Share Email Print
cover

Proceedings of SPIE Volume 0394

Optical Microlithography II: Technology for the 1980s
Editor(s): Harry L. Stover
Format Member Price Non-Member Price
Softcover $105.00 * $105.00 *

*Available as a photocopy reprint only. Allow two weeks reprinting time plus standard delivery time. No discounts or returns apply.


Volume Details

Volume Number: 0394
Date Published: 7 November 1983
Softcover: 28 papers (257) pages
ISBN: 9780892524297

Table of Contents
show all abstracts | hide all abstracts
"Chemical Safety In The 1980s"
Author(s): Robert L. Raleigh
Show Abstract
Printing Sub-Micron Features Beyond The Normal Ootical Resolution Limit Using A Multi-Level Resist Technique
Author(s): A Marsh
Show Abstract
Contrast Enhancement - A Route To Submicron Optical Lithography
Author(s): Paul R. West; Bruce F. Griffing
Show Abstract
Germanium-Selenium (Ge-Se) Based Resist Systems For Submicron VLSI Application
Author(s): E. Ong; K. L. Tai; R. G. Vadimsky; c. T. Kemmerer
Show Abstract
A Two Layer Photoresist Process In A Production Environment
Author(s): K. Bartlett; G. Hillis; M. Chen; R. Trutna; M. Watts
Show Abstract
Manual Alignment Results Using The Perkin-Elmer M341 And Electron-Beam Masks
Author(s): Alex Wat; Kong-Chen Chen
Show Abstract
Overlay Performance Of The Perkin-Elmer Model 500
Author(s): C. P. Ausschnitt; T. A. Brunner; D. J. Cronin
Show Abstract
Image Matching: A Method For Overlay Error Reduction
Author(s): Ronald E. Chappelow
Show Abstract
Registration Analysis Of 1/10 Steppers, 1/1 Orojections And Their Hybrid
Author(s): S. Uoya; W. Wakamiya; H. Abe; H. Nakata
Show Abstract
Image Placement Differences Between 1:1 Projection Aligners And 10:1 Reduction Wafer Steppers
Author(s): William H. Arnold
Show Abstract
VLSI Lithography Using Canon 1:1 Wafer Stepper
Author(s): Venkat Nagaswami; Gail Ungemach; Wayne Hsueh; Murray Trudel
Show Abstract
Deep Ultraviolet High Resolution Lithography
Author(s): A. W. McCullough; H. Sewell
Show Abstract
Performance Of Merck Selectilux P Positive Photoresist In Aluminium Plasma Etching And High Current Ion Implantation
Author(s): Klaus Thiel
Show Abstract
New Positive Resist Designed For Use In The Mid Ultraviolet
Author(s): R. F. Leonard; W. F. Cordes
Show Abstract
Edge Sharpening, Contrast Enhancement, And Feature Dependent Amplification In Inorganic Resist - A Simulation Study
Author(s): Wingyu Leung; Andrew R. Neureuther; William G. Oldham
Show Abstract
High Resolution Positive Resist Developers: A Technique Or Functional Evaluation And Process Optimization
Author(s): Vic Marriott
Show Abstract
Improved Novolak-Based Photoresist System For Very Large Scale Integration (VLSI) Lithography.
Author(s): F. P. Alvarez; D. J. Elliott; H. F. Sandford; M. W. Legenza
Show Abstract
A New Negative Resist For Deep UV Microlithography
Author(s): M. A. Toukhy; R. F. Leonard
Show Abstract
Microlithography Techniques Using A Microwave Powered Deep UV Source
Author(s): John C. Matthews; Michael G. Ury; Anthony D. Birch; Mitchell A. Lashman
Show Abstract
Impact Of Mask Defects On Integrated Circuits Yield
Author(s): Jacques Le Carpentier
Show Abstract
Yield Detraction In Simple Photoengraving
Author(s): A Marsh
Show Abstract
The Impact On Wafer Probe Yield Of Photomask Inspection Sensitivity
Author(s): George W. Brooks; Robert K. Meister
Show Abstract
Direct Mask Overlay Inspection
Author(s): Liang-Choo Hsia; Lo-Soun Su
Show Abstract
Automated Chrome Blank Inspection: An Investigation Of Raw Plate Defects And Finished Photomask Quality
Author(s): Dale E. Ewbank; Scott M. Ashkenaz
Show Abstract
A Fully Automated Pattern Inspection System For Reticles & Masks
Author(s): Ian A. Cruttwell
Show Abstract
Automatic Inspection For In-Aligner Reticle Qualification
Author(s): H. Liff; R. Brauner; P. Esrig; J. Fee
Show Abstract
Wafer Pattern Defect Detection: An Automatic Inspection Technique
Author(s): Yasushi Uchiyama; Daikichi Awamura; Katsuyoshi Nakashima
Show Abstract
Automatic Wafer Inspection
Author(s): K. Harris; P. Sandland; R. Singleton
Show Abstract

© SPIE. Terms of Use
Back to Top