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PROCEEDINGS VOLUME 0135

Developments in Semiconductor Microlithography III
Editor(s): Dino R. Ciarlo; James W. Dey; Ken Hoeppner
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Volume Details

Volume Number: 0135
Date Published: 6 September 1978
Softcover: 22 papers (176) pages
ISBN: 9780892521623

Table of Contents
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Effects Of Defocus On Photolithographic Images Obtained With Projection-Printing Systems
Author(s): M. A. Narasimham; J. H. Carter
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High Resolution Lithography Of Charge Coupled Devices (CCDS) Using Projection Printing
Author(s): Edgar D. Lancaster; F. Kub; J. Taylor
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Optical Advances In Projection Photolithography
Author(s): John W. Bossung; Edward S. Muraski
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Partial Coherence In Projection Printing
Author(s): Ronald S. Hershel
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Step And Repeat Wafer Imaging
Author(s): Jeanne Roussel
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A New VLSI Printer
Author(s): Thomas W. Novak
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Laser-Plasma Source For Pulsed X-Ray Lithography
Author(s): D. J. Nagel; R. R. Whitlock; J. R. Greig; R. E. Pechacek; M. C. Peckerar
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Proximity Effect Correction In Vector-Scan Electron-Beam Lithography
Author(s): Carole I . Youngman; Norman D. Wittels
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Development Of A Two-Step E-Beam Lithography Process For Submicron Surface Acoustic Wave (SAW) Device Fabrication
Author(s): D. B. MacDonald; C. F. Shaffer; T. G. Blocker; R. C. Vail
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Latest Developments In High Resolution Aplanetic Holographic Objectives
Author(s): J. P. Laude; D. Lepere
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Ultraviolet Objectives For Submicron Photolithography
Author(s): M. John Buzawa; Anthony R. Phillips
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1 to 3 μm Lithography: How?
Author(s): Jim Dey; Bill Tobey; Peter Moller; Norm Austin; Sam Harrell
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Optical Problems Of Small Geometry Automatic Mask Inspection
Author(s): Kenneth A. Snow
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The Interferometric Analysis Of Flatness By Eye And Computer
Author(s): Charles Edward Synborski
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Photomask Dimensional Measurements And The Clear/Dark Ratio
Author(s): Jeremy Nichols
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Optical Linewidth Measurements On Wafers
Author(s): D. Nyyssonen
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Automatic Width And Overlay Measurement
Author(s): A. L. Flamholz; R. S. Charsky
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One Micron Range Photoresist Imaging: A Practical Approach
Author(s): David J. Elliott; Mary Ann Hockey
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Double-Sided Photolithography
Author(s): R A. Heinz; J T. Chuss; C. M. Schroeder
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In SITU Characterization Of Positive Resist Development
Author(s): W. G. Oldham
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Empirical Statistics For Yield Map Analysis
Author(s): Peter S. Gwozdz
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Adhesion Of Chromium Films To Various Glasses Used In Photomasks
Author(s): Yuji Nakajima; Tetsuro lzumitani; Yasuo Fukuoka
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