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Proceedings Paper

Effects of grating marks parameters on lithography alignment precision
Author(s): Jiangping Zhu; Song Hu; Junsheng Yu
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Paper Abstract

Effects of grating marks parameters on alignment precision and scope are investigated in this paper. In the lithography alignment method based on moiré fringe, gratings are especially used as alignment marks. However, the rational design of grating marks for this approach to realize high-precision alignment is of great importance. In order to improve the feasibility of the alignment method, effects of several physical parameters of grating marks on alignment precision are analyzed by numerical calculation. The results imply that qualities of grating marks, such as size of period and ratio between two gratings, have an important impact on alignment precision and scope.

Paper Details

Date Published: 20 November 2012
PDF: 7 pages
Proc. SPIE 8564, Nanophotonics and Micro/Nano Optics, 85641K (20 November 2012); doi: 10.1117/12.999503
Show Author Affiliations
Jiangping Zhu, Institute of Optics and Electronics (China)
Univ. of Electronic Science and Technology of China (China)
Graduate Univ. of the Chinese Academy of Sciences (China)
Song Hu, Institute of Optics and Electronics (China)
Junsheng Yu, Univ. of Electronic Science and Technology of China (China)


Published in SPIE Proceedings Vol. 8564:
Nanophotonics and Micro/Nano Optics
Zhiping Zhou; Kazumi Wada, Editor(s)

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