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Proceedings of SPIE Volume 0565

Micron and Submicron Integrated Circuit Metrology
Editor(s): Kevin M. Monahan
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Volume Details

Volume Number: 0565
Date Published: 2 January 1986
Softcover: 30 papers (229) pages
ISBN: 9780892526000

Table of Contents
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Automatic Wafer Stepper Calibration And Testing
Author(s): Chris K. Van Peski
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In Situ Resolution and Overlay Measurement on a Stepper
Author(s): T. A. Brunner; R. R. Allen
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Accurate Mask-To-Wafer Gap Measurements In The EBP Lithography Tool
Author(s): W. Z apka; W. Haug; H. Bohlen
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Precision Wafer-Stepper Alignment And Metrology Using Diffraction Gratings And Laser Interferometry
Author(s): S. Wittekoek; H. Linders; H. Stover; G. Johnson; D. Gallagher; R. Fergusson
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Increasing The Registration Accuracy Of Step And Repeat Systems Through Software Improvement
Author(s): M. Yeung; J. Langston; C. Sparkes
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Piezoelectric Translators With Submicron Accuracy
Author(s): Karl Spanner; Harry Marth; Warren Gutheil
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SMART SET - An Integrated Approach to Stepper Set-Up and Calibration
Author(s): Raul V. Tan; Christopher P. Ausschnitt
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Optical Stethoscopy: Imaging With X/20
Author(s): D. W. Pohl; W. Denk; U. Duerig
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Modelling Optical Linewidth Measurement Techniques In Order To Improve Precision And Accuracy.
Author(s): Chris P. Kirk; Andrew W. Gurnell
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A Phase Sensitive Scanning Optical Microscope
Author(s): P. C. D. Hobbs; R. L. Jungerrran; G. S. Kino
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Scanned Laser Imaging For Integrated Circuit Metrology
Author(s): James T. Lindow; Simon D. Bennett; Ian R. Smith
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Measuring Optically Induced Currents With The Laser Scan Microscope
Author(s): Hajo Hinkelmann
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Ellipsometric Metrology Of Ultrathin Films: Dual Angle Of Incidence
Author(s): Deane Chandler-Horowitz
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Surface Topography Studies Of Nanocrystalline Si by STM
Author(s): D. W. Pohl; J. K. Gimzewski; A. Humbert; S. Vepek
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Focused-Beam Vs. Conventional Bright-Field Scanning Microscopy For Integrated Circuit Metrology
Author(s): D. Nyyssonen
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Evaluations of a Commercially Available Electrical Probe
Author(s): Gerald Keller; Eric Johnson
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Electrical Measurements of Sidewall Spacer Dimensions
Author(s): T. W. Bril; J. M. De Blasi; L. Gutai; M. Chu
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Analysis of Defects in Single Level Conducting Films
Author(s): R. R. Allen; T. A. Brunner; R. P. Bane
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Metrology Techniques for X-ray Lithography System Characterization
Author(s): B. Fay; V. Nagaswami; L. Tai
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Parametric Analysis Of The CD Control Obtained Using Advanced Wafer Steppers
Author(s): Steven A. Lis
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Correlation Of Submicron Linewidths Derived From Electrical And Electron-Optical Methods.
Author(s): Michael T. Reilly
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SEM Measurements In Lithographic Metrology
Author(s): Kenneth S. Maher; Hans R. Rottmann
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Use Of A Scanning Electron Microscope For Critical Dimension Measurements On A Semiconductor Production Line
Author(s): Peter W. Grant
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Nanometer-resolution SEM Metrology in a Hostile Laboratory Environment
Author(s): Kevin M. Monahan; David S. Lim
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SEM-based System For Calibration Of Linewidth SRMs For The IC industry
Author(s): D. Nyyssonen; M. T. Postek
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Precise Measurements In A Scanning Electron Microscope
Author(s): Tyler North
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Edge Recognition in SEM Metrology
Author(s): J. F. Mancuso; S. Erasmus
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Hitachi S-6000 Field Emission CD-Measurement SEM
Author(s): T. Ohtaka; S. Saito; T. Furuya; O. Yamada
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SCANLINE - A Dedicated Fab Line SEM LW Measurement System
Author(s): Rod Norville
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Computer Controlled E-Beam CC-CD System
Author(s): Donald J. Evins; Stewart Spiers
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