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Proceedings Paper

A cost-effective method for fabricating antireflection structure using self-agglomerated metal nanoparticles as etching mask
Author(s): Xiaoxuan Dong; Su Shen; Renjin Shao; Linsen Chen
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Paper Abstract

A cost-effective method, using reactive ion etch (RIE) process to etch Si with Ag nanoparticle mask for fabricating antireflection structure, is proposed. The formation of Ag nanoparticle adopts wet-chemical method to deposit Ag layer on Si substrate, and then through rapid thermal annealing of Ag at 200°C-600°Crange, Ag nanoparticle were formed on Si substrate. Effects of parameters including etching parameters and deposited factors were investigated. According to analysis result of experiment, a group of high performance antireflection structure parameters was obtained.

Paper Details

Date Published: 20 November 2012
PDF: 8 pages
Proc. SPIE 8564, Nanophotonics and Micro/Nano Optics, 856427 (20 November 2012); doi: 10.1117/12.999910
Show Author Affiliations
Xiaoxuan Dong, Soochow Univ. (China)
Su Shen, Soochow Univ. (China)
Renjin Shao, Soochow Univ. (China)
Linsen Chen, Soochow Univ. (China)


Published in SPIE Proceedings Vol. 8564:
Nanophotonics and Micro/Nano Optics
Zhiping Zhou; Kazumi Wada, Editor(s)

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