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PROCEEDINGS VOLUME 10451 • new

Photomask Technology
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Volume Details

Volume Number: 10451
Date Published: 5 December 2017
Softcover: 49 papers (446) pages
ISBN: 9781510613768

Table of Contents
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Front Matter: Volume 10451
Author(s): Proceedings of SPIE
Extending the era of Moore's Law
Author(s): Tsu-Jae King Liu
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2017 mask maker survey conducted by the eBeam Initiative
Author(s): Aki Fujimura; Jan Willis
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Manufacturing challenges for curvilinear masks
Author(s): Chris Spence; Quan Zhang; Vincent Shu; Been-Der Chen; Stanislas Baron; Yasuko Saito; Masakazu Hamaji; Yasuaki Horima; Shuichiro Ohara
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VSB fracture optimization for mask write time reduction
Author(s): Lei Sun; Dan Hung; John Burns; Bill Moore
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Adopting rigorous verification flow in fabrication of silicon photonic devices
Author(s): Siti Noor Aisyah Binti Yahya; Mogana Sundharam A/L Sathisivan; Chuanhai Li; Jinhua Pei; Yu Chen
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An efficient tool to rewrite a VSB12 format jobdeck for any target VSB12 machine
Author(s): Juan Olate; Gary Meyers
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Full-chip GPU-accelerated curvilinear EUV dose and shape correction
Author(s): Ryan Pearman; Abhishek Shendre; Oleg Syrel; Harold Zable; Ali Bouaricha ; Mariusz Niewczas ; Bo Su ; Leo Pang ; Aki Fujimura
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CLMPC: curvilinear MPC in a mask data preparation flow
Author(s): Ingo Bork; Murali Reddy; Bhardwaj Durvasula; Nageswara Rao; Malavika Sharma; Peter Buck
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Machine learning for mask/wafer hotspot detection and mask synthesis
Author(s): Yibo Lin; Xiaoqing Xu; Jiaojiao Ou; David Z. Pan
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Machine learning of IC layout "styles" for Mask Data Processing verification and optimization (Conference Presentation)
Author(s): Luigi Capodieci
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Impact of feature extraction to accuracy of machine learning based hotspot detection
Author(s): Takashi Mitsuhashi
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Machine learning assisted SRAF placement for full chip
Author(s): Shibing Wang; Jing Su; Quan Zhang; Weichun Fong; Dezheng Sun; Stanislas Baron; Cuiping Zhang; Chenxi Lin; Been-Der Chen; Rafael C. Howell; Stephen D. Hsu; Larry Luo; Yi Zou; Yen-Wen Lu; Yu Cao
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Fabrication of cylindrical micro-parts using synchronous rotary scan-projection lithography and chemical etching
Author(s): Kaiki Ito; Yuta Suzuki; Toshiyuki Horiuchi
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The capability of measuring cross-sectional profile for hole patterns in nanoimprint templates using small-angle x-ray scattering
Author(s): Kazuki Hagihara; Rikiya Taniguchi; Eiji Yamanaka; Kazuhiko Omote; Yoshiyasu Ito; Kiyoshi Ogata; Naoya Hayashi
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EUV mask readiness for HVM (Conference Presentation)
Author(s): Heebom Kim; Chang Young Jeong; Donggun Lee; Ji Hoon Na; Hwan-Seok Seo; Mun Ja Kim; Sung-Won Kwon; Chan-Uk Jeon
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Actinic review of EUV masks: challenges and achievements in delivering the perfect mask for EUV production
Author(s): Dirk Hellweg; Martin Dietzel; Renzo Capelli; Conrad Wolke; Grizelda Kersteen; Markus Koch; Ralf Gehrke
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DUV inspection beyond optical resolution limit for EUV mask of hp 1X nm
Author(s): Masato Naka; Akihiko Ando; Keiko Morishita; Ryoji Yoshikawa; Takashi Kamo; Takashi Hirano; Masamitsu Itoh
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EUV reticle print verification with advanced broadband optical wafer inspection and e-Beam review systems
Author(s): Ravikumar Sanapala; Andrew Cross; Moshe Preil; Jin Qian; Shishir Suman; Vidyasagar Anantha; Kaushik Sah; Scott Eitapence; Danilo De Simone; Dieter Van den Heuvel; Philippe Foubert
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Pellicle films supporting the ramp to HVM with EUV
Author(s): P. J. van Zwol; M. Nasalevich; W. P. Voorthuijzen; E. Kurganova; A. Notenboom; D. Vles; M. Peter; W. Symens; A. J. M. Giesbers; J. H. Klootwijk; R. W. E. van de Kruijs; W. J. van der Zande
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CNT EUV pellicle: moving towards a full-size solution
Author(s): Marina Y. Timmermans; Ivan Pollentier; Jae Uk Lee; Johan Meersschaut; Olivier Richard; Christoph Adelmann; Cedric Huyghebaert; Emily E. Gallagher
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Development of EUV pellicle for suppression of contamination, haze, and outgas generation
Author(s): Yosuke Ono; Kazuo Kohmura; Atsushi Okubo; Daiki Taneichi; Hisako Ishikawa; Tsuneaki Biyajima
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EUV optical characterization of alternative membrane materials for EUV pellicles
Author(s): Frank Scholze; Christian Laubis; Michael Krumrey; Marina Y. Timmermans; Ivan Pollentier; Emily E. Gallagher
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Rigorous simulation of EUV mask pellicle
Author(s): Yulu Chen; Xiangyu Zhou; Ulrich Klostermann; Lei Sun; Obert Wood; Mariya Braylovska; Sajan Marokkey; Francis Goodwin
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Enhanced critical feature representation for fuzzy-matching for lithography hotspot detection
Author(s): Mohamed M. Elshabrawy; Amr G. Wassal
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The impact of inconsistency in assist feature generation on OPC performance
Author(s): Amr Abdo; Ramya Viswanathan; Donald Samuels; David Conklin
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Edge placement errors in EUV from aberration variation
Author(s): Ananthan Raghunathan; Germain Fenger; Michael Lam; Chris Clifford; Kostas Adam; John Sturtevant
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Process window discovery from mask inspection for hotspot analysis and verification
Author(s): James Cheng; William Chou; C. H. Twu; Hsin-Fu Chou; Jackie Cheng; Colbert Lu; Heng-Jen Lee; Bosheng Zhang; Mehdi Daneshpanah; Apo Sezginer; David Wu; Mike Yeh; Albert Chien
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Estimated mask contours: potential applications
Author(s): John Gookassian; Carlos Rojas
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Implementation of CDSEM contour extraction on OPC verification
Author(s): Liang Cao; Jie Zhang; Hongxin Zhang; Jiechang Hou; Guoxiang Ning; William Wilkinson; Shaowen Gao; Norman Chen
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Selective measurement of small metrology targets using CD-GISAXS
Author(s): Mika Pflüger; Victor Soltwisch; Frank Scholze; Michael Krumrey
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Off-line mask-to-mask registration characterization as enabler for computational overlay
Author(s): Richard van Haren; Steffen Steinert; Christian Roelofs; Orion Mouraille; Koen D’havé; Leon van Dijk; Dirk Beyer
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Dimensional measurement sensitivity analysis for a MoSi photomask using DUV reflection scatterfield imaging microscopy
Author(s): Martin Y. Sohn; Dong Ryoung Lee; Bryan M. Barnes; Ronald Dixson; Richard M. Silver; Sang-Soo Choi
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Automated defect disposition with AIMS AutoAnalysis
Author(s): Guy Russell; David Jenkins; Arosha Goonesekera; Kay Dornbusch; Vahagn Sargsyan; Hendrik Zachmann; Ute Buttgereit
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Characterization of acoustic cavitation from a megasonic nozzle transducer for photomask cleaning
Author(s): Nicolas Candia; Claudio Zanelli; Johann Brunner; Joachim Straka; Zhenxing Han; Sam Howard; Petrie Yam
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Advanced photomask chrome etch: selectivity without sacrifice
Author(s): Michael Morgan; Chris Johnson; Kristen Bevlin; Dwarakanath Geerpuram; Russ Westerman
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Improving back end of line productivity through smart automation
Author(s): Kristian Schulz; Kokila Egodage; Gilles Tabbone; Anthony Garetto
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Multi-beam mask writer MBM-1000
Author(s): Hiroshi Matsumoto; Hideo Inoue; Hiroshi Yamashita; Ryosuke Ueba; Kenji Otoshi; Hirokazu Yamada; Jin Choi; Byoung-Sup Ahn; Jong-Mun Park; Sang-Hee Lee; Shuichi Tamamushi; Chan-Uk Jeon
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Development of an inkjet-enabled adaptive planarization process
Author(s): Niyaz Khusnatdinov; Douglas J. Resnick; Shrawan Singhal; Michelle M. Grigas; S. V. Sreenivasan
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Progress in nanoimprint wafer and mask systems for high volume semiconductor manufacturing
Author(s): Kohei Imoto; Mitsuru Hiura; Hiroshi Morohoshi; Tatsuya Hayashi; Atsushi Kimura; Yoshio Suzaki; Jin Choi
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Dark field technology for EUV and optical mask blank inspection
Author(s): Qiuping Nie; David Aupperle; Alexander Tan; Bill Kalsbeck; Qiang Zhang; Gregg Inderhees
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Laser-scan lithography and electrolytic etching for fabricating mesh structures on stainless-steel pipes 100μm in diameter
Author(s): Hiroshi Takahashi; Toshiyuki Horiuchi
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Automatic SRAF printing detection based on contour extraction
Author(s): Liang Cao; Jie Zhang; Wenchao Jiang; Jiechang Hou; Dongqing Zhang; Wei-long Wang
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Strategies on quantitative data preparation for OPC model calibration to reduce catastrophic failure at 7nm node
Author(s): Hong Chen
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Aerial image ORC checks and their correlation to wafer-edge yield limitation for metals: a study and an OPC resolution
Author(s): Tamer Desouky; Yixiao Zhang; Mark Terry; Haizhou Yin; Muhammed Pallachali; Nicolai Petrov; Teck Jung Tang; Fadi Batarseh; Ahmed Khalil; Pietro Babighian; Rohan Deshpande; Deborah Ryan; Rao Desineni; Shweta Shokale; Feng Wang; Sang-Kee Eah; Jiechang Hou
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Advanced process control based on litho-patterning density
Author(s): Yuping Ren; Guoxiang Ning; Wenchao Jiang; Xiang Hu; Lloyd Litt; Paul Ackmann
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Improved testpatterns and coverage for complex SrAF to optimize 5nm and below OPC and mask patterning
Author(s): Marco A. Guajardo; Hesham Abdelghany; Ahmed Omran; Yu Chen; Kevin Lucas
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Direct laser writing: virtual mask optimization for optical quality control artefact
Author(s): Miikka Järvinen; Gianmario Scotti; Tuomas Vainikka; Edward Hæggström; Ivan Kassamakov
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Dual-line fabrication method in direct laser lithography to reduce the manufacturing time of diffractive optics elements
Author(s): Young-Gwang Kim; Hyug-Gyo Rhee; Young-Sik Ghim; Ho-Soon Yang; Yun-Woo Lee
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Transparent and conductive backside coating of EUV lithography masks for ultra short pulse laser correction
Author(s): Rinu Abraham Maniyara; Dhriti Sundar Ghosh; Valerio Pruneri
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Mask process correction method comparison and study: CD-SEM box versus standard correction method
Author(s): Mingjing Tian; Shizhi Lyu; Eric Guo; Ingo Bork; Peter Buck; Yifan Li; Delin Mo; Cong Lu; Kushlendra Mishra; Anil Parchuri
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Micro-defect repair assisted with contour-based 2D metrology
Author(s): Irene Shi; Eric Guo; Max Lu; Izumi Santo
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