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PROCEEDINGS VOLUME 10454

Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
Editor(s): Kiwamu Takehisa
Format Member Price Non-Member Price
Softcover $60.00 $80.00

Volume Details

Volume Number: 10454
Date Published: 16 August 2017
Softcover: 38 papers (264) pages
ISBN: 9781510613898

Table of Contents
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Front Matter: Volume 10454
Author(s): Proceedings of SPIE
Development of high sensitivity and high speed large size blank inspection system LBIS
Author(s): Shinobu Ohara; Akinori Yoshida; Mitsuo Hirai; Takenori Kato; Koichi Moriizumi; Haruhiko Kusunose
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Influence of the pellicle for FPD for i-line single wavelength exposure
Author(s): Kimiyuki Maruyama; Sadayuki Hirayama; Kohei Yano; Takashi Fujikawa; Masakatsu Hirano; Tatsunori Nakahara; Yuji Maruyama; Noriko Tani
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New PSM optimized for stable resolution of fine holes in FPD
Author(s): Nobuhisa Imashiki; Yutaka Yoshikawa; Michihiko Hayase
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Shin-Etsu super-high-flat substrate for FPD panel photomask
Author(s): Youkou Ishitsuka; Daijitsu Harada; Atsushi Watabe; Masaki Takeuchi
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GPU: the biggest key processor for AI and parallel processing
Author(s): Toru Baji
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Model-based MPC enables curvilinear ILT using either VSB or multi-beam mask writers
Author(s): Linyong Pang; Yutetsu Takatsukasa; Daisuke Hara; Michael Pomerantsev; Bo Su; Aki Fujimura
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EUV modeling in the multi-beam mask writing era
Author(s): Ryan Pearman; Harold Zable; Aki Fujimura
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Simulation-based MDP verification for leading-edge masks
Author(s): Bo Su; Oleg Syrel; Michael Pomerantsev; Kazuyuki Hagiwara; Ryan Pearman; Leo Pang; Aki Fujimara
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eBeam initiative survey reports confidence in EUV and multi-beam technology
Author(s): Aki Fujimura; Jan Willis
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Electron beam lithographic modeling assisted by artificial intelligence technology
Author(s): Noriaki Nakayamada; Rieko Nishimura; Satoru Miura; Haruyuki Nomura; Takashi Kamikubo
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Mask CD relationship to temperature at the time backscatter is received
Author(s): Harold Zable; Tom Kronmiller; Ryan Pearman; Bill Guthrie; Nagesh Shirali; Yukihiro Masuda; Takashi Kamikubo; Noriaki Nakayamada; Aki Fujimura
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GPU-accelerated inline linearity correction: pixel-level dose correction (PLDC) for the MBM-1000
Author(s): Harold Zable; Hironobu Matsumoto; Kenichi Yasui; Ryosuke Ueba; Noriaki Nakayamada; Nagesh Shirali; Yukihiro Masuda; Ryan Pearman; Aki Fujimura
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Multi-beam mask writer MBM-1000
Author(s): Hiroshi Matsumoto; Hiroshi Yamashita; Takao Tamura; Kenji Ohtoshi
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Cycle time reduction by Html report in mask checking flow
Author(s): Jian-Cheng Chen; Min-Ying Lu; Xiang Fang; Ming-Feng Shen; Shou-Yuan Ma; Chuen-Huei Yang; Joe Tsai; Rachel Lee; Erwin Deng; Ling-Chieh Lin; Hung-Yueh Liao; Jenny Tsai; Amanda Bowhill; Hien Vu; Gordon Russell
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Data preparation in the age of curvilinear patterns
Author(s): Sébastien Bayle; Charles Tiphine; Matthieu Milléquant; Thiago Figueiro; Luc Martin; Sergei Postnikov; Patrick Schiavone
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Accurate lithography simulation model based on convolutional neural networks
Author(s): Yuki Watanabe; Taiki Kimura; Tetsuaki Matsunawa; Shigeki Nojima
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MTO-like reference mask modeling for advanced inverse lithography technology patterns
Author(s): Jongju Park; Jongin Moon; Suein Son; Donghoon Chung; Byung-Gook Kim; Chan-Uk Jeon; Patrick LoPresti; Shan Xue; Sonny Wang; Bill Broadbent; Soonho Kim; Jiuk Hur; Min Choo
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Effects of hard mask etch on final topography of advanced phase shift masks
Author(s): Olga Hortenbach; Haiko Rolff; Alexander Lajn; Martin Baessler
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Etch bias inversion during EUV mask ARC etch
Author(s): Alexander Lajn; Haiko Rolff; Richard Wistrom
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Overcoming EUV mask blank defects: what we can, and what we should
Author(s): Rik Jonckheere
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Application of EUV dark field image for EUVL mask fabrication
Author(s): Takeshi Yamane; Hidehiro Watanabe
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First light and results on EBL2
Author(s): Norbert Koster; Edwin te Sligte; Alex Deutz; Freek Molkenboer; Pim Muilwijk; Peter van der Walle; Wouter Mulckhuyse; Bjorn Nijland; Peter Kerkhof; Michel van Putten
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EUV repair process optimization and integration
Author(s): Pavel Nesládek; Alexander Lajn; Thorsten Schedel; Markus Bender
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Application of EB repair for nanoimprint lithography template
Author(s): Ai Kumada; Keiko Morishita; Keisuke Yagawa; Ryoji Yoshikawa; Takashi Hirano; Masamitsu Itoh
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Improved particle control for high volume semiconductor manufacturing for nanoimprint lithography
Author(s): Masami Yonekawa; Takahiro Nakayama; Kazuki Nakagawa; Toshihiro Maeda; Yoichi Matsuoka; Keiji Emoto; Hisanobu Azuma; Yukio Takabayashi; Ali Aghili; Makoto Mizuno; Jin Choi; Chris E. Jones
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Quartz 9-inch size mask blanks for ArF PSM (Phase Shift Mask)
Author(s): Noriyuki Harashima; Tatsuya Isozaki; Arata Kawanishi; Shuichiro Kanai; Kagehiro Kageyama; Hiroyuki Iso; Tatsuya Chishima
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Mask crosstalk defect between develop to etch process
Author(s): Yuan Hsu; Hong-Jen Lee
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Stabilize OMOG photomask post-repair CD variation by cleaning strategy and post-repair treatment
Author(s): Vincent Shen; Josh Tzeng; Kuang Huang; Vic Chang
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LMS IPRO: enabling accurate registration metrology on SiN-based phase-shift masks
Author(s): Hendrik Steigerwald; Runyuan Han; Alexander Buettner; Klaus-Dieter Roeth
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Old and new techniques mixed up into optical photomask measurement method
Author(s): Jumpei Fukui; Yusaku Tachibana; Makoto Osanai
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How smart is your BEOL? productivity improvement through intelligent automation
Author(s): Kristian Schulz; Kokila Egodage; Gilles Tabbone; Anthony Garetto
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The capability of measuring cross-sectional profile for hole patterns in nanoimprint templates using small-angle x-ray scattering
Author(s): Kazuki Hagihara; Rikiya Taniguchi; Eiji Yamanaka; Kazuhiko Omote; Yoshiyasu Ito; Kiyoshi Ogata; Naoya Hayashi
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Application of advanced structure to multi-tone mask for FPD process
Author(s): Jin-Han Song; Jin-Woong Jeong; Kyu-Sik Kim; Woo-Gun Jeong; Sang-Pil Yun; Dong-Heok Lee; Sang-Soo Choi
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Fabrication of cylindrical micro-parts using synchronous rotary scan-projection lithography and chemical etching
Author(s): Kaiki Ito; Yuta Suzuki; Toshiyuki Horiuchi
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Electrolytic etching of fine stainless-steel pipes patterned by laser-scan lithography
Author(s): Hiroshi Takahashi; Tomoya Sagara; Toshiyuki Horiuchi
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Research on fabrication of resist mold patterns for electroplating
Author(s): Kouta Shimizu; Yuhto Nishida; Toshiyuki Horiuchi
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Observation of EUVL mask using coherent EUV scatterometry microscope with high-harmonic-generation EUV source
Author(s): Daiki Mamezaki; Tetsuo Harada; Yutaka Nagata; Takeo Watanabe
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Exposure characteristics of positive tone electron beam resist containing p-chloro-α-methylstyrene
Author(s): Shunsuke Ochiai; Tomohiro Takayama; Yukiko Kishimura; Hironori Asada; Manae Sonoda; Minako Iwakuma; Ryoichi Hoshino
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