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Proceedings of SPIE Volume 0275

Semiconductor Microlithography VI
Editor(s): James W. Dey
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Volume Details

Volume Number: 0275
Date Published: 28 July 1981
Softcover: 29 papers (225) pages
ISBN: 9780892523085

Table of Contents
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Toward Submicron Lithography
Author(s): Mary L. Long
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Submicron Optical Lithography?
Author(s): M. Roussel GCA/Burlington
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Single And Dual Wavelength Exposure Of Photoresist
Author(s): J. LaRue; C. Ting
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Pellicle Protection Of Integrated Circuit (IC) Masks
Author(s): Ron Hershel
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Precision Wafer Stepper Utilizing A Two-Dimensional Optical Encoder
Author(s): Jim Dey
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Laser Scanning Autoalignment In Projection System
Author(s): Akiyoshi Suzuki
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Prospects Of A Plasma Focus Device As An Intense X-Ray Source For Fine Line Lithography
Author(s): B. Kuyel
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Pulsed Plasma Source For X-Ray Lithography
Author(s): S. M. Matthews; R. Stringfield; I. Roth; R. Cooper; N. P. Economou; D. C. Flanders
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Comprehensive Test Sequence For The Electron Beam Exposure System
Author(s): Terrence E. Zavecz
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Mask Fabrication Using Electron Beam Exposure System
Author(s): Y. Watakabe; A. Shigetomi; H. Morimoto; T. Kato
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Simultaneous Transfer Of A Fine Pattern On Two Complementary Or Identical Replicas By X-Ray Lithography
Author(s): E. Rammos; V. Chalmeton; Y. Le Jean
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Automatic Defect Detection: Instrument Comparison And Application
Author(s): R. C. Bracken; S. A. Rizvi; A. E. Reeves
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Automated Wafer Flatness Characterization System
Author(s): Stephen Morgan; Zbigniew Sobczak; Gary Lynch; Lee Reid
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Quantitative Sub-Micrometer Linewidth Determination Using Electron Microscopy
Author(s): Stephen Jensen; Gary Hembree; Jay Marchiando; Dennis Swyt
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Factors Affecting Linewidth Control Including Multiple Wavelength Exposure And Chromatic Aberration
Author(s): A. R. Neureuther; P. K. Jain; W. G . Oldham
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Comparison Of Electron Beam And Optical Projection Lithography In The Region Of One Micrometer
Author(s): T. S. Chang; D. F. Kyser; C. H. Ting
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Simulation Of Edge Location Error
Author(s): Steven C. Gustafson; Philip C. Handorf
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Multilevel Resist For Photolithography Utilizing An Absorbing Dye: Simulation And Experiment
Author(s): M. M. O'Toole; E. D. Liu; M. S. Chang
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Deep-Ultraviolet (UV) Source For Two-Level Resist Technology
Author(s): B. F. Griffing; P. D. Johnson; J. F. Norton
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Simple Metal Lift-Off Process For 1 Micron Al/5% Cu Lines
Author(s): Tom Batchelder
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Processing Of Deep-Ultraviolet (UV) Resists
Author(s): Pieter van Pelt
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Positive Versus Negative: A Photoresist Analysis
Author(s): Peter S. Gwozdz
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Resist Materials For High Resolution Photolithography
Author(s): W. F. Cordes, III; R. F. Leonard
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New Positive Photoresist For Critical Dimension Control
Author(s): Kazuya Kadota; Youichi Taki; Shinji Shimizu
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Electron Beam Resist And Photoresist Behavior Of Polychrome Positive Resist
Author(s): J. N. Helbert; C. C. Walker; P. A. Seese; A. J. Gonzales
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Puddle Development Of Positive Photoresists
Author(s): R. F. Leonard; J. A. McFarland
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Microwave Curing: Is It A Reality?
Author(s): Mary Ann Hockey
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Plasma Etching 1 Phosphorous-Doped Polysilicon Geometries At 30 Kilocycles
Author(s): R. F. Sarkozy
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Cleaning Of Chromium On Glass Photomasks And Reticles
Author(s): David L. Angel; Paul H. Johnson; Scott Ashkenaz
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