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PROCEEDINGS VOLUME 10450

International Conference on Extreme Ultraviolet Lithography 2017
Editor(s): Paolo A. Gargini; Patrick P. Naulleau; Kurt G. Ronse; Toshiro Itani
Format Member Price Non-Member Price
Softcover $60.00 $80.00

Volume Details

Volume Number: 10450
Date Published: 29 November 2017
Softcover: 31 papers (302) pages
ISBN: 9781510613744

Table of Contents
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Front Matter: Volume 10450
Author(s): Proceedings of SPIE
EUV lithography industrialization progress
Author(s): Roderik van Es; Mark van de Kerkhof; Hans Jasper; Leon Levasier; Rudy Peeters
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EUV single patterning for logic metal layers: achievement and challenge (Conference Presentation)
Author(s): Ryoung-Han Kim; Werner Gillijns; Youssef Drissi; Jae Uk Lee; Darko Trivkovic; Victor M. Blanco Carballo; Stephane Larivière; Rudi De Ruyter; Morin Dehan; Gregory R. McIntyre; Ling Ee Tan
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EUV mask manufacturing readiness in the merchant mask industry
Author(s): Michael Green; Yohan Choi; Young Ham; Henry Kamberian; Chris Progler; Shih-En Tseng; Tsann-Bim Chiou; Junji Miyazaki; Ad Lammers; Alek Chen
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Classification and printability of EUV mask defects from SEM images
Author(s): Wonil Cho; Daniel Price; Paul A. Morgan; Daniel Rost; Masaki Satake; Vikram L. Tolani
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Actinic inspection of EUV reticles with arbitrary pattern design
Author(s): Iacopo Mochi; Patrick Helfenstein; Rajendran Rajeev; Sara Fernandez; Dimitrios Kazazis; Shusuke Yoshitake; Yasin Ekinci
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Measurement of through-focus EUV pattern shifts using the SHARP actinic microscope
Author(s): Obert Wood; Yulu Chen; Pawitter Mangat; Kenneth Goldberg; Markus Benk; Bryan Kasprowicz; Henry Kamberian; Jeremy McCord; Thomas Wallow
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EUV Infrastructure: EUV photomask backside cleaning (Conference Presentation)
Author(s): Bruce Fender; Dusty Leonhard; Hugo Breuer; Jack Stoof; My-Phung Van; Rudy J. M. Pellens; Reinout Dekkers; Jan-Pieter Kuijten
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EUV mask flatness compensation strategies and requirements for reticle flatness, scanner optimization and E-beam writer (Conference Presentation)
Author(s): Christina Turley; Jed Rankin; Xuemei Chen; Katherine Ballman; Christopher A. Lee; Tom Dunn
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Efficient simulation of EUV pellicles
Author(s): P. Evanschitzky; A. Erdmann
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EUV source optimization driven by fundamental diffraction considerations
Author(s): Jo Finders; Eelco van Setten; Par Broman; Erik Wang; John McNamara; Paul van Adrichem
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Performance and characteristics of the NXE:3400 optical system enabling sub-10nm node lithography (Conference Presentation)
Author(s): Michael Busshardt; Olaf Conradi; Benjamin Kaminski; Peter Kürz; Jörg Tschischgale; Albert Voit; Markus Hauf; Jörg Zimmermann; Erik Loopstra; Tilmann Heil; Mark A. van de Kerkhof; Jelmer Kamminga; Roel Merry; Hans C. Jasper
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Addressing EUV masks registration challenges through closed loop correction (Conference Presentation)
Author(s): Avi Cohen; Ofir Sharoni; Dirk Beyer; Christian Ehrlich
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Individual multilayer reflectance and near field image formation in an EUV reticle
Author(s): Lawrence S. Melvin; Yudhi Kandel; Artak Isoyan; Weimin Gao
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Single element and metal alloy novel EUV mask absorbers for improved imaging (Conference Presentation)
Author(s): Vicky Philipsen; Kim Vu Luong; Laurent Souriau; Efrain Altamirano-Sánchez; Christoph Adelmann; Christian Laubis; Frank Scholtze; Jens Kruemberg; Christian Reuter; Eric Hendrickx
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Unraveling the role of secondary electrons upon their interaction with photoresist during EUV exposure
Author(s): Ivan Pollentier; Yannick Vesters; Jing Jiang; Pieter Vanelderen; Danilo de Simone
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Secondary electron interactions of chemically amplified EUV photoresists (Conference Presentation)
Author(s): Steven Grzeskowiak; Amrit K. Narasimhan; Gregory H. Denbeaux
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A novel route to EUV resists design: Fundamental understanding of chemical processes (Conference Presentation)
Author(s): Oleg Kostko; Bo Xu; Daniel S. Slaughter; Musahid Ahmed; D. Frank Ogletree; Kristi D. Closser; David G. Prendergast; Patrick P. Naulleau; Deirdre L. Olynick; Paul D. Ashby; Yi Liu; William D. Hinsberg; Gregory M. Wallraff
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High resolution lithography using a multi-trigger resist (Conference Presentation)
Author(s): Carmen Popescu; Alexandra L. McClelland; Guy Dawson; John Roth; Alex P. G. Robinson; Warren Montgomery
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DDR process and materials for NTD photo resist in EUV lithography
Author(s): Shuhei Shigaki; Satoshi Takeda; Wataru Shibayama; Makoto Nakajima; Rikimaru Sakamoto
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Recent progress of CAR materials for EUV lithography (Conference Presentation)
Author(s): Toru Fujimori; Hajime Furutani; Michihiro Shirakawa; Wataru Nihashi; Toru Tsuchihashi
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Reducing roughness in extreme ultraviolet lithography
Author(s): Chris A. Mack
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The update of resist outgas testing for metal containing resists at EIDEC
Author(s): Eishi Shiobara; Shinji Mikami
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Actinic EUV scatterometry for parametric mask quantification (Conference Presentation)
Author(s): Stuart Sherwin; Andrew R. Neureuther; Patrick P. Naulleau
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EUV mask roughness can recover litho-tool aberrations (Conference Presentation)
Author(s): Aamod Shanker; Laura Waller; Antoine Wojdyla; Markus P. Benk; Kenneth A. Goldberg; Patrick P. Naulleau
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Evaluating mechanical characteristic of SiNx EUV pellicle membrane (Conference Presentation)
Author(s): Yong Ju Jang; Jung Hwan Kim; Jin-ho Ahn
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High-NA EUV lithography enabling Moore’s law in the next decade
Author(s): Jan van Schoot; Kars Troost; Frank Bornebroek; Rob van Ballegoij; Sjoerd Lok; Peter Krabbendam; Judon Stoeldraijer; Erik Loopstra; Jos P. Benschop; Jo Finders; Hans Meiling; Eelco van Setten; Bernhard Kneer; Peter Kuerz; Winfried Kaiser; Tilmann Heil; Sascha Migura; Jens Timo Neumann
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Optical proximity correction for anamorphic extreme ultraviolet lithography
Author(s): Chris Clifford; Michael Lam; Ananthan Raghunathan; Fan Jiang; Germain Fenger; Kostas Adam
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Edge placement error control and Mask3D effects in High-NA anamorphic EUV lithography
Author(s): Eelco van Setten; Gerardo Bottiglieri; Laurens de Winter; John McNamara; Paul Rusu; Jan Lubkoll; Gijsbert Rispens; Jan van Schoot; Jens Timo Neumann; Matthias Roesch; Bernhard Kneer
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Next-generation EUV lithography productivity (Conference Presentation)
Author(s): Erik R. Hosler
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Taking a SHARP look at mask 3D effects
Author(s): Markus P. Benk; Weilun Chao; Ryan Miyakawa; Kenneth Goldberg; Patrick Naulleau
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High-power LPP-EUV source with long collector mirror lifetime for high volume semiconductor manufacturing
Author(s): Hakaru Mizoguchi; Hiroaki Nakarai; Tamotsu Abe; Krzysztof M. Nowak; Yasufumi Kawasuji; Hiroshi Tanaka; Yukio Watanabe; Tsukasa Hori; Takeshi Kodama; Yutaka Shiraishi; Tatsuya Yanagida; Georg Soumagne; Tsuyoshi Yamada; Taku Yamazaki; Takashi Saitou
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Challenges to realize the EUV-FEL high-power light source for HVM system (Conference Presentation)
Author(s): Hiroshi Kawata; Norio Nakamura; Eiji Kako; Ryukou Kato; Tsukasa Miyajima
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A 1kW EUV source for lithography based on FEL emission in a compact storage ring
Author(s): Michael Feser; Ron Ruth; Rod Loewen
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Improved cost-of-ownership for a droplet-based LPP light source for HVM EUV mask and blank inspection (Conference Presentation)
Author(s): Markus Brandstätter; Marco M. Weber; Duane Hudgins; Jeremy Nickol; Flori Alickaj; Reza S. Abhari
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Study of ion enhanced Sn removal by surface wave plasma for source cleaning (Conference Presentation)
Author(s): David N. Ruzic; Gianluca A. Panici; Dren Qerimi
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EUV exposure tool stability at IMEC (Conference Presentation)
Author(s): Vinayan Menon; Raul Pecharroman-Gallego; Lieve van Look ; Eric Hendrickx; Andre van Dijk; Tom Lathouwers
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EUV local CDU healing performance and modeling capability towards 5nm node
Author(s): Tae Kwon Jee; Vadim Timoshkov; Peter Choi; David Rio; Yu-Cheng Tsai; Hidetami Yaegashi; Kyohei Koike; Carlos Fonseca; Stijn Schoofs
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Roadmap evolution: from NTRS to ITRS, from ITRS 2.0 to IRDS
Author(s): Paolo A. Gargini
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Single-nm resolution techniques with DDR process and materials (Conference Presentation)
Author(s): Wataru Shibayama; Shuhei Shigaki; Satoshi Takeda; Makoto Nakajima; Rikimaru Sakamoto
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Development of amorphous silicon based EUV hardmasks through physical vapor deposition
Author(s): Anuja De Silva; Yann Mignot; Luciana Meli; Scott DeVries; Yongan Xu; Indira Seshadri; Nelson M. Felix; Wilson Zeng; Yong Cao; Khoi Phan; Huixiong Dai; Christopher S. Ngai; Michael Stolfi; Daniel L. Diehl
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Fabrication and performance of transmission engineered molybdenum-rich phase structures in the EUV regime (Conference Presentation)
Author(s): Farhad H. Salmassi; Weilun Chao; Eric M. Gullikson; Julia Meyer-Ilse; Patrick P. Naulleau
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Key components development progress updates of the 250W high power LPP-EUV light source
Author(s): Takayuki Yabu; Yasufumi Kawasuji; Tsukasa Hori; Takeshi Okamoto; Hiroshi Tanaka; Kenichi Miyao; Takuya Ishii; Yukio Watanabe; Tatsuya Yanagida; Yutaka Shiraishi; Tamotsu Abe; Takeshi Kodama; Hiroaki Nakarai; Taku Yamazaki; Noritoshi Itou; Takashi Saito; Hakaru Mizoguchi
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A study on enhancing EUV resist sensitivity (2)
Author(s): Atsushi Sekiguchi; Yoko Matsumoto; Michiya Naito; Yoshiyuki Utsumi; Tetsuo Harada; Takeo Watanabe
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Technology for defectivity improvement in resist coating and developing process in EUV lithography process
Author(s): Yuya Kamei; Takahiro Shiozawa; Shinichiro Kawakami; Hiroshi Ichinomiya; Masashi Enomoto; Kathleen Nafus; Philippe Foubert
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Development of the negative-tone molecular resists for EB/EUVL having high EUV absorption capacity and molecular design method
Author(s): Takashi Sato; Tomoaki Takigawa; Yuta Togashi; Takumi Toida; Masatoshi Echigo; Tetsuo Harada; Takeo Watanabe; Hiroto Kudo
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Lifetime estimation of extreme-ultraviolet pellicle at 500 W source power by thermal stress analysis
Author(s): Eun-Sang Park; Chung-Hyun Ban; Jae-Hun Park; Hye-Keun Oh
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Characterization of pellicle membranes by lab-based spectroscopic reflectance and transmittance measurements in the extreme ultraviolet
Author(s): Lukas Bahrenberg; Serhiy Danylyuk; Sascha Brose; Ivan Pollentier; Marina Timmermans; Emily Gallagher; Jochen Stollenwerk; Peter Loosen
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Search for multi-stack EUV pellicle membrane for EUV non-actinic mask inspection
Author(s): Sung-Gyu Lee; Guk-Jin Kim; Su-Mi Hur; Hye-Keun Oh
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Thermo-mechanical behavior analysis of extreme-ultraviolet pellicle cooling with H2 flow
Author(s): Myung-Gi Kang; Sung-Gyu Lee; Eun-Sang Park; Hye-Keun Oh
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Lifetime impact on residual stress of EUV pellicle
Author(s): Min-Woo Kim; Sung-Gyu Lee; Eun-Sang Park; Hye-Keun Oh
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Wrinkle formation analysis in extreme-ultraviolet pellicle
Author(s): Hae-Nam Jeong; Guk-Jin Kim; Sung-Gyu Lee; Hye-Keun Oh
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Contrast matching of line gratings obtained with NXE3XXX and EUV- interference lithography
Author(s): Zuhal Tasdemir; Iacopo Mochi; Karen Garrido Olvera; Marieke Meeuwissen; Oktay Yildirim; Rolf Custers; Rik Hoefnagels; Gijsbert Rispens; Roberto Fallica; Michaela Vockenhuber ; Yasin Ekinci
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Coater/developer based techniques to improve high-resolution EUV patterning defectivity
Author(s): Koichi Hontake; Lior Huli; Corey Lemley; Dave Hetzer; Eric Liu; Akiteru Ko; Shinichiro Kawakami; Takeshi Shimoaoki; Yusaku Hashimoto; Koichiro Tanaka; Karen Petrillo; Luciana Meli; Anuja De Silva; Yongan Xu; Nelson Felix; Richard Johnson; Cody Murray; Alex Hubbard
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Applications of RCWA on EUV mask optics
Author(s): Taian Fan; Lisong Dong; Yayi Wei
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Extreme ultra violet lithographic optical projection system design method using Code V lens module and generalized Gaussian constants
Author(s): Li-Jen Hsiao; Hoang-Yan Lin
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A new objective for EUV lithography, EUV microscopy, and 2D x-ray imaging
Author(s): Manfred L. Bitter; Kenneth W. Hill; Philip C. Efthimion; Jian Lu; Brian F. Kraus; Lan Gao; Luis F. Delgado-Aparicio; Novimir A. Pablant
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High-precision MoSi multilayer coatings for radial and 2D designs on curved optics
Author(s): Michael D. Kriese; Yang Li; Yuriy Y. Platonov
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Characterization of EBL2 EUV exposure facility
Author(s): Edwin te Sligte; Michel van Putten; Freek T. Molkenboer; Peter van der Walle; Pim M. Muilwijk; Norbert B. Koster; Jeroen Westerhout; Peter J. Kerkhof; Bastiaan W. Oostdijck; Wouter Mulckhuyse; Alex F. Deutz
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Optimized phase-shifting masks for high-resolution resist patterning by interference lithography
Author(s): Sascha Brose; Serhiy Danylyuk; Lukas Bahrenberg; Rainer Lebert; Peter Loosen; Larissa Juschkin
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