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Proceedings of SPIE Volume 0811

Optical Microlithographic Technology for Integrated Circuit Fabrication and Inspection
Editor(s): Harry L. Stover; Stefan Wittekoek
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Volume Details

Volume Number: 0811
Date Published: 17 September 1987
Softcover: 25 papers (221) pages
ISBN: 9780892528462

Table of Contents
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Recent Developments In Electron Beam Lithography
Author(s): S. Radelaar
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Mass-Production Of Diffraction Limited Replicated Objective Lenses For Compact-Disc Players.
Author(s): Joop Andrea
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CD Control Issues In Submicron Optical Lithography
Author(s): Mung Chen
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Quality Of Microlithographic Projection Lenses
Author(s): Joseph Braat
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Submicron Optical Lithography With High Resolution I-Line Lens
Author(s): L. Sebastian; N. Lehner; F. Bieringer; W. Arden
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Interference Microscopy Of Surface Relief Structures
Author(s): D. M. Gale; M. I. Pether; F. C. Reavell
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Practical Photolithography For Modern Semiconductor Production
Author(s): Walter G. Hertlein
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The Mechanism Of The Desire Process
Author(s): B. Roland; R. Lombaerts; C. Jakus; F. Coopmans
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Mechanism And Kinetics Of Silylation Of Resist Layers From The Gas Phase
Author(s): Robert-Jan Visser; Jack P. W. Schellekens; Marian E. Reuhman-Huisken
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A Novel Technique For The Control Of Resist Profiles When Exposing With Steppers.
Author(s): F. Debaene; J. M. Dumant; B. Latombe
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Residues Formation And Surface Contamination In Submicronic Definition Multilayers Structures Obtained By Reactive Ion Etching
Author(s): J. Etrillard
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Prediction Of Shelf-Lives Of Positive Photoresists Based On Accelerated Aging Techniques Kinetic Evaluation Of Various Parameters
Author(s): G. Wijbenga; M. S. Chen; S. A. Fine
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Measurement Facilities On A Laser Ionization Mass Spectrometer
Author(s): A. Czitrovszky; P. Jani; P. Juhasz; A. Vertes
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Application To Bilayer System With Water-Soluble Contrast Enhancing Material
Author(s): Mitsuo Yabuta; Naoki Ito; Hiroyuki Yamazaki; Toshimasa Nakayama
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Registration Accuracy And Critical Dimension Control For A 5X Reduction Stepper With Magnification Control
Author(s): F. J. van Hout; M. A. van den Brink; S. Wittekoek
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I-Line Wafer Stepper Technology For Gallium Arsenide Applications
Author(s): Michele Nuhn; Shi-Kay Yao; Brad Avrit
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Advances In 1:1 Optical Lithography
Author(s): Adonis C. Stephanakis; Daniel I. Rubin; Ron Voisin
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An Advanced Wafer Stepper For Sub-Micron Fabrication
Author(s): Herbert E. Mayer; Ernst W. Loebach
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Bilevel System HPR/PMMA
Author(s): Andre P. Weill; Elisabeth C. Dechenaux; Patrick J. Paniez; Gilles R. Amblard
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Positive Near-UV Resist For Bilayer Lithography
Author(s): R. Sezi; R. Leuschner; c. Nolscher; D. Stephani
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Characterization of commercial dyes for PMMA bilayer systems
Author(s): Patrick J. Paniez; Gilles R. Amblard; Elisabeth C. Dechenaux; Andre P. Weill
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Characterization Of A New Organosilicon Photoresist
Author(s): Wells C. Cunningham; Janet C. McFarland; Chan-Eon Park
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A Contrast Enhanced Reflectionless Process (CER)
Author(s): J. Ch. Guibert; M. Chevallier
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Vitreous Chalcogenide Gesey Thin Films Obtained By Plasma Enhanced Chemical Vapor Deposition
Author(s): M. Ribes; B. Cros; P. Julien
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Reactive Ion Etching Of Silicon Dioxide
Author(s): Peter C. Sukanek; Glynis Sullivan
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