Share Email Print
cover

PROCEEDINGS VOLUME 10146

Advances in Patterning Materials and Processes XXXIV
Editor(s): Christoph K. Hohle
Format Member Price Non-Member Price
Softcover $97.50 $130.00

Volume Details

Volume Number: 10146
Date Published: 2 May 2017
Softcover: 55 papers (508) pages
ISBN: 9781510607439

Table of Contents
show all abstracts | hide all abstracts
Front Matter: Volume 10146
Author(s): Proceedings of SPIE
DSA patterning options for logics and memory applications
Author(s): Chi-Chun Liu; Elliott Franke; Yann Mignot; Scott LeFevre; Stuart Sieg; Cheng Chi; Luciana Meli; Doni Parnell; Kristin Schmidt; Martha Sanchez; Lovejeet Singh; Tsuyoshi Furukawa; Indira Seshadri; Ekmini Anuja De Silva; Hsinyu Tsai; Kafai Lai; Hoa Truong; Richard Farrell; Robert Bruce; Mark Somervell; Daniel Sanders; Nelson Felix; John Arnold; David Hetzer; Akiteru Ko; Andrew Metz; Matthew Colburn; Daniel Corliss
Show Abstract
A numeric model for the imaging mechanism of metal oxide EUV resists
Author(s): W. D. Hinsberg; S. Meyers
Show Abstract
Reactivity of metal-oxalate EUV resists as a function of the central metal
Author(s): Steven Grzeskowiak; Amrit Narasimhan; Michael Murphy; Lee Napolitano; Daniel A. Freedman; Robert L. Brainard; Greg Denbeaux
Show Abstract
Photochemical conversion of tin-oxo cage compounds studied using hard x-ray photoelectron spectroscopy
Author(s): Yu Zhang; Jarich Haitjema; Xiaomeng Liu; Fredrik Johansson; Andreas Lindblad; Sonia Castellanos; Niklas Ottosson; Albert M. Brouwer
Show Abstract
Fundamentals of EUV resist-inorganic hardmask interactions
Author(s): Dario L. Goldfarb; Martin Glodde; Anuja De Silva; Indira Sheshadri; Nelson M. Felix; Krystelle Lionti; Teddie Magbitang
Show Abstract
Photoelectron scattering and acid release in EUV lithography: a simulation study (Conference Presentation)
Author(s): John J. Biafore
Show Abstract
Modeling and simulation of low-energy electron scattering in organic and inorganic EUV photoresists
Author(s): Alessandro Vaglio Pret; Trey Graves; David Blankenship; John J. Biafore
Show Abstract
Difference in EUV photoresist design towards reduction of LWR and LCDU
Author(s): Jing Jiang; Danilo De Simone; Geert Vandenberghe
Show Abstract
Separating the optical contributions to line-edge roughness in EUV lithography using stochastic simulations
Author(s): Anindarupa Chunder; Azat Latypov; Yulu Chen; John J. Biafore; Harry J. Levinson; Todd Bailey
Show Abstract
An investigation on "nano-swelling" phenomenon during resist dissolution using in situ high-speed atomic force microscopy
Author(s): Julius Joseph Santillan; Toshiro Itani
Show Abstract
Embedded top-coat for reducing the effect out of band radiation in EUV lithography
Author(s): Ke Du; Meiliana Siauw; David Valade; Marek Jasieniak; Nico Voelcker; Peter Trefonas; Jim Thackeray; Idriss Blakey; Andrew Whittaker
Show Abstract
Challenges and progress in low defectivity for advanced ArF and EUV lithography processes using surface localized material technology
Author(s): Michihiro Shirakawa; Hideaki Tsubaki; Hajime Furutani; Wataru Nihashi; Naohiro Tango; Kazuhiro Marumo; Kei Yamamoto; Hidenori Takahashi; Akiyoshi Goto; Mitsuhiro Fujita
Show Abstract
Photosensitized Chemically Amplified Resist (PSCAR) 2.0 for high-throughput and high-resolution EUV lithography: dual photosensitization of acid generation and quencher decomposition by flood exposure
Author(s): Seiji Nagahara; Michael Carcasi; Gosuke Shiraishi; Hisashi Nakagawa; Satoshi Dei; Takahiro Shiozawa; Kathleen Nafus; Danilo De Simone; Geert Vandenberghe; Hans-Jürgen Stock; Bernd Küchler; Masafumi Hori; Takehiko Naruoka; Tomoki Nagai; Yukie Minekawa; Tomohiro Iseki; Yoshihiro Kondo; Kosuke Yoshihara; Yuya Kamei; Masaru Tomono; Ryo Shimada; Serge Biesemans; Hideo Nakashima; Philippe Foubert; Elizabeth Buitrago; Michaela Vockenhuber; Yasin Ekinci; Akihiro Oshima; Seiichi Tagawa
Show Abstract
Double-deprotected chemically amplified photoresists (DD-CAMP): higher-order lithography
Author(s): William Earley; Deanna Soucie; Kenji Hosoi; Arata Takahashi; Takashi Aoki; Brian Cardineau; Koichi Miyauchi; Jay Chun; Michael O'Sullivan; Robert Brainard
Show Abstract
Patterning with metal-oxide EUV photoresist: patterning capability, resist smoothing, trimming, and selective stripping
Author(s): Ming Mao; Frederic Lazzarino; Peter De Schepper; Danilo De Simone; Daniele Piumi; Vinh Luong; Fumiko Yamashita; Michael Kocsis; Kaushik Kumar
Show Abstract
Unexpected impact of RIE gases on lithographic films
Author(s): M. Glodde; R. L. Bruce; M. J. P. Hopstaken; M. R. Saccomanno; N. Felix; K. E. Petrillo; B. Price
Show Abstract
Exploration of a low-temperature PEALD technology to trim and smooth 193i photoresist
Author(s): Frederic Lazzarino; Sara Paolillo; Anthony Peter; David De Roest; TaeGeun Seong; Yizhi Wu; Stefan Decoster; Vito Rutigliani; Gian Francesco Lorusso; Vassilios Constantoudis; Sven Van Elshocht; Daniele Piumi; Kathy Barla
Show Abstract
High-aspect ratio silicon structures by displacement Talbot lithography and Bosch etching
Author(s): Konstantins Jefimovs; Lucia Romano; Joan Vila-Comamala; Matias Kagias; Zhentian Wang; Li Wang; Christian Dais; Harun Solak; Marco Stampanoni
Show Abstract
Modeling of NTD resist shrinkage
Author(s): Thomas Mülders; Hans-Jürgen Stock; Bernd Küchler; Ulrich Klostermann; Weimin Gao; Wolfgang Demmerle
Show Abstract
A novel methodology for litho-to-etch pattern fidelity correction for SADP process
Author(s): Shr-Jia Chen; Yu-Cheng Chang; Arthur Lin; Yi-Shiang Chang; Chia-Chi Lin; Jun-Cheng Lai
Show Abstract
Nano-defect management in directed self-assembly of block copolymers (Conference Presentation)
Author(s): Tsukasa Azuma; Yuriko Seino; Hironobu Sato; Yusuke Kasahara; Katsuyoshi Kodera; Phubes Jiravanichsakul; Teruaki Hayakawa; Kenji Yoshimoto; Mikihito Takenaka
Show Abstract
Directed self-assembly enabled fully self-aligned via processing (Conference Presentation)
Author(s): Paulina A. Rincon-Delgadillo; Gayle Murdoch; Roel Gronheid; Ryoung-Han Kim; Jürgen Bömmels
Show Abstract
Electrical study of DSA shrink process and CD rectification effect at sub-60nm using EUV test vehicle
Author(s): Cheng Chi; Chi-Chun Liu; Luciana Meli; Jing Guo; Doni Parnell; Yann Mignot; Kristin Schmidt; Martha Sanchez; Richard Farrell; Lovejeet Singh; Tsuyoshi Furukawa; Kafai Lai; Yongan Xu; Daniel Sanders; David Hetzer; Andrew Metz; Sean Burns; Nelson Felix; John Arnold; Daniel Corliss
Show Abstract
Dual brush process for selective surface modification in graphoepitaxy directed self-assembly
Author(s): Jan Doise; Boon Teik Chan; Masafumi Hori; Roel Gronheid
Show Abstract
Use of sequential infiltration synthesis to improve the pattern transfer of PS-b-PLA DSA (Conference Presentation)
Author(s): Laura Evangelio Araujo; Marta Fernández-Regúlez; Xavier Chevalier; Célia Nicolet; Ian Cayrefourcq; Christophe Navarro; Guillaume Fleury; Francesc Pérez-Murano
Show Abstract
Highχ block copolymers for directed self-assembly patterning without the need for topcoat or solvent annealing
Author(s): Kui Xu; Mary Ann Hockey; Eric Calderas; Douglas Guerrero; Daniel Sweat; Jeffrey Fiehler; Richard Daugherty
Show Abstract
A track process for solvent annealing of high-χ BCPs
Author(s): Douglas J. Guerrero; Kaumba Sakavuyi; Kui Xu; Ahmed Gharbi; Raluca Tiron; Isabelle Servin; Laurent Pain; Guillaume Claveau; Harold Stokes; Masahiko Harumoto; Célia Nicolet; Xavier Chevalier
Show Abstract
Hemicellulose block copolymers made from woods for wide-range directed self-assembly lithography enabling wider range of applicable patterning size
Author(s): Kazuyo Morita; Kimiko Yamamoto
Show Abstract
Optimized phase field models in confinement: fast and accurate simulations of directed self-assembly
Author(s): Jimmy Liu; Kris T. Delaney; Glenn H. Fredrickson
Show Abstract
Estimation of effects of thermal fluctuations in graphoepitaxy DSA of cylinder-forming block copolymers
Author(s): Alec Bowen; Azat Latypov; Todd Bailey
Show Abstract
Suppression of thermal fluctuation placement errors in linear arrays of block copolymer cylinders
Author(s): Corinne L. Carpenter; Kris T. Delaney; Glenn H. Fredrickson
Show Abstract
Evaluating structure in thin block copolymer films with soft x-rays (Conference Presentation)
Author(s): Daniel Sunday; Christopher Liman; Adam F. Hannon; Jiaxing Ren; Xuanxuan Chen; Hyo Seon Suh; Juan J. de Pablo; Paul F. Nealey; R. Joseph Kline
Show Abstract
Lamellar orientation of block copolymer using polarity switch of nitrophenyl self-assembled monolayer induced by electron beam
Author(s): Hiroki Yamamoto; Guy Dawson; Takahiro Kozawa; Alex P. G. Robinson
Show Abstract
Development of TiO2 containing hardmasks through PEALD deposition
Author(s): Anuja De Silva; Indira Seshadri; Kisup Chung; Abraham Arceo; Luciana Meli; Brock Mendoza; Yasir Sulehria; Yiping Yao; Madhana Sunder; Hao Truong; Shravan Matham; Ruqiang Bao; Heng Wu; Nelson M. Felix; Sivananda Kanakasabapathy
Show Abstract
Investigation on spin-on hard mask integration
Author(s): Yushin Park; Seungwook Shin; Yunjun Kim; Seunghyun Kim; Jaebum Lim; Sung Hwan Kim; Hyeonil Jung; Chungheon Lee; Miyeon Han; Sanghak Lim; Jeong Yun Yu
Show Abstract
Novel gap filling BARC with high chemical resistance
Author(s): Hiroto Ogata; Yuto Hashimoto; Yuki Usui; Mamoru Tamura; Tomoya Ohashi; Yasushi Sakaida; Takahiro Kishioka
Show Abstract
CMOS patterning over high-aspect ratio topographies for N10/N7 using spin-on carbon hardmasks
Author(s): Toby Hopf; Monique Ercken; Geert Mannaert; Eddy Kunnen; Zheng Tao; Nadia Vandenbroeck; Farid Sebaai; Yoshiaki Kikuchi; Hans Mertens; Stefan Kubicek; Steven Demuynck; Naoto Horiguchi
Show Abstract
Inkjet-based adaptive planarization (Conference Presentation)
Author(s): Shrawan Singhal; Michelle M. Grigas; Niyaz Khusnatdinov; Srinivasan V. Sreenivasan
Show Abstract
Development of a robust reverse tone pattern transfer process
Author(s): Niyaz Khusnatdinov; Gary Doyle; Douglas J. Resnick; Zhengmao Ye; Dwayne LaBrake; Brennan Milligan; Fred Alokozai; Jerry Chen
Show Abstract
Pattern uniformity control in integrated structures
Author(s): Shinji Kobayashi; Soichiro Okada; Satoru Shimura; Kathleen Nafus; Carlos Fonseca; Serge Biesemans; Masashi Enomoto
Show Abstract
Advanced hole patterning technology using soft spacer materials (Conference Presentation)
Author(s): Jong Keun Park; Phillip D. Hustad; Emad Aqad; David Valeri; Mike D. Wagner; Mingqi Li
Show Abstract
Line end shortening and iso-dense etch bias improvement by ALD spacer shrink process
Author(s): Rui Chen; Granger Lobb; Aleksandra Clancy; Bradley Morgenfeld; Shyam Pal
Show Abstract
Fabrication of MoS2 biosensor to detect lower-concentrated area of biological molecules(Conference Presentation)
Author(s): Erika Yang; Byunghoon Ryu; Hongsuk Nam; Xiaogan Liang
Show Abstract
Chemical changes in hybrid photoresists before and after exposure by in situ NEXAFS analysis
Author(s): Roberto Fallica; Benjamin Watts; Gioia Della Giustina; Laura Brigo; Giovanna Brusatin; Yasin Ekinci
Show Abstract
Chemically amplified i-line positive resist for next-generation flat panel display
Author(s): Hsing-Chieh Lee; Ying-Hao Lu; Shin-Yih Huang; Wei-Jen Lan; Makoto Hanabata
Show Abstract
High-resolution, high-throughput, CMOS-compatible electron-beam patterning
Author(s): Melissa A. Smith; Steven A. Vitale; Theodore H. Fedynyshyn; Matthew T. Cook; Joel Maldonado; Dmitri Shapiro; Mordechai Rothschild
Show Abstract
Nanoimprint lithography using gas permeable template
Author(s): Makoto Hanabata; Satoshi Takei; Shinya Nakajima; Naoto Sugino; Yoko Matsumoto; Atsushi Sekiguchi
Show Abstract
Development of novel purifiers with appropriate functional groups based on solvent polarities at bulk filtration
Author(s): Tetsu Kohyama; Fumiya Kaneko; Saksatha Ly; James Hamzik; Jad Jaber; Yoshiaki Yamada
Show Abstract
Effects of phenolic compound addition to fractionated Novolak-based resists to improve resolution capability(2)
Author(s): Atsushi Sekiguchi; Yoko Matsumoto; Yoshihisa Sensu; Satoshi Takei; Makoto Hanabata; Hatsuyuki Tanaka
Show Abstract
Study for new hardmask process scheme
Author(s): Daeyoup Lee; Phillip Tatti; Richard Lee; Jack Chang; Winston Cho; Sanggil Bae
Show Abstract
Pattern optimizing verification of self-align quadruple patterning
Author(s): Masatoshi Yamato; Kazuki Yamada; Kenichi Oyama; Arisa Hara; Sakurako Natori; Shouhei Yamauchi; Kyohei Koike; Hidetami Yaegashi
Show Abstract
Optimize of shrink process with X-Y CD bias on hole pattern
Author(s): Kyohei Koike; Arisa Hara; Sakurako Natori; Shohei Yamauchi; Masatoshi Yamato; Kenichi Oyama; Hidetami Yaegashi
Show Abstract
Pattern collapse solution for asymmetric pattern
Author(s): C. J. Tu; C. H. Huang; Elvis Yang; T. H. Yang; K. C. Chen
Show Abstract
New processes associated with electron-beam lithography for ultra-small resonators
Author(s): Landobasa Y. M. Tobing; Dao Hua Zhang
Show Abstract
Free energy of defects in chemoepitaxial block copolymer directed self-assembly: effect of pattern density and defect position
Author(s): Benjamin D. Nation; Caleb L. Breaux; Peter J. Ludovice; Clifford L. Henderson
Show Abstract
DSA process window expansion with novel DSA track hardware
Author(s): Masahiko Harumoto; Harold Stokes; Yuji Tanaka; Koji Kaneyama; Chalres Pieczulewski; Masaya Asai; Maxime Argoud; Isabelle Servin; Gaëlle Chamiot-Maitral; Guillaume Claveau; Raluca Tiron; Ian Cayrefourcq
Show Abstract
Orientation control of silicon containing block-co-polymer with resolution beyond 10nm
Author(s): Yasunobu Someya; Ryuta Mizuochi; Hiroyuki Wakayama; Shinsuke Tadokoro; Masami Kozawa; Rikimaru Sakamoto
Show Abstract
Development of mass production technology for block copolymer lithographic materials
Author(s): Toshiyuki Himi; Ryota Matsuki; Terumasa Kosaka; Ryosuke Ogaki; Yukio Kawaguchi; Tetsuo Shimizu
Show Abstract
Study on thick film spin-on carbon hardmask
Author(s): Taeho Kim; Youngmin Kim; Sunmin Hwang; Hyunsoo Lee; Miyeon Han; Sanghak Lim
Show Abstract
Study of flowability effect on self-planarization performance at SOC materials
Author(s): Huichan Yun; Jinhyung Kim; Youjung Park; Yoona Kim; Seulgi Jeong; Jaeyeol Baek; Byeri Yoon; Sanghak Lim
Show Abstract
Novel spin on planarization technology by photo curing SOC (P-SOC)
Author(s): Takafumi Endo; Rikimaru Sakamoto; Keisuke Hashimoto; Daigo Saito; Hirokazu Nishimaki; Ryo Karasawa; Hikaru Tokunaga
Show Abstract
Development of high heat resistant polyphenols applied to the spin-on carbon hardmask
Author(s): Tomoaki Takigawa; Junya Horiuchi; Naoya Uchiyama; Kana Okada; Yoko Shimizu; Takashi Makinoshima; Takashi Sato; Masatoshi Echigo
Show Abstract
Factors analysis on the physical properties of the low-temperature SOC of memory cell characteristics
Author(s): Doyoung Kwak; Jaeyeol Kim; Jihoon Park; Jeonqsu Park; Sungkoo Lee; Seomin Kim; Taewoo Jung; Hyeongsoo Kim
Show Abstract
Metal reduction at bulk chemical filtration
Author(s): Toru Umeda; Shusaku Daikoku; Shuichi Tsuzuki; Tetsuya Murakami
Show Abstract
Continuous improvements of defectivity rates in immersion photolithography via functionalized membranes in point-of-use photochemical filtration
Author(s): Lucia D'Urzo; Hareen Bayana; Jelle Vandereyken; Philippe Foubert; Aiwen Wu; Jad Jaber; James Hamzik
Show Abstract
Advanced lithographic filtration and contamination control for 14nm node and beyond semiconductor processes
Author(s): Rao Varanasi; Michael Mesawich; Patrick Connor; Lawrence Johnson
Show Abstract
Analytical techniques for mechanistic characterization of EUV photoresists
Author(s): Steven Grzeskowiak; Amrit Narasimhan; Michael Murphy; Christian Ackerman; Jake Kaminsky; Robert L. Brainard; Greg Denbeaux
Show Abstract

© SPIE. Terms of Use
Back to Top