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Proceedings Paper

Ultra-deep subwavelength periodic patterning through multilayered metamaterial microcavity
Author(s): Jigang Hu; Guanjun Wang; Junxue Chen; Yongqiang Yu; Chunyan Wu; Linbao Luo; Xiangxian Wang; Hai Ming
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Paper Abstract

A designed multilayered metamaterial cavity formed by the metallo-dielectric multilayer structure (MDMS) and a nano Aluminum layer coated substrate is exploited to achieve the sub-20 nm patterns feature sizes at the wavelength of 248 nm with p-polarization. The filtering and SPP cavity resonance coupling provided by this MDMS cavity regime enable the SPP interference patterns with high uniformity and intensity output in the photoresist (PR) layer. Furthermore, compared with the conventional grating metal waveguide structure, this lithography system demonstrates the better stability of patterns period against the cavity thickness variation. The enhancement and the longitudinal extension of SPP localized field offered by the proposed cavity scheme will provide a potential way to obtain the lithography patterns with improved depth, contrast and perpendicularity.

Paper Details

Date Published: 20 November 2012
PDF: 9 pages
Proc. SPIE 8564, Nanophotonics and Micro/Nano Optics, 85641E (20 November 2012); doi: 10.1117/12.999920
Show Author Affiliations
Jigang Hu, Hefei Univ. of Technology (China)
Guanjun Wang, Hefei Univ. of Technology (China)
Junxue Chen, Southwest Univ. of Science and Technology (China)
Yongqiang Yu, Hefei Univ. of Technology (China)
Chunyan Wu, Hefei Univ. of Technology (China)
Linbao Luo, Hefei Univ. of Technology (China)
Xiangxian Wang, Univ. of Science and Technology of China (China)
Hai Ming, Univ. of Science and Technology of China (China)

Published in SPIE Proceedings Vol. 8564:
Nanophotonics and Micro/Nano Optics
Zhiping Zhou; Kazumi Wada, Editor(s)

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