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Proceedings of SPIE Volume 0393

Electron-Beam, X-Ray and Ion-Beam Techniques for Submicron Lithographies II
Editor(s): Phillip D. Blais
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Volume Details

Volume Number: 0393
Date Published: 7 November 1983
Softcover: 29 papers (250) pages
ISBN: 9780892524280

Table of Contents
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Exposure Characteristics Of Electron Beam Resists For Synchrotron X-Ray Lithography
Author(s): Takeshi Kimura; Kozo Mochiji; Norikazu Tsumita; Hidehito Obayashi; Akira Mikuni
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Multilayer Resist Systems Using Polysiloxanes As Etch Masks
Author(s): J. Paraszczak; J. Shaw; M. Hatzakis; E. Babich; E. Arthur
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Solid State Electron Beam Chemistry
Author(s): J. Pacansky
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Electron Beam Exposure Of GeSex
Author(s): K. J. Polasko; R. F. W. Pease
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Options And Oportunities With Inorganic Photoresist Systems
Author(s): S. A. Lis; J. M . Lavine; G. M . Goldberg; J. I. Masters
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Submicron Optical Lithography Using Inorganic Resists
Author(s): J. M. Lavine; S. A. Lis; J. I. Masters
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Electron Beam Systems At IBM Status Report
Author(s): Edward V. Weber
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Waferwriter: A Process-Compatible Electron Beam Direct Write System
Author(s): W. R. Livesay; J. S. Greeneich; J. E. Wolfe; R. J. Felker
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Accurate Mark Position Detection In High Voltage Electron Beam Lithography
Author(s): Y. Kato; T. Takigawa; M. Yoshimi; K. Kawabuchi; K. Kirita
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Submicron Lithography Radiation Damage In Silicon And Gallium Arsenide ICs
Author(s): D. Howard Phillips
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Theoretical Model For Photoelectron Transport In X-Ray Lithography Systems
Author(s): J. C. Garth
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Submicron X-Ray Replication Technology For Early Application
Author(s): C. R. Fencil; G. P. Hughes
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Status Of X-Ray Lithography At H-P
Author(s): A. P. Neukermans
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X-Ray Lithography Exposures Using Synchrotron Radiation
Author(s): Jerome P. Silverman; Rolf P. Haelbich; Warren D. Grobman; John M. Warlaumont
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A Lithography System For X-Ray Process Development
Author(s): W. Thomas Novak
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X-Ray Lithography On Beam Line III-IV (3°) At SSRL
Author(s): R. Tatchyn; I. Lindau; Y. G. Su; R. Gutcheck; J. Muray; P. L. Csonka
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Liquid Metal Ion Sources For Lithography Some Recent Advances
Author(s): P. D. Prewett; D. J. McMillan; D. K. Jefferies; G. L. R. Mair
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Scanning Ion Beam Lithography For Sub-Micron Structure Fabrication
Author(s): J. R. A. Cleaver; P. J. Heard; H. Ahmed
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Ion-Optical System For Maskless Ion Implantation With 100 nm Resolution
Author(s): N. Anazawa; R. Aihara; E. Ban; M. Okunuki
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A Focused Ion Beam System For The Generation Of Submicron Patterns
Author(s): J. A. Doherty; M. F. Steyer
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Maskless Fabrication Using Focused Ion Beams
Author(s): Kenji Gamo; Susumu Namba
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Applications Of Focused Ion Beams
Author(s): Alfred Wagner
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Status Of The Production Use Of Ion Implantation For IC Manufacture And Requirements For Competitive Application Of Focused Ion Beams
Author(s): Michael I. Current; Alfred Wagner
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Submicron Electron Beam And Optical Lithography Using A Tri-Level Resist Scheme
Author(s): F Buiguez; P. Parrens; B. Picard
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Registration And Distortion Compensating Techniques For A Large Field X-Ray Exposure System
Author(s): B. Fay
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Influence Of Various Electro-Attractive Substituents On The Performances Of Acrylic Type Positive Resists In Microlithography.
Author(s): B. Serre; F. Schue; A. Eranian; E. Datamanti; J. c. Dubois; C. Montginoul; L. Giral
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Optic And X-Ray Lithographies In 1990's
Author(s): J. P. Lazzari; P. Parrens
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X-Ray Lithography Using Synchrotron Radiation And Ion-Beam Shadow Printing
Author(s): A. Heuberger; H. Betz
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Prospects For The 1:1 Electron Image Projector
Author(s): R. Ward; A. R. Franklin; P. Gould; M. J. Plummer; I. H. Lewin
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