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PROCEEDINGS VOLUME 10584 • new

Novel Patterning Technologies 2018
Editor(s): Eric M. Panning
Format Member Price Non-Member Price
Softcover $78.75 $105.00

Volume Details

Volume Number: 10584
Date Published: 16 July 2018
Softcover: 39 papers (344) pages
ISBN: 9781510616608

Table of Contents
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Front Matter: Volume 10584
Author(s): Proceedings of SPIE
High-throughput scanning probe instruments for nanopatterning, alignment, and overlay metrology
Author(s): Violeta Navarro; Abbas Mohtashami; Rodolf Herfst; Klara Maturova; Maarten van Es; Daniele Piras; Hamed Sadeghian
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Thermal scanning probe lithography: from spintronics to biomedical applications
Author(s): E. Albisetti; D. Petti; Annalisa Calo; Xiaorui Zheng; R. Bertacco; E. Riedo
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Field-emission scanning probe lithography with self-actuating and self-sensing cantilevers for devices with single digit nanometer dimensions
Author(s): Ivo W. Rangelow; Claudia Lenk ; Martin Hofmann ; Steve Lenk ; Tzvetan Ivanov ; Ahmad Ahmad ; Marcus Kaestner; Elshad Guliyev; Christoph Reuter; Matthias Budden; Jens-Peter Zöllner; Mathias Holz ; Alexander Reum; Zahid Durrani; Mervyn Jones; Cemal Aydogan; Mahmut Bicer; B. Erdem Alaca; Michael Kuehnel; Thomas Fröhlich; Roland Fuessl; E. Manske
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The state of the art in multicolor visible photolithography
Author(s): Nikolaos Liaros; Zuleykhan Tomova; Sandra A. Gutierrez Razo; Samuel R. Cohen; John T. Fourkas; Steven M. Wolf; Matthew Thum; Daniel E. Falvey; Hannah M. Ogden; Amy S. Mullin; Adam Pranda; Gottlieb S. Oehrlein; John S. Petersen
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Multi-color approach on self-aligned multiple patterning for single line cut application
Author(s): Eric Liu; Akiteru Ko; Richard Farrell; David O'Meara; Chia-Yun Hsieh; Peter Biolsi
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Helium ion active hybrid non-chemically amplified resist (n-CAR) for sub-10 nm patterning applications
Author(s): Satinder K. Sharma; Pulikanti Guruprasad Reddy; Mohamad Ghulam Moinuddin; Subrata Ghosh; Chullikkattil P. Pradeep; Kenneth E. Gonsalves
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Precise control of template affinity achieved by UV-assisted graphoepitaxy approach on silicon nanowires applications
Author(s): P. Pimenta-Barros; G. Claveau; M. Argoud; Z. Chalupa; N. Allouti; C. Comboroure; G. Chamiot-Maitral; N. Posseme; L. Pain; R. Tiron; C. Navarro; C. Nicolet; I. Cayrefourcq
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Inorganic guiding template implementation for DSA contact hole shrink process (Conference Presentation)
Author(s): Ahmed Gharbi; Florian DELACHAT; Patricia Pimenta-Barros; Gaëlle Chamiot-Maitral; Maxime Argoud; Celine Lapeyre; Laurent Pain; Christophe Navarro; Célia Nicolet; Ian Cayrefourcq; Raluca Tiron
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e-beam direct write: why it's always left standing at the altar of new nodes
Author(s): G. Dan Hutcheson
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Performance validation of Mapper's FLX-1200
Author(s): Marco Wieland; Guido de Boer; Pieter Brandt; Michel Dansberg; Remco Jager; Jerry Peijster; Erwin Slot; Stijn Steenbrink; Yoann Blancquaert; Stefan Landis; Laurent Pain; Jonathan Pradelles; Guido Rademaker; Isabelle Servin
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Multi-beam mask writer MBM-1000
Author(s): Hiroshi Matsumoto; Hideo Inoue; Hiroshi Yamashita; Takao Tamura; Kenji Ohtoshi
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Block copolymers for sub-10nm directed self-assembly lithography (Conference Presentation)
Author(s): Natsuko Ito; Gregory Blachut; Yusuke Asano; Christopher J. Ellison; Grant C. Willson; Stephen Sirard; XiaoMin Yang; Austin P. Lane
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Studying the effects of chemistry and geometry on DSA hole-shrink process in three dimensions
Author(s): Chun Zhou; Tsuyoshi Kurosawa; Takahiro Dazai; Jan Doise; Jiaxing Ren; Cody Bezik; Tamar Segal-Peretz; Akiyoshi Yamazaki; Roel Gronheid; Paulina Rincon-Delgadillo; Juan de Pablo; Paul F. Nealey
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The integration of 193i and DSA for BEOL metal cuts/blocks targeting sub-20nm tip-to-tip CD
Author(s): Chi-Chun Liu; Yann Mignot; Cheng Chi; Richard Farrell; Kafai Lai; Jing Guo; Jing Sha; Martin Glodde; Makoto Muramatsu; Yasuyuki Ido; Nelson Felix; David Hetzer; Andrew Metz; Daniel Corliss
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Defect and roughness reduction of chemo-epitaxy DSA pattern
Author(s): Makoto Muramatsu; Takanori Nishi; Gen You; Yasuyuki Ido; Takahiro Kitano
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Evaluation of line-edge/line-width roughness of directed self-assembled PS-b-PMMA patterns using coarse-grained molecular dynamics simulation
Author(s): Shubham Pinge; Durairaj Baskaran; Yong Lak Joo
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Manufacturing directed self assembly flows enabled by advanced materials (Conference Presentation)
Author(s): Mary Ann J. Hockey
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Fabrication of full-field 1z nm template using multi-beam mask writer (Conference Presentation)
Author(s): Koji Ichimura; Koichi Kanno; Masaaki Kurihara; Naoya Hayashi
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Performance of a nanoimprint mask replication system
Author(s): Atsushi Kimura; Kohei Imoto; Chiaki Sato; Kiyohito Yamamoto; Hiroshi Inada; Mitsuru Hiura; Takehiko Iwanaga; Ali Aghili; Makoto Mizuno; Jin Choi; Chris Jones
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Design for nanoimprint lithography: hot spot modification through total NIL process simulation
Author(s): Sachiko Kobayashi; Kyoji Yamashita; Hirotaka Tsuda; Kazuhiro Washida; Motofumi Komori; Ji-Young Im; Takuya Kono; Tetsuro Nakasugi
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A novel resist system for enhanced resist spreading in nanoimprint lithography
Author(s): Niyaz Khusnatdinov; Tim Stachowiak; Weijun Liu
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Updates of nanoimprint lithography for production and applications for next generation memory devices
Author(s): Tatsuhiko Higashiki
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Overlay improvements using a novel high-order distortion correction system for NIL high-volume manufacturing
Author(s): Mitsuru Hiura; Tatsuya Hayashi; Atsushi Kimura; Yoshio Suzaki
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Improvement of nano-imprint lithography performance for device fabrication
Author(s): Takuya Kono; Masayuki Hatano; Hiroshi Tokue; Kei Kobayashi; Hirokazu Kato; Masato Suzuki; Kazuya Fukuhara; Tetsuro Nakasugi; Eun Hyuk Choi; Wooyung Jung
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Pattering liquids: A novel approach to integrate functional liquids with solid state devices (Conference Presentation)
Author(s): Bhagwati Prasad; G. Pfanzelt; Evangelos Fillis-Tsirakis; M. J. Zachman; L. F. Fitting Kourkoutis; J. Mannhart
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3D micro-mirror lithography for mass production
Author(s): Nicholas Liverman; Evan Delly; Lynelle Haugabrook; Trevor Fregin; N. Collin Moore
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Electrochemical nanoimprinting of silicon: a direct patterning approach
Author(s): Aliaksandr Sharstniou; Stanislau Niauzorau; Bruno Azeredo
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AutoSCIL 200mm tooling in production, x-ray optics, and cell growth templates
Author(s): Marc A. Verschuuren; Jake McCoy; Rebecca P. Huber; Remco van Brakel; Manuel Paans; Rob Voorkamp
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Process development of a maskless N40 via level for security application with multi-beam lithography
Author(s): Isabelle Servin; Patricia Pimenta-Barros; Arthur Bernadac; Jonathan Pradelles; Allan Germain; Yoann Blancquaert; Philippe Essomba; Stefan Landis; Gerard ten Berge; Marco Wieland; Philippe Brun
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Single-nanometer accurate 3D nanoimprint lithography with master templates fabricated by NanoFrazor lithography
Author(s): T. S. Kulmala; C. D. Rawlings; M. Spieser; T. Glinsner; A. Schleunitz; F. Bullerjahn; F. Holzner
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Contact/proximity stepper using UVA, UVB, and UVC light sources
Author(s): Shyi-Long Shy
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Green ethanol-developable electron beam lithography processes using positive tone biomass resist material
Author(s): Satoshi Takei
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Nanoimprint lithography using gas permeable template II
Author(s): Makoto Hanabata; Satoshi Takei; Shinya Nakajima; Naoto Sugino; Yoko Matsumoto; Atsushi Sekiguchi
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Gas permeable template derived from cellulose in ultraviolet nanoimprint
Author(s): Shinya Nakajima; Kento Mizui; Makoto Hanabata; Satoshi Takei
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Benchmarking 3-color photoresists for multiphoton absorption lithography
Author(s): Nikolaos Liaros; Sandra A. Gutierrez Razo; Zuleykhan Tomova; John S. Petersen; John T. Fourkas
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Thin films for high-resolution, 3-color lithography
Author(s): Sandra A. Gutierrez Razo; Adam Pranda; Nikolaos Liaros; Samuel R. Cohen; John T. Fourkas; Gottlieb S. Oehrlein; Hannah M. Ogden; Amy Mullin; Steven M. Wolf; Daniel Falvey; John Petersen
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In situ polymerization threshold detection of 3-color systems and a study of the time dependence
Author(s): Hannah M. Ogden; Amy S. Mullin; Sandra A. Gutierrez Razo; Nikolaos Liaros; John T. Fourkas; John Peterson
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Substrate damageless tri-layer process for advanced ArFi lithography
Author(s): Kengo Ehara; Ichihiro Miura; Masayoshi Ishikawa; Yuushi Matsumura; Kazunori Takanashi; Tatsuya Sakai; Hiroki Nakagawa
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Model-based proximity effect correction for helium ion beam lithography
Author(s): Chien-Lin Lee; Sheng-Wei Chien; Kuen-Yu Tsai
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Process control technology for nanoimprint lithography
Author(s): Hirotaka Tsuda; Hirokazu Washida; Motofumi Komori; Takuya Kono; Tetsuro Nakasugi; Wooyung Jung
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Mask lithographic performance investigation with computational Monte-Carlo method on advanced mask patterning
Author(s): Chun-Hung Liu; Shih-Ming Chang; Chia-Hua Chang; Wen Lo; Hsin-Wei Wu; Chien-Cheng Chen; Alex Chen; Shuo-Yen Chou; Ru-Gun Liu
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Material development for high-throughput nanoimprint lithography
Author(s): Kei Kobayashi; Takayuki Nakamura; Hirokazu Kato; Masayuki Hatano; Hiroshi Tokue; Tetsuro Nakasugi; Eun Hyuk Choi; Wooyung Jung; Takuya Kono
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Fabrication of optical nanodevices through field-emission scanning probe lithography and cryogenic etching
Author(s): Cemal Aydogan; Martin Hofmann; Claudia Lenk; Burkhard Volland; Ivo W. Rangelow; Mahmut Bicer; B. Erdem Alaca; Onur Ates; Hamdi Torun; Arda D. Yalcinkaya
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Effect of homopolymer concentration on LER and LWR in block copolymer/homopolymer blends
Author(s): Caleb L. Breaux; Jakin B. Delony; Peter J. Ludovice; Clifford L. Henderson
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