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Proceedings of SPIE Volume 0080

Developments in Semiconductor Microlithography
Editor(s): James W. Giffin
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Volume Details

Volume Number: 0080
Date Published: 20 September 1976
Softcover: 26 papers (154) pages
ISBN: 9780892521074

Table of Contents
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Development Of Optical Measurement And Control Systems For Photolithography
Author(s): Gerald Bachur
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Photoresist Exposure - Measurement And Control
Author(s): Donald B. Novotny
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Evaluation Of Rank Prismatic Lens
Author(s): Richard A. Rosenthal
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Artwork Mask Generation Of Convex/Concave Regions
Author(s): Larry Widigen
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Dry Cleaning Of 10X Masks
Author(s): H. R. Rottmann
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Simple Step-And-Repeat Precision Copy Camera
Author(s): Berlyn Brixner; Michael Christian
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Improved Microphotographic Systems In The Semiconductor Industry
Author(s): H. Philippaerts; W. Vanassche; R. Duville
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Evaluation Of Photomask Materials And Their Effect On Yield
Author(s): M. K. Stelter; K. H. Paterson
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Line Width Measurement By Diffraction Pattern Analysis
Author(s): Harvey L. Kasdan; Nicholas George
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The Effects Of Operating Parameters On Line-Width Measurements With An Optical Microscope
Author(s): Diana Nyyssonen; John M. Jerke
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The Theoretical Basis Of A New Optical Method For The Accurate Measurement Of Small Line-Widths
Author(s): Richard E. Swing
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Masking With Matched Sets
Author(s): A. H. DePuy
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Overlay Precision For Micron Lithography
Author(s): J. A. Underhill
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Optical Determination Of Semiconductor Device Edge Profiles
Author(s): M. A. Habegger
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Submicron X-Ray Lithography
Author(s): R. K. Watts; D. C. Guterman; H. M. Darley
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Viking Lander Camera
Author(s): Henry McCall
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Viking Lander Camera: Performance Characteristics And Data Reduction Techniques
Author(s): Friedrich O. Huck
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Viking Ground Reconstruction Equipment
Author(s): Robert Penninger
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Laser Interferometers In Microlithography
Author(s): James K. Koch
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Photomask Inspection Techniques For Predicting And Maximizing LSI Yield
Author(s): Mary L. Long; Franklin L. Long
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Photomask Degradation In Contact Printing Of LSI Circuits Onto Silicon Wafers
Author(s): Wayne R. Pratt; M. P. Risen
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New Approaches For High Repeatibility Mask Making And Mask Measuring
Author(s): Hans-Dieter Jacoby
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Mask Inspection - What's It Worth to You?
Author(s): Mel Wright
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Photomask quality problems
Author(s): Reynold M. Shoho
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Photomasks For Micron Geometry Transistors
Author(s): Herb G. Hasemann
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Obtaining A Mask Set - From A Users Point Of View
Author(s): Jamie Van De Ven
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