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Proceedings of SPIE Volume 0633

Optical Microlithography V
Editor(s): Harry L. Stover
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Volume Details

Volume Number: 0633
Date Published: 20 August 1986
Softcover: 40 papers (315) pages
ISBN: 9780892526680

Table of Contents
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A Glimpse Into The Future Of Optical Lithography
Author(s): Harry L. Stover
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Excimer Laser-Based Lithography: A Deep Ultraviolet Wafer Stepper
Author(s): Victor Pol; James H. Bennewitz; Gary C. Escher; Martin Feldman; Victor A. Firtion; Tanya E. Jewell; Bruce E. Wilcomb; James T. Clemens
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New Projection Lenses For Optical Stepper
Author(s): Kazuo Ushida; Masaomi Kameyama; Satoru Anzai
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Practical I-Line Lithography
Author(s): Mike Tipton; Vic Marriott; Gene Fuller
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A New Lens For Submicron Lithography And Its Consequences For Wafer Stepper Design
Author(s): J. Biesterbos; A. Bouwer; G. V. Engelen; G . V. D. Looij; J. V. D. Werf
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Where Is The Lost Resolution?
Author(s): Burn J. Lin
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Excimer Laser Projection Patterning With And Without Resists: Submicrometer Etching Of Diamond And Diamond-Like Carbon Resist
Author(s): M. Rothschild; C. Arnonet; D. J. Ehrlich
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Direct-Referencing Automatic Two-Points Reticle-To-Wafer Alignment Using A Projection Column Servo System
Author(s): M. A. v. d. Brink; H. F. D. Linders; S. Wittekoek
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Relative Alignment By Direct Wafer Detection Utilizing Rocking Illumination Of Ar Ion Laser
Author(s): Yoshitada Oshida; Masataka Shiba; Atsuhiro Yoshizaki
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Alignment Wavelength Optimization For Wafer Stepper Microscope
Author(s): Sungmuk Lee; Shi-kay Yao; Michele Nuhn
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Fractured Alignment Mark Technology For Wafer Steppers
Author(s): G. A. Hungerford; D. Rector; D. Sandford; D. W. Tomes
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A Simple Method To Determine Alignment Tolerance In Photolithography Process
Author(s): Wei Wu; Sunny Cheng
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Electrical Methods For Precision Stepper Column Optimization
Author(s): Ludwik J. Zych; Gianpaolo Spadini; Talat F. Hasan; Beth A. Arden
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Characterization And Setup Techniques For A 5X Stepper
Author(s): T. A. Brunner; S. M. Stuber
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Mixing And Matching Of Wafer Steppers And Wafer Scanners For Cost-Effective, High-Volume Device Production
Author(s): Harry Sewell; Myles Gansfried
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Impact Of 1X Reticle Defects For Submicron Production Lithography
Author(s): K. L. Zollinger; C. P. O'Mahony; M. S. Chang
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Die-To-Database Inspection - An Effective Method Of Detecting And Locating Defects On Reticles
Author(s): Eileen Jozefov; Steve Follis; Wayne Ruch
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Design-Data Based Inspection Of Photomasks And Reticles
Author(s): Seiichi Yabumoto; Tetsuyuki Arai; Yoshihiko Fujimori; Toru Azuma
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Mask Specs And Equipment Specs - Disparity And Reconciliation
Author(s): Paul A. Warkentin; James A. Schoeffel; Ric Diola; Gianpaolo Spadini
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Exposing Patterns With A Scanning Laser System
Author(s): Shi-kay Yao; Boris Meshman
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Removal Of Mask Registration Errors Using Full-Field Mask Aligners
Author(s): R. M. Young; D. P. Mathur; D. H. Berry
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Clear Defect Photolithographic Mask Repair In Open Air Using Laser-Induced Pyrolytic Decomposition
Author(s): Zbigniew Drozdowicz; Joel Bornstein; John O'Connor
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Controlling Etch Profiles: The Effect Of Controlling Ion Transport
Author(s): Frank C. See
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Aluminum Taper Etching Using Resist/a-Si/Al Structure
Author(s): Hiroshi Hoga; Masayoshi Kanaya; Sadao Suganuma
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Overview Of Dry-Etch Techniques
Author(s): John M. Salzer
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Planarization Profile Measurement Using A Confocal Scanning Laser Microscope
Author(s): Ian R. Smith; Simon D. Bennett; James T. Lindow; Kevin Monahan
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Renewed Energy For The Perkin-Elmer 140, 240, 340 Projection Printers
Author(s): John Lent
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High Resolution Linewidth Control In Optical Microlithography
Author(s): Catherine M. Ngo
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An Analysis Of The Relevance To Linewidth Control Of Various Aerial Image Characteristics
Author(s): Graeme D. Maxwell; Rene Vervoordeldonk
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Detecting Straight Edge In General Partially Coherent Cases
Author(s): Jian Yang; Shudong Wu; Zhijiang Wang
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A Concept For A High Resolution Optical Lithographic System For Producing One-Half Micron Linewidths
Author(s): George O. Reynolds
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Two-Dimensional Optical Proximity Effects
Author(s): Philip D. Flanner; Shankar Subramanian; Andrew R. Neureuther
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Image Intensity Distribution Of Double Spaced Contact Holes
Author(s): Nikhil N. Kundu; Sanjay Goel; Shri N. Gupta; Bhvanesh P. Mathur
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Simulations Of Optical Lithography Test Structures: Murray Daggers And Contact Arrays
Author(s): Andrew Muray; Doug Thompson
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Enhanced Performance Of Optical Lithography Using The DESIRE System
Author(s): Fedor Coopmans; Bruno Roland
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Elimination Of Mask-Induced Defects With Vote-Taking Lithography
Author(s): Chong-Cheng Fu; David H. Dameron; Anthony McCarthy
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Liquid Particle Counting Of Photoresists And Auxiliaries For Defect Control
Author(s): Jeffrey K. Hecht; Edward J. Reardon; Douglas A. Thompson
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Scanning Laser Technology Applied to High Speed Reticle Writing
Author(s): Paul A. Warkentin; James A. Schoeffel
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A 10:1 Photomask Reduction Camera
Author(s): Katalin Voros; Pantas Sutardja; William G. Oldham
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STARR: Stepper Test Alignment Resolution Reticle For The Lithographic Characterization Of A Sub-Micron Stepper
Author(s): Robert P. Hardin; Mark P. Gulden
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