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Developments in Semiconductor Microlithography II
Editor(s): James W. Giffin
Format Member Price Non-Member Price
Softcover $105.00 * $105.00 *

*Available as a photocopy reprint only. Allow two weeks reprinting time plus standard delivery time. No discounts or returns apply.

Volume Details

Volume Number: 0100
Date Published: 8 August 1977
Softcover: 23 papers (184) pages
ISBN: 9780892521272

Table of Contents
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Process Control In The Production Of Hard Surface Photomasks
Author(s): Jim Dey; Ken Harrison
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Some Remarks About Linewidth Variations
Author(s): Hans R. Rottmann
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The Use Of An Automatic Mask Inspection System (AMIS) In Photomask Fabrication
Author(s): John G. Skinner
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Automatic Inspection Of Mask Defects
Author(s): Paul Sandland
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Comparison Of Linewidth Measurements On An Sem/Interferometer System And An Optical Linewidth-Measuring Microscope
Author(s): John M. Jerke; Arie W. Hartman; Diana Nyyssonen; Richard E. Swing; Russell D. Young; William J. Keery
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Increasing The Functional Speed Of Positive Photoresist
Author(s): David J. ElIiott
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Dissolution Characterization Of Some Positive Photoresist Systems
Author(s): M. A. Narasimham; J. B. Lounsbury
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The Chemical Nature And Practical Processing Characterization Of Positive Working Photoresists
Author(s): Donald W. Frey
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Effect Of Plastic Deformation Of Silicon Wafers On Overlay
Author(s): R. E. Gegenwarth; F. P. Laming
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Overview Of Advances In Photomask Substrate Flatness Requirements And Flatness Measurement Techniques
Author(s): Raymond F. Leinen
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Projection Printing Characterization
Author(s): John W. Bossung
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Reticles By Automatic Pattern Generation
Author(s): Gerald M. Henriksen
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Computer Optimized Mask Making
Author(s): Jacques Le Carpentier
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Practical Aspects Of Contact/Proximity, Photomask/Wafer Exposure
Author(s): Richard C. Heim
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Future Possibilities Of Dioptric Lenses In Microelectronics
Author(s): Gerhard Ittner
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An Economic View Of Electron Beam Lithography
Author(s): B. P. Piwczyk
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Optical Linewidth Measurements On Silicon And Iron-Oxide Photomasks
Author(s): D. Nyyssonen
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Projection Photolithography Of Large CCD Arrays
Author(s): Don Baylis
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Large Area Masking Techniques For Thin Film Transistor Arrays
Author(s): T. P. Brody
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Microelectronic Device Fabrication With Electron Beam Direct Writing
Author(s): R. C. Henderson
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Integrated Optics Techniques
Author(s): I. P. Kaminow
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X-Ray Lithography For Integrated Circuits - A Review
Author(s): John H. McCoy
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