdmann; Peter Evanschitzky; Gerardo Bottiglieri; Eelco van Setten; Timon Fliervoet
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Investigation of mask absorber induced image shift in EUV lithography
Author(s): Martin Burkhardt; Anuja De Silva; Jennifer Church; Luciana Meli; Chris Robinson; Nelson Felix
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Implementation of different cost functions for EUV mask optimization for next generation beyond 7nm
Author(s): Fan Jiang; Alexander Tritchkov; Alex Wei; Srividya Jayaram; Yuyang Sun; Xima Zhang; James Word
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Compatibility assessment of novel reticle absorber materials for use in EUV lithography systems.
Author(s): Jetske Stortelder; Arnold Storm; Veronique de Rooij-Lohmann; Chien-Ching Wu; Willem van Schaik
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Experimental investigation of a high-k reticle absorber system for EUV lithography
Author(s): Jo Finders; Robbert de Kruif; Frank Timmermans; Jara García Santaclara; Brid Connely; Markus Bender; Frank Schurack; Takahiro Onoue; Yohei Ikebe; Dave Farrar
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Advanced multilayer mirror design to mitigate EUV shadowing
Author(s): Stuart Sherwin; Laura Waller; Andrew Neureuther; Patrick Naulleau
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High-power LPP-EUV source with long collector mirror lifetime for semiconductor high-volume manufacturing
Author(s): Hakaru Mizoguchi; Hiroaki Nakarai; Tamotsu Abe; Yasufumi Kawasuji; Hiroshi Tanaka; Yukio Watanabe; Tsukasa Hori; Takeshi Kodama; Yutaka Shiraishi; Tatsuya Yanagida; Georg Soumagne; Tsuyoshi Yamada; Taku Yamazaki; Takashi Saitou
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Colliding plasmas as potential EUV sources towards higher conversion efficiency
Author(s): Tatyana Sizyuk; John P. Oliver
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Laser produced plasma EUV sources for HVM 7nm node lithography: progress in availability and prospects of power scaling
Author(s): Igor V. Fomenkov
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Ion dynamics in laser-produced plasma for EUV generation in nanolithography devices
Author(s): Tatyana Sizyuk
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Ongoing investigation of collector cleaning by surface wave plasma in the Illinois NXE:3100 chamber
Author(s): Gianluca A. Panici; Dren Qerimi; David N. Ruzic
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Mask 3D effect reduction and defect printability of etched multilayer EUV mask
Author(s): Takashi Kamo; Takeshi Yamane; Yasutaka Morikawa; Susumu Iida; Takayuki Uchiyama; Shunko Magoshi; Satoshi Tanaka
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Development of fast rigorous simulator for large-area EUV lithography simulation
Author(s): Michael Yeung; Eytan Barouch
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Actinic inband EUV reflectometry AIMER compared to ALS blank qualification and applied to structured masks
Author(s): A. Biermanns-Föth; C. Phiesel; T. Missalla; J. Arps; C. Piel; R. Lebert
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Table-top EUV/soft x-ray source for metrological applications
Author(s): K. Mann; J. Holburg; S. Lange; M. Müller; B. Schäfer
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High-precision MoSi multilayer coatings at high-volume for continued EUVL infrastructure development
Author(s): Michael Kriese; Yang Li; Jeffery Steele; Yuriy Platonov
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The defect mitigation on EUV stack by track based technology
Author(s): Naoki Shibata; Lior Huli; Corey Lemley; Yuichiro Miyata; Dave Hetzer; Toshiharu Wada; Akiteru Ko; Shinichiro Kawakami; Akiko Kai; Takahiro Shiozawa; Hidetsugu Yano; Kenichi Ueda; Akihiro Sonoda; Karen Petrillo; Luciana Meli; Nelson Felix; Cody Murray; Alex Hubbard
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EUV-LET 2.0: a compact exposure tool for industrial research at a wavelength of 13.5nm
Author(s): Sascha Brose; Serhiy Danylyuk; Lukas Bahrenberg; Rainer Lebert; Jochen Stollenwerk; Peter Loosen; Larissa Juschkin
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Photon detector calibration in the EUV spectral range at PTB
Author(s): C. Laubis; A. Babalik; A. Babuschkin; A. Barboutis; C. Buchholz; A. Fischer; S. Jaroslawzew; J. Lehnert; H. Mentzel; J. Puls; A. Schönstedt; M. Sintschuk; C. Stadelhoff; C. Tagbo; F. Scholze
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Electrically measurable test structures to capture and classify EUV stochastics
Author(s): Hemant Vats; Ryan Ryoung Han Kim; Yasser Sherazi; Youssef Drissi; Kurt Ronse
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Line-edge roughness on fin-field-effect-transistor performance for below 10nm patterns
Author(s): So-Won Yoon; Sang-Kon Kim
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Calibrated PSCAR stochastic simulation
Author(s): Cong Que Dinh; Seiji Nagahara; Gousuke Shiraishi; Yukie Minekawa; Yuya Kamei; Michael Carcasi; Hiroyuki Ide; Yoshihiro Kondo; Yuichi Yoshida; Kosuke Yoshihara; Ryo Shimada; Masaru Tomono; Teruhiko Moriya; Kazuhiro Takeshita; Kathleen Nafus; Serge Biesemans; John S. Petersen; Danilo De Simone; Philippe Foubert; Peter De Bisschop; Geert Vandenberghe; Hans-Jürgen Stock; Balint Meliorisz
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Novel technologies in coater/developer to enhance the CD stability and to improve the defectivity toward N7 and smaller nodes
Author(s): Yuya Kamei; Yohei Sano; Takashi Yamauchi; Shinichiro Kawakami; Masahide Tadokoro; Masashi Enomoto; Makoto Muramatsu; Kathleen Nafus; Akihiro Sonoda; Marc Demand; Philippe Foubert
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Simulation of statistical effects in exposure and development of EUV photoresists using the percolation and diffusion limited aggregation model
Author(s): Akira Sasaki
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Fundamental study on dissolution kinetics of poly(4-hydroxystyrene) for development of high-resolution resists
Author(s): Ayako Nakajima; Kyoko Watanabe; Kyoko Matsuoka; Takahiro Kozawa; Yoshitaka Komuro; Daisuke Kawana; Akiyoshi Yamazaki
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Update of the development progress of the high power LPP-EUV light source using a magnetic field
Author(s): Atsushi Ueda; Shinji Nagai; Tsukasa Hori; Yutaka Shiraishi; Tatsuya Yanagida; Kenichi Miyao; Hideyuki Hayashi; Yukio Watanabe; Takeshi Okamoto; Tamotsu Abe; Takeshi Kodama; Hiroaki Nakarai; Takashi Saito; Hakaru Mizoguchi
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Litho-performance expansion with new SOC made from Hemicellulose
Author(s): Masahiko Harumoto; Yuji Tanaka; Chisayo Nakayama; You Arisawa; Masaya Asai; Charles Pieczulewski; Harold Stokes; Kimiko Yamamoto; Hiroki Tanaka; Yasuaki Tanaka; Kazuyo Morita
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Interferometric measurement of phase in EUV masks
Author(s): Wenhua Zhu; Ryan Miyakawa; Lei Chen; Patrick Naulleau
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Achieving diffraction-limited performance on the Berkeley MET5
Author(s): Ryan Miyakawa; Chris Anderson; Wenhua Zhu; Geoff Gaines; Jeff Gamsby; Carl Cork; Gideon Jones; Michael Dickenson; Seno Rekawa; Weilun Chao; Sharon Oh; Patrick Naulleau
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Investigating EUV radiochemistry with condensed phase photoemission
Author(s): Jonathan Ma; Andrew R. Neureuther; Patrick P. Naulleau
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