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Proceedings Paper

Absorption modulation enhancement of Azo-polymer film induced by plasmonic field
Author(s): Xiangxian Wang; Douguo Zhang; Qiang Fu; Hai Ming; Wenxuan Wu; Qijin Zhang
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Paper Abstract

A thin photochromic film on top of the resist layer can be used as a virtual mask to fabricate super-resolution lithography patterns. In this letter, based on the azobenzene polymer, the absorption intensity of the 365nm LED is effectively modulated by 532nm laser, the modulation degree reaches to 87%.When the silver nanocubes are dropped onto the surface of the polymer film, the modulation degree is significantly higher than that without the nanoparticles in the same intensity of 532nm laser due to the field enhancement of excitation of surface plasmons. The absorption modulation features of the polymer film are favorable for the further smaller line width nanolithography.

Paper Details

Date Published: 27 November 2012
PDF: 7 pages
Proc. SPIE 8555, Optoelectronic Devices and Integration IV, 85550B (27 November 2012); doi: 10.1117/12.999639
Show Author Affiliations
Xiangxian Wang, Univ. of Science and Technology of China (China)
ChaoHu College (China)
Douguo Zhang, Univ. of Science and Technology of China (China)
Qiang Fu, Univ. of Science and Technology of China (China)
Hai Ming, Univ. of Science and Technology of China (China)
Wenxuan Wu, Univ. of Science and Technology of China (China)
Qijin Zhang, Univ. of Science and Technology of China (China)


Published in SPIE Proceedings Vol. 8555:
Optoelectronic Devices and Integration IV
Xuping Zhang; Hai Ming; Joel M. Therrien, Editor(s)

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