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Proceedings Paper

Computer simulation and optimization design of the holographic photonic crystal template fabrication process
Author(s): Ying Liu
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Paper Abstract

According to the holographic theory, the influence factors in fabricating photonic crystal templates in photoresist such as the arrangement of interference beam, exposure and developing process and the polarization direction adjustment were discussed in this paper. The fabrication process was simulated by computer program and the optimization parameters of fabricating three-dimensional photonic crystal templates in photoresist were presented.

Paper Details

Date Published: 26 November 2012
PDF: 6 pages
Proc. SPIE 8556, Holography, Diffractive Optics, and Applications V, 85561C (26 November 2012); doi: 10.1117/12.999715
Show Author Affiliations
Ying Liu, Academy of Armored Force Engineering (China)


Published in SPIE Proceedings Vol. 8556:
Holography, Diffractive Optics, and Applications V
Yunlong Sheng; Chongxiu Yu; Linsen Chen, Editor(s)

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