Share Email Print
cover

Proceedings of SPIE Volume 0772

Optical Microlithography VI
Editor(s): Harry L. Stover
Format Member Price Non-Member Price
Softcover $105.00 * $105.00 *

*Available as a photocopy reprint only. Allow two weeks reprinting time plus standard delivery time. No discounts or returns apply.


Volume Details

Volume Number: 0772
Date Published: 1 January 1987
Softcover: 33 papers (298) pages
ISBN: 9780892528073

Table of Contents
show all abstracts | hide all abstracts
Chairman's Pre-Conference Overview. Lens Specifications And Distortions
Author(s): Harry L. Stover
Show Abstract
Practical Characterization Of 0.5 Um Optical Lithography
Author(s): Donis G. Flagello; Andrew T. S. Pomerene
Show Abstract
Focus : The Critical Parameter For Submicron Optical Lithography :Part 2
Author(s): William H. Arnold; Harry J. Levinson
Show Abstract
Proximity Effects In Submicron Optical Lithography
Author(s): Paul Chien; Mung Chen
Show Abstract
New I-Line Lenses For Submicron Lithography
Author(s): Setha G. Olson
Show Abstract
Practical Considerations Of Submicron Photolithography
Author(s): Michele Nuhn; Shi Kay Yao; Todd Johnson; Brad Avrit
Show Abstract
Intelligent Optical System Of A New Stepper
Author(s): Akiyoshi Suzuki; Shuuichi Yabu; Masami Ookubo
Show Abstract
A Novel Method For Improving The Defocus Tolerance In Step And Repeat Photolithography
Author(s): Tetsuya Hayashida; Hiroshi Fukuda; Toshihiko Tanaka; Norio Hasegawa
Show Abstract
Advances In 1:1 Optical Lithography
Author(s): Adonis C. Stephanakis; Daniel I. Rubin
Show Abstract
Ring-Field Vs Full-Field Projection Systems: An Optical Performance Comparison
Author(s): Subhash Chandra; Frederick Y. Wu
Show Abstract
Generation Of Design Rules Consistent With Lithographic Capability
Author(s): Christopher P. Ausschnitt; Shaunee Cheng; Michael Lutz
Show Abstract
"Performance Of A Wafer Stepper With Automatic Intra-Die Registration Correction."
Author(s): M. A. van den Brink; S. Wittekoek; H. F. D. Linders; F. J. van Hout; R. A. George
Show Abstract
Optical Consideration In Target Alignment Using Non-Actinic Wavelength Microscope
Author(s): Shi-Kay Yao
Show Abstract
Advanced Optical Overlay Measurement System
Author(s): Daniel R. Cote; Robert H. Clayton; Jeanne E. Lazo-Wasem
Show Abstract
Theoretical Models For The Optical Alignment Of Wafer Steppers
Author(s): Chris P. Kirk
Show Abstract
Dark Field Technology - A Practical Approach To Local Alignment
Author(s): David R. Beaulieu; Paul P. Hellebrekers
Show Abstract
Measurement And Control Of Wafer Temperature In A Plasma Etching Reactor
Author(s): Diane Vogel; Fred Wong
Show Abstract
Dry Development With Reactive Ion Etching (RIE) And Magnetron Enhanced Etching (MIE) Technology
Author(s): F. Coopmans; G. Brassuer; B. Roland; R. Lombaerts; S. Till
Show Abstract
Tapered Wet Etching Of Contacts Using A Trilayer Silox Structure
Author(s): Martin P. Karnett
Show Abstract
Exposure Matching Of Polychromatic Exposure Systems
Author(s): William A. Keese
Show Abstract
The Improvement Of Stepper Process Latitude By Resist Process
Author(s): Tony Y. Liu
Show Abstract
Liquid Particle Counting - Part Ii Methodology Development And Statistical Process Control
Author(s): Jeffrey K. Hecht; Edward J. Reardon; Douglas A. Thompson
Show Abstract
Modeling The Images Of Alignment Marks Under Photoresist
Author(s): G. M. Gallatin; J. C. Webster; E. C. Kintner; F. Wu
Show Abstract
Identifying And Monitoring Effects Of Lens Aberrations In Projection Printing
Author(s): Kenny K.H. Toh; Andrew R. Neureuther
Show Abstract
Application Specific Wafer Stepper
Author(s): Dick Fallon; James R. Shih
Show Abstract
Results Of Automating A Photolithography Cell In A Clean Tunnel
Author(s): David H. June
Show Abstract
Photomask Protection Using Glass Coverplates
Author(s): Terrence E. Zavecz; Edward L. Banks
Show Abstract
Impact Of Wafer Flatness On Submicron Optical Lithography
Author(s): Ling Liauw; Andrew Muray; Mung Chen
Show Abstract
Contact Hole Imaging In Stepper Lithography
Author(s): L. K. White
Show Abstract
High-Speed Reticle Qualification System
Author(s): Hirobumi Ishihara; Tokuro Sooma; Morio Misonoo; Kei Takatsu; Kiyohiko Akanuma
Show Abstract
Pattern Verification Through Die-To-Database Inspection
Author(s): Eileen Jozefov; Wayne Ruch
Show Abstract
Performance Evaluation Of The Ateq Core-2000 Scanning Laser Reticle Writer
Author(s): Gary A. Burns; James A. Schoeffel
Show Abstract
Defect Fidelity On Chrome And Aluminum Coated Glass Wafers.
Author(s): James A. Reynolds; David B. Fundakowski
Show Abstract

© SPIE. Terms of Use
Back to Top