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Proceedings of SPIE Volume 1037

Monitoring and Control of Plasma-Enhanced Processing of Semiconductors
Editor(s): James E. Griffiths
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Volume Details

Volume Number: 1037
Date Published: 15 March 1989
Softcover: 17 papers (155) pages
ISBN: 9780819400727

Table of Contents
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Reflectance-Difference Spectroscopy: A New Look At Semiconductor Crystal Growth By MBE And OMCVD
Author(s): D. E. Aspnes; R. Bhat; E. Colas; L. T. Florez; J. P. Harbison; M. K. Kelly; V. G. Keramidas; M. A. Kozo; A. A. Studna
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Modulation Spectroscopy For In Situ Characterization Of The Growth And Processing Of Semiconductors
Author(s): Fred H. Pollak; H. Shen
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Assessing Semiconductor Interfaces By Low Energy Catholuminescence Spectroscopy
Author(s): R.Enrique Viturro; Leonard J. Brilison
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Use Of Raman Spectroscopy For The Characterization Of III-V Semiconductor Heterostructures
Author(s): Gary W. Wicks
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In-Situ Diagnostics For Plasma Processing
Author(s): P. Banks; W. Pilz; I. Hussla; G. Lorenz; G. Castrischer
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Laser Absorption Spectroscopy: A Sensitive Gas Phase Processing Monitor
Author(s): Edward A. Whittaker; Chi Man Shum
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Multichamber Integrated Deposition System For Silicon Based Dielectric Films
Author(s): Gerald Lucovsky; David V. Tsu; Gregory N. Parsons; Sang S. Kim
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Multiple Chamber Molecular Beam Epitaxy Growth System: Growth Of GaAs/ZnSe Heterostructures
Author(s): M. C. Tamargo; J. L. de Miguel; F. S. Turco; B. J. Skromme; M. H. Meynadier; R. E. Nahory; D. M. Hwang; H. H. Farrell
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II-VI/III-V Heterostructures: Epilayer-On-Epilayer Structures
Author(s): R. L. Gunshor; L. A. Kolodziejski; M. Kobayashi; N. Otsuka; A. V. Nurmikko
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Reactive Ion Etching (RIE) And Magnetron Ion Etching (MIE) Combinations For Opto-Electronic Integrated Circuit (OEIC) Processing
Author(s): M. S. Lebby; P. A. Kiely; G. W. Taylor
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Empirical Modeling Of Plasma Etching Using Optical Emission Spectroscopy
Author(s): Jerome Cannon
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Factors Affecting Reactive Ion Etching Of Corning 7059 Glass
Author(s): Yue Kuo; J. R. Crowe
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Plasma-Enhanced Processing Of Diamond Films
Author(s): Max N . Yoder
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Advances In Plasma Enhanced Thin Film Deposition
Author(s): Evert P. van de Ven
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Preparation Of Transition Metal Sulfides Using Rf Plasma
Author(s): Donald M. Schleich; Robert Gieger; Richard McManus; John N. Carter
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Oxide Deposition By PECVD
Author(s): D. E. Ibbotson; J. J. Hsieh; D. L. Flamm; J. A. Mucha
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Plasma Deposited Silicon Nitride Film Chemistry
Author(s): J. N. Chiang; D. W. Hess
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