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PROCEEDINGS VOLUME 10147

Optical Microlithography XXX
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Volume Details

Volume Number: 10147
Date Published: 24 April 2017
Softcover: 46 papers (452) pages
ISBN: 9781510607453

Table of Contents
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Front Matter: Volume 10147
Author(s): Proceedings of SPIE
EPE improvement thru self-alignment via multi-color material integration
Author(s): Nihar Mohanty; Jeffrey T. Smith; Lior Huli; Cheryl Pereira; Angelique Raley; Subhadeep Kal; Carlos Fonseca; Xinghua Sun; Ryan L. Burns; Richard A. Farrell; David R. Hetzer; Andrew W. Metz; Akiteru Ko; Steven A. Scheer; Peter Biolsi; Anton DeVillers
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In-design and signoff lithography physical analysis for 7/5nm (Erratum)
Author(s): Cyrus Tabery; Jun Ye; Yi Zou; Vincent Arnoux; Praveen Raghavan; Ryoung-han Kim; Michel Côté; Luca Mattii; Ya-Chieh Lai; Philippe Hurat
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Using heuristic optimization to set SRAF rules
Author(s): ChangAn Wang; Norman Chen; Chidam Kallingal; William Wilkinson; Jian Liu; Alan Leslie
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The impact of lower light source bandwidth on sub-10nm process node features
Author(s): Will Conley; Paolo Alagna; Jason Shieh; Simon Hsieh; Tsann-Bim Chiou; Stephen Hsu; Greg Rechtsteiner
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Computational microscopy (Conference Presentation)
Author(s): Laura Waller
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Process margin improvement through finger-print removal based on scanner leveling data
Author(s): Young Jun Kim; Tony Park; Jeong Heung Kong; Dong Kyung Han; Jin Phil Choi; Young Seog Kang; Se Yeon Jang; Jeroen Cottaar; Jan-Pieter van Delft; Jeroen Rutten; Axel von Sydow; Marcel Bontekoe; Maarten Boogaarts; Arjan Donkerbroek; Ruiyue Ouyang; Balaji Rangarajan; Khalid Elbattay; Andrew Moe; Chung-Yong Kim
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Scanner-to-scanner CD analysis and control in an HVM environment
Author(s): Du Hyun Beak; Ju Hee Shin; Tony Park; Dong Kyeng Han; Jin Phil Choi; Jeong Heung Kong; Young Seog Kang; Se Yeon Jang; Peter Nikolsky; Chris Strolenberg; Noh-Kyoung Park; Khalid Elbattay; Vito Tomasello; Austin Peng; Anand Guntuka; Zhao-Ze Li; Ronald Goossens; Machi Ryu; Jangho Shin; Chung-Yong Kim; Andrew Moe; Yun-A Sung
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Reduction and control of intrafield focus variation on 7nm technology
Author(s): Jennifer Shumway; Nathan Neal; Sheldon Meyers; Jens Reichelt; Young Ki Kim; Justin Hanson; Ferhad Kamalizadeh; Dionysios Petromanolakis; Youri van Dommelen; Robert Bonanni; Arjan Gijsbertsen
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450mm lithography status for high volume manufacturing
Author(s): Christopher R. Carr; Hsin-Hui Huang; HyoungKook Kim; Shannon Dunn; Jasper P. Munson; Russell A. Black; Preston A. Crupe; Victor A. Perez; Takuya Kuroda
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Will conventional E95% spectral indicator last forever? (Conference Presentation)
Author(s): Toshihiro Oga; Kenji Takahisa; Takashi Matsunaga; Tatsuo Enami
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Molecular force modeling of lithography (Conference Presentation)
Author(s): Zhimin Zhu; Joyce Lowes
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Experimental characterization of NTD resist shrinkage
Author(s): Bernd Küchler; Thomas Mülders; Hironobu Taoka; Weimin Gao; Ulrich Klostermann; Sou Kamimura; Grozdan Grozev; Masahiro Yoshidome; Michihiro Shirakawa; Waikin Li
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Investigation of 3D photoresist profile effect in self-aligned patterning through virtual fabrication
Author(s): Mustafa B. Akbulut; Jiangjiang Gu; Andras Pap; Vasanth Allampalli; Daniel Faken; Joseph Ervin; Ken Greiner; David Fried
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Reducing the impact of etch-induced pattern shift on overlay by using lithography and etch tool corrections
Author(s): Michael Kubis; Rich Wise; Charlotte Chahine; Katja Viatkina; Samee Ur-Rehman; Geert Simons; Mircea Dusa; David Hellin; Daniel Sobieski; Wenzhe Zhang; Christiane Jehoul; Patrick Jaenen; Philippe Leray
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Optimal structure sampling for etch model calibration
Author(s): François Weisbuch; Andrey Lutich; Jirka Schatz
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Interlayer verification methodology for multi-patterning processes
Author(s): Sunwook Jung; Sejin Park; Jungmin Kim; Jinhee Kim; John Sturtevant
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Accurate lithography simulation model based on convolutional neural networks
Author(s): Yuki Watanabe; Taiki Kimura; Tetsuaki Matsunawa; Shigeki Nojima
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Full chip hierarchical inverse lithography: a solution with perfect symmetry
Author(s): Bayram Yenikaya
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Source defect impact on pattern shift
Author(s): Artak Isoyan; Chander Sawh; Lawrence S. Melvin
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Image contrast enhancement of multiple patterning features through lower light source bandwidth
Author(s): Paolo Alagna; Will Conley; Greg Rechtsteiner; Kathleen Nafus; Serge Biesemans
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Automated detection and classification of printing sub-resolution assist features using machine learning algorithms
Author(s): Kriti K. Kohli; Mark Jobes; Ioana Graur
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Decomposition of the TCC using non-coherent kernels for faster calculation of lithographic images
Author(s): Alan E. Rosenbluth
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Resist 3D aware mask solution with ILT for hotspot repair
Author(s): Kosta Selinidis; Wolfgang Hoppe; Thomas Schmoeller; Thuc Dam; Kevin Hooker; Guangming Xiao
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Enhanced OPC recipe coverage and early hotspot detection through automated layout generation and analysis
Author(s): Ayman Hamouda; Mohamed Bahnas; Dan Schumacher; Ioana Graur; Ao Chen; Kareem Madkour; Hussein Ali; Jason Meiring; Neal Lafferty; Chris McGinty
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3D printed complex microoptics: A new paradigm in optics manufacturing (Conference Presentation)
Author(s): Harald Giessen
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A physical model for innovative laser direct write lithography
Author(s): Temitope Onanuga; Maximilian Rumler; Andreas Erdmann
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Performance analyses of plasmonic lithography
Author(s): Xi Chen; Gaofeng Liang; L. Jay Guo
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Analyses of line-edge roughness in plasmonic lithography (Conference Presentation)
Author(s): Gaofeng Liang; Xi Chen; L. Jay Guo
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Neuroelectronic device process development and challenge
Author(s): Gymama Slaughter; Matthew Robinson; Joel Tyson; Chen J. Zhang
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Exposure source error and model source error impact on optical proximity correction
Author(s): Lawrence S. Melvin; Artak Isoyan; Chander Sawh
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Effective use of aerial image metrology for calibration of OPC models
Author(s): Ao Chen; Yee Mei Foong; Thomas Thaler; Ute Buttgereit; Angeline Chung; Andrew Burbine; John Sturtevant; Chris Clifford; Kostas Adam; Peter DeBisschop
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Accurate characterization of 2D etch bias by capturing surrounding effects from resist and trench areas
Author(s): Yongfa Fan; Leiwu Zheng; Mu Feng; Jinze Wang; Qiao Zhao; Jen-Shiang Wang; Rafael Howell; Keith Gronlund
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Design grid optimization for OPC of silicon photonics (Conference Presentation)
Author(s): Wenhui Wang; Xiaochi Chen; Lei Sun; Alexander Y. Piggott; Jelena Vuckovic; Jongwook Kye
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Si-photonics waveguides manufacturability using advanced RET solutions
Author(s): N. Zeggaoui; B. Orlando; G. Kerrien; V. Farys; E. Yesilada; S. Cremer; A. Tritchkov; V. Liubich
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Overlay statistics for multiple exposure patterning
Author(s): Allen H. Gabor; Nelson M. Felix
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Experimental verification of on-product overlay improvement by intra-lot overlay control using metrology based grouping
Author(s): Honggoo Lee; Junghwan Moon; Jaesun Woo; Sangjun Han; Changrock Song; Marc Hauptmann; Weitian Kou; Alexander Ypma; Hyun-Woo Yu; Hank Han; Michiel Kupers; Paul Böcker; Daan Slotboom
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FinFET-induced anisotropy in printing of implantation shapes
Author(s): Xiren Wang; Yuri Granik; Nikolay Elistratov; Christian Zuniga; Ana-Maria Armeanu; Junghwan Choi; Youngseok Woo
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On-product overlay improvement with an enhanced alignment system
Author(s): Tomonori Dosho; Yuji Shiba; Takanobu Okamoto; Hajime Yamamoto; Yujiro Hikida; Jay Brown; Go Ichinose; Masahiro Morita; Yuichi Shibazaki
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Reticle heating feed-forward control (RHC2) on NXT:1980Di immersion scanner for enhanced on-product overlay
Author(s): Young Ha Kim; Jonghoon Jang; Byeong Soo Lee; Hyunwoo Hwang; Youngsun Nam; Jeong-Heung Kong; Young Seog Kang; Se-Yeon Jang; Bart Paarhuis; Jeroen van der Wielen; Barry Moest; Joris Jongen; Stefan Weichselbaum; Niek Verbeek; Marco Stavenga; Roelof de Graaf; Richard Droste
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Next-generation DUV light source technologies for 10nm and below
Author(s): Ted Cacouris; Greg Rechtsteiner; Will Conley
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The ArF laser for the next generation multiple-patterning immersion lithography supporting green operations and leading edge processes
Author(s): Hirotaka Miyamoto; Takahito Kumazaki; Hiroaki Tsushima; Akihiko Kurosu; Takeshi Ohta; Satoru Bushida; Takashi Matsunaga; Hakaru Mizoguchi
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Layout independent leveling (LIL) on NXT:1980Di immersion scanners for enhanced productivity
Author(s): Bram van Hoof; Arjan Holscher; Ralf Gommers; Jeroen Cottaar; Marcel Raas; Samah Khalek; Jan van Kemenade; Maarten Voncken; Roelof de Graaf; Elliot Oti; Stefan Weichselbaum; Richard Droste; ByeongSoo Lee; Chansam Chang; Young Seog Kang; Young Ha Kim; Jeong-Heung Kong; Jong Hoon Jang; YoungSun Nam; Hyunwoo Hwang
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Immersion lithography scanner resolution performance demonstration on 450mm substrates
Author(s): Christopher R. Carr; Hsin-Hui Huang; HyoungKook Kim; Shannon Dunn; Jasper P. Munson; Russell A. Black; Preston A. Crupe; Victor A. Perez; Takuya Kuroda
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Computational scanner wafer mark alignment
Author(s): Boris Menchtchikov; Robert Socha; Sudharshanan Raghunathan; Irina Lyulina; Hielke Schoonewelle; Patrick Tinnemans; Paul Tuffy; Philippe Leray; Christiane Jehoul
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Machine learning-based 3D resist model
Author(s): Seongbo Shim; Suhyeong Choi; Youngsoo Shin
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Improving the topography performance of ion implantation resist
Author(s): Lisong Dong; Wenhui Chen; Xiaojing Su; Yayi Wei
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Eliminate the vibration defect for laser interference lithography using an optical chopper system
Author(s): Yin-Kuang Yang; Hsuan-Ying Mai; Te-Hsun Lin; Yu-Hua Dzeng; Chien-Chung Fu
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The pattern-matching based OPC approach for preemptively fixing the weak points
Author(s): Yaojun Du
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Lithography and OPC friendly triple patterning decomposition method for VIA
Author(s): Guanyong Yan; Liang Li; Xiao Chen; Qingwei Liu; Yuanying Tu
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The ultra-violet partial coherence modulation transfer function for lithography
Author(s): Jiun-Woei Huang
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Constructing freeform source through the combination of neural network and binary ant colony optimization
Author(s): Frederick Lie; Hung-Fei Kuo
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Development of the next-generation ArF excimer laser with ultra-narrow stable spectral bandwidth for multiple patterning immersion lithography
Author(s): Hiroshi Furusato; Takahito Kumazaki; Takeshi Ohta; Hiroaki Tsushima; Akihiko Kurosu; Takashi Matsunaga; Hakaru Mizoguchi
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Excimer laser gas usage reduction technology for semiconductor manufacturing
Author(s): Masanori Yashiro; Takuma Oouchi; Hiroaki Tsushima; Akihiko Kurosu; Takeshi Ohta; Takashi Matsunaga; Hakaru Mizoguchi
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The thermal aberration analysis of a lithography projection lens
Author(s): Yanjie Mao; Sikun Li; Gang Sun; Jian Wang; Lifeng Duan; Yang Bu; Xiangzhao Wang
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Application of optical similarity in OPC model calibration
Author(s): Edita Tejnil
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Compact modeling for the negative tone development processes
Author(s): Fred Kuo; Jason Huang; Lawrence S. Melvin
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Addressing optical proximity correction challenges from highly nonlinear models
Author(s): Stephen Jang; Yunqiang Zhang; Tom Cecil; Howard Cai; Amyn Poonawala; Matt St. John
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Alignment solutions on FBEOL layers using ASML scanners
Author(s): Pavan Samudrala; Gregory Hart; Yen-Jen Chen; Lokesh Subramany; Haiyong Gao; Nyan Aung; Woong Jae Chung; Blandine Minghetti; Rajan Mali; Seva Khikhlovskyi; Pieter Heres
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Novel methodology to optimize wafer alignment to enhance 14nm on product overlay
Author(s): Pavan Samudrala; Woong Jae Chung; Lokesh Subramany; Haiyong Gao; Nyan Aung; Seung Chul Oh; Shawn Lee; Erik Delvigne; Blandine Minghetti
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Process of opto-mechanical design and assembly for reflective mirror subsystem of lithographic projection lens
Author(s): Wei-Cheng Lin; Shenq-Tsong Chang; Chien-Kai Chung; Yu-Chuan Lin; Shih-Feng Tseng
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Advanced application of pattern-aware OPC
Author(s): James Chen; Shin-Shing Yeh; Alan Zhu; Bayram Yenikaya; Fan-Hsuan Hsu; Yung-Ching Mai; Lawrence Lin; Nelson Lai
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Assessment of light source bandwidth impacts on image contrast enhancement using process window discovery
Author(s): Paolo Alagna; Greg Rechtsteiner; Will Conley; Andrew Cross; Kaushik Sah; Sandip Halder
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Advances in DUV light source sustainability
Author(s): Yzzer Roman; Dinesh Kanawade; Walt Gillespie; Siqi Luo; Mark Thever; Thomas Duffey; Kevin O'Brien; Rahul Ahlawat; Andrei Dorobantu; Eric Gross; Eric Mason
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Study of aging behaviour on 193nm phase-shift masks
Author(s): Félix Dufaye; Carlo Pogliani; Charles Crawford; Trent Hutchinson; Nicolas Thivolle; Laurent Lecarpentier; Frank Sundermann; Andrea Galbiati
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Image acquisition and motion positioning system design based on the projection lens wavefront aberration measurement
Author(s): Xiaoquan Han; Bing Li; Yuejing Qi; Guangyi Liu
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