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Integrated Circuit Metrology II
Editor(s): Diana Nyyssonen
Format Member Price Non-Member Price
Softcover $105.00 * $105.00 *

*Available as a black-and-white photocopy reprint only. Allow two weeks reprinting time plus standard delivery time. No discounts or returns apply.

Volume Details

Volume Number: 0480
Date Published: 15 October 1984
Softcover: 22 papers (178) pages
ISBN: 9780892525157

Table of Contents
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An Ellipsometry System For High Accuracy Metrology Of Thin Films
Author(s): George A. Candela; Deane Chandler-Horowitz
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Infrared Ellipsometry On Silicon Wafers
Author(s): Thomas A. Leonard; John S. Loomis
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Semiconductor Wafer Inspection
Author(s): Lionel R. Baker
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Photoresist Thickness Measurements Using Energy Dispersive X-Ray Spectroscopy
Author(s): M. Mieth; R. A. Barker; S. L. Packer
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Optical Measurement Uncertainties And, Process Tolerances
Author(s): Peter Grant; Tim Fahey
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Analysis Of Linewidth Measurement Techniques For The Purpose Of Automation.
Author(s): Chris P. Kirk; Derek S. Moore; John C.C. Nelson
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Aim-An Automated Inspection Microscope For Measuring Critical Dimensions
Author(s): Ronald J. LeMaster
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A New Technique For Linewidth Measurement On 1 Pm Geometry Process Wafers Using Fluorescence
Author(s): James J. Chisholm
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A Fluorescent Linewidth Measurement System For Vlsi Fabrication
Author(s): Stephen J. Erasmus; Michael L. Reed; Ulrich Kaempf
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Optical Linewidth Measurement On Patterned Metal Layers
Author(s): D. Nyyssonen
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Fourier Transform Method For Optical Linewidth Measurement
Author(s): M . E. Guillaume; N. M. Noailly; J. C. Reynaud; J. L. Buevoz
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A Double Pass Attachment For The Linear And Plane Mirror Interferometer
Author(s): Richard R. Baldwin; Graham J. Siddall
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Precision Linewidth Measurement Using A Scanning Electron Microscope
Author(s): Dieter G. Seiler; D. Vernon Sulway
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Sem Metrology: Effects Due To Topography And Composition
Author(s): K. Monahan; D. Gates; W. Mah; B. Richardson; J. Wilcox
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Development Of Sem-Based Dedicated Ic Metrology System
Author(s): P. E. Russell; T. Namae; M. Shimada; T. Someya
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Critical Dimension Measurement In The Scanning Electron Microscope
Author(s): Michael T. Postek
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Application Of Electron - Optical Instruments For Measuring Small Pattern Features In Microlithography
Author(s): Reiner Plontke
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Overlay Analysis Of Step-And-Repeat Lithographic Systems For Mask Making
Author(s): L. C. Hsia; L. S. Su; R. L. West
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Measurement Of Optical Performance Of Photolithographic Lenses
Author(s): James E. Webb
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Direct-Write Electron Beam Patterning Reregistration And Metrology
Author(s): William B. Glendinning; Wayne M. Goodreau
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Absolute 2-D Sub-Micron Metrology For Electron Beam Lithography
Author(s): Michael R. Raugh
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Moire Technique For Overlay Metrology
Author(s): T. A. Brunner; S. D. Smith
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