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PROCEEDINGS VOLUME 10586 • new

Advances in Patterning Materials and Processes XXXV
Editor(s): Christoph K. Hohle
Format Member Price Non-Member Price
Softcover $78.75 $105.00

Volume Details

Volume Number: 10586
Estimated Publication Date: 29 March 2018
Softcover: 0 papers () pages
ISBN: 9781510616646

Table of Contents
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Aqueous developers for ultrathin chemically amplified EUV resists
Author(s): Dario L. Goldfarb; Bharat Kumar
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EUV via hole pattern fidelity enhancement through novel resist and post-litho plasma treatment
Author(s): Hidetami Yaegashi; Kyohei Koike; Carlos Fonseca; Fumiko Yamashita; Kumar Kaushik; Shinya Morikita; Kiyohito Ito; Shota Yoshimura; Vadim Timoshkov; Mark Maslow; Tae Kwon Jee; Liesbeth Reijnen; Peter Choi; Mu Feng; Chris Spence; Stijn Schoofs
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EUV resist sensitization and roughness improvement by PSCAR with in-line flood exposure system (Conference Presentation)
Author(s): Seiji Nagahara; Michael Carcasi; Gosuke Shiraishi; Yuya Kamei; Kathleen Nafus; Yukie Minekawa; Hiroyuki Ide; Yoshihiro Kondo; Takahiro Shiozawa; Keisuke Yoshida; Masashi Enomoto; Kosuke Yoshihara; Hideo Nakashima; Serge Biesemans; Ryo Shimada; Masaru Tomono; Kazuhiro Takeshita; Teruhiko Moriya; Hayakawa Makoto; Ryo Aizawa; Yoshitaka Konishi; Masafumi Hori; Ken Maruyama; Hisashi Nakagawa; Masayuki Miyake; Tomoki Nagai; Satoshi Dei; Takehiko Naruoka; Motoyuki Shima; Toru Kimura; Geert Vandenberghe; John S. Petersen; Danilo De Simone; Foubert Philippe; Hans-Jürgen Stock; Balint Meliorisz; Akihiro Oshima; Seiichi Tagawa
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Surface characterization of tin-based inorganic EUV resists
Author(s): Ryan T. Frederick; J. Trey Diulus; Igor Lyubinetsky; Danielle C. Hutchison; Morgan R. Olsen; May Nyman; Gregory S. Herman
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Mechanisms of photodecomposition of metal-containing EUV photoresists: isotopic labelling studies
Author(s): Michael Murphy; Jacob Sitterly; Steven Grzeskowiak; Greg Denbeaux; Robert L. Brainard
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Ultimate edge-placement control using combined etch and lithography patterning optimizations
Author(s): Brennan Peterson; Rich Wise; Koen van der Straten; Katja Viantka; Melisa Luca; Salman Mokhlespour; Michael Kubis; Giordano Cattani; David Hellin; Daniel Sobieski; Girish Dixit; Nader Shamma; Vito Rutigliani; Patrick Jaenen; Sandip Halder; Philippe Leray
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The challenge of multi-patterning lithography for contact layer in 7nm and beyond (Conference Presentation)
Author(s): Wan-Hsiang Liang; Guanchen He; Yuan Zhou; Ming Hao Tang; Bradley Morgenfeld; David Conklin
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Unraveling the role of photons and electrons upon their chemical interaction with photoresist during EUV exposure
Author(s): Ivan Pollentier; Yannick Vesters; John S. Petersen; Pieter Vanelderen; Atish Rathore; Danilo de Simone; Geert Vandenberghe
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Polymer effects on PAG acid yield in EUV resists (Conference Presentation)
Author(s): Steven Grzeskowiak; Jake Kaminsky; Sean Gibbons; Michael Murphy; Jonathan Chandonait; Robert L. Brainard; Greg Denbeaux
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Characterization of metal resist for EUV lithography using Infrared free electron laser
Author(s): Minoru Toriumi; Takayasu Kawasaki; Takayuki Imai; Koichi Tsukiyama; Julius Joseph Santillan; Toshiro Itani
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Investigations on EUVL metal resist dissolution behavior using in situ high-speed atomic force microscopy
Author(s): Julius Joseph Santillan; Toshiro Itani
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Novel EUV resist materials for 7 nm node and beyond
Author(s): Hajime Furutani; Michihiro Shirakawa; Wataru Nihashi; Kyohei Sakita; Hironori Oka; Mitsuhiro Fujita; Tadashi Omatsu; Toru Tsuchihashi; Nishiki Fujimaki; Toru Fujimori
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Study of electron beam and extreme ultraviolet resist utilizing polarity change and radical crosslinking
Author(s): Satoshi Enomoto; Takumi Yoshino; Kohei Machida; Takahiro Kozawa
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Polymer brush as adhesion promoter for EUV patterning (Conference Presentation)
Author(s): Jing Guo; Anuja De Silva; Yann Mignot; Yongan Xu; Abraham Arceo de la Peña; Luciana Meli; Indira Seshadri; Dominik Metzler; Lovejeet Singh; Tsuyoshi Furukawa; Ramakrishnan Ayothi; Nelson M. Felix; Dan Corliss
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LWR enhancement for 300mm track processing
Author(s): Harold Stokes; Jelle Vandereyken; Waut Drent; Masahiko Harumoto; Masaya Asai; Yuji Tanaka; Chisayo Nakayama; Charles Pieczulewski
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Novel Sn-based photoresist for high aspect ratio patterning
Author(s): Mengjun Li; Viacheslav Manichev; Fangzhou Yu; Danielle Hutchison; May Nyman; Torgny Gustafsson; Leonard C. Feldman; Eric L. Garfunkel
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The development of an SC1 removable si-anti-reflective-coating
Author(s): Shintaro Yamada; Iou-Sheng Ke; Charlotte Cutler; Cui Li; Paul LaBeaume; Daniel Greene; Bhooshan Popere; Chris Sullivan; JoAnne Leonard; Suzanne Coley; Sabrina Wong; Owendi Ongayi; Jim Cameron; Michael B. Clark; Thomas C. Fitzgibbons
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New spin on carbon materials made from hemicellulose for hardmask layer
Author(s): Kazuyo Morita; Kimiko Yamamoto; Koki Hongo; Masahiko Harumoto; Yuji Tanaka; Chisayo Nakayama; You Arisawa; Harold Stokes; Masaya Asai
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High-carbon fullerene based spin-on organic hardmask
Author(s): Guy Dawson; Alan G. Brown; Alexandra McClelland; Tom Lada; Warren Montgomery; Alex P. G. Robinson
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A progress report on DSA of high-chi silicon containing block co-polymers (Conference Presentation)
Author(s): C. Grant Willson; Natsuko Ito; Gregory Blachut; Stephen Sirard; Yasunobu Someya; Jan Doise; Ryuta Mizuochi; Austin Lane; Geert Vandenberghe; Paulina Rincon-Delgadillo; XiaoMin Yang; Christopher Ellison
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Utilization of metal-polymer interactions for self-aligned directed self-assembly of device relevant features (Conference Presentation)
Author(s): Moshe Dolejsi; Paul Nealey
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Pillars fabrication by DSA lithography: material and process options
Author(s): A. Gharbi; P. Pimenta-Barros; O. Saouaf; G. Reynaud; L. Pain; R. Tiron; C. Navarro; C. Nicolet; I. Cayrefourcq; M. Perego; F. Pérez-Murano; E. Amat; M. Fernández-Regúlez
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Defect dynamics in directed self-assembly of block copolymers (Conference Presentation)
Author(s): Tsukasa Azuma; Yuriko Seino; Hironobu Sato; Yusuke Kasahara; Katsuyoshi Kodera; Ken Miyagi; Masayuki Shiraishi; Ryota Matsuki; Terumasa Kosaka; Toshiyuki Himi; Seiji Nagahara; Alvin Chandra; Ryuichi Nakatani; Teruaki Hayakawa; Kenji Yoshimoto; Takuya Omosu; Mikihito Takenaka
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Impact of annealing temperature on DSA process: toward faster assembly kinetics (Conference Presentation)
Author(s): Hyo Seon Suh; Akhil Nair; Paulina Rincon Delgadillo; Jan Doise; Gian Lorusso; Paul Nealey; Victor Monreal; Durairaj Baskaran; Yi Cao; Munirathna Padmanaban; Jin Li; Takeshi Kato; Takumichi Sutani; Toru Ishimoto; Masami Ikota; Shunsuke Koshihara
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A simulation study on bridge defects in lamellae-forming diblock copolymers
Author(s): Hironobu Sato; Katsuyoshi Kodera; Yuriko Seino; Yusuke Kasahara; Ken Miyagi; Masayuki Shiraishi; Tsukasa Azuma
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Directed self-assembly of triblock copolymers for sub-10 nm nanofabrication using polymeric additives
Author(s): Jiajing Li; Chun Zhou; Xuanxuan Chen; Paulina Rincon-Delgadillo; Paul Nealey
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Straightforward directed self-assembly process flows enabled by advanced materials
Author(s): Kui Xu; Eric Calderas; Mary Ann Hockey; Douglas Guerrero; Richard Daugherty; Yichen Liang
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Characterizing the internal structure of BCP filled contact holes with critical dimension small angle x-ray scattering (Conference Presentation)
Author(s): Daniel F. Sunday; Florian Delachat; Ahmed Gharbi; Guillaume Freychet; Raluca Tiron; R. Joseph Kline
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Xylan block copolymer for wide-range directed self-assembly lithography enabling wider range of 3D patterning size (Conference Presentation)
Author(s): Kimiko Yamamoto; Kazuyo Morita; Masahiko Harumoto; Yuji Tanaka; Chisayo Nakayama; Masaya Asai
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Automated lamellar block copolymer process characterization
Author(s): G. Bernard; X. Chevalier; A. Dervilllé; J. Foucher
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DSA process characterization using BSE metrology (Conference Presentation)
Author(s): Remi Le Tiec; Shimon Levi; Ahmed Gharbi; Maxime Argoud; Raluca Tiron; Gaelle Chamiot Maitral; Stephane Rey
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Multi-color fly-cut-SAQP for reduced process variation
Author(s): Richard A. Farrell; Elliott Franke; Kandabara Tapily; Jodi Hotalen; David O'Meara; Angelique Raley; Akitero Ko; Peter Biolsi; Cory Wajda; Gert Leusink; Anton DeVilliers; David Hetzer
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Thick photosensitive polyimide film side wall angle variability and scum improvement for IC packaging stress control
Author(s): Sohan Singh Mehta; Marco Yeung; Fahad Mirza; Thiagarajan Raman; Travis Longenbach; Justin Morgan; Mark Duggan; Rio A. Soedibyo; Sean Reidy; Mohamed Rabie; Jae Kyu Cho; C. S. Premachandran; Danish Faruqui
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Resist-polymer ablation by mid-infrared-free-electron laser
Author(s): Minoru Toriumi; Takayasu Kawasaki; Mitsunori Araki; Takayuki Imai; Koichi Tsukiyama
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High-precision 3D printing as a versatile tool for integrated photonics (Conference Presentation)
Author(s): Benedikt Stender; Willi Mantei; Alexander Krupp; Valentin Ratz; Fabian Hilbert; Ruth Houbertz
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Evaluation of anti-sticking layers performances for 200mm wafer scale smart NILTM process through surface and defectivity characterizations
Author(s): F. Delachat; J.-C. Phillipe; V. Larrey; F. Fournel; S. Bos; H. Teyssèdre ; Xavier Chevalier; Célia Nicolet; Christophe Navarro; Ian Cayrefourcq
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Application specific ratings of filters for negative-tone developer
Author(s): Toru Umeda; Yukihisa Kawada; Kazushi Masuda; Naoya Iguchi; Tetsuya Murakami; Shuichi Tsuzuki
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The intrinsic role of membrane morphology to reduce defectivity in advanced photochemicals
Author(s): Tetsu Kohyama; Aiwen Wu; Kozue Miura; Yasushi Ohyashiki
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Targeted removal of metallic contamination from lithography solvents using membrane purifiers
Author(s): Aiwen Wu; Tetsu Kohyama; James Hamzik; Saksatha Ly; Jad Jaber
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Improved airborne molecular contaminant filter performance for photolithography
Author(s): Gerald Weineck; Brian Hoang; Joshua Lais
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Directed Self-Assembly (DSA) for contact applications
Author(s): Ming-Hui Weng; Tsung-Han Ko; Chih-Jie Lee; Han-Ping Shen; Chieh-Han Wu; Ken-Hsien Hsieh; Yuan-Chien Huang; Cheng-Han Wu; Chung-Ju Lee; Ching-Yu Chang; Chin-Hsiang Lin
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Fast annealing DSA materials designed for sub-5 nm resolution
Author(s): Hai Deng; Xuemiao Li; Yu Peng; Jianuo Zhou
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Desirable material selection on self-aligned multi-patterning
Author(s): Kyohei Koike; Kazuki Yamada; Masatoshi Yamato; Hidetami Yaegashi; Takehiro Seshimo; Takahiro Dazai; Katsumi Ohmori
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Synthesis of metal nanoparticle and patterning in polymeric films induced by electron beam
Author(s): Hiroki Yamamoto; Takahiro Kozawa; Seiichi Tagawa; Jean-Louis Marignier; Mehran Mostafavi; Jacqueline Belloni
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Mechanism study of ion implantation on photoresist shrinkage
Author(s): Heguang Shi; Zhou Fang; Dongxu Yang
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Chemical trimming overcoat: an advanced composition and process for photoresist enhancement in lithography
Author(s): Xisen Hou; Cong Liu; Kevin Rowell; Irvinder Kaur; Mingqi Li; Paul Baranowski; Jong Park; Cheng Bai Xu
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Development of new polyphenols applied to spin-on carbon hardmask with characteristics of high-heat resistance and good planarization
Author(s): Junya Horiuchi; Tomoaki Takigawa; Yoko Shimizu; Takashi Makinoshima; Takashi Sato; Masatoshi Echigo
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Effects of fluorine contamination on spin-on dielectric thickness in semiconductor manufacturing
Author(s): Hyoung-ryeun Kim; Soonsang Hong; Samyoung Kim; Changyeol Oh; Sung Min Hwang
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Investigating the threshold electron energy for reactions in EUV resist materials
Author(s): Jake Kaminsky; Steven Grzeskowiak; Sean Gibbons; Jonathan Chandonait; Ulrich Welling; Lawrence S. Melvin; Yudhishthir Kandel; Robert L. Brainard; Greg Denbeaux
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Nanoscale inhomogeneity and photoacid generation dynamics in extreme ultraviolet resist materials
Author(s): Ping-Jui Wu; Yu-Fu Wang; Wei-Chi Chen; Chien-Wei Wang; Joy Cheng; Vencent Chang; Ching-Yu Chang; John Lin; Yuan-Chung Cheng
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Molecular organometallic resists for EUV (MORE): Reactivity as a function of metal center (Bi, Sb, Te and Sn)
Author(s): Jacob Sitterly; Michael Murphy; Steven Grzeskowiak; Greg Denbeaux; Robert L. Brainard
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