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Proceedings Paper

Improvement of 100-nm hole pattern size uniformity in SR lithography
Author(s): Teruhiko Kumada; Hiroaki Sumitani; Yukiko Kikuchi; Yasuji Matsui
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Paper Details

Date Published:
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Proc. SPIE 3997, Emerging Lithographic Technologies IV, ; doi: 10.1117/12.998890
Show Author Affiliations
Teruhiko Kumada, Association of Super-Advanced Electronics Technologies (Japan)
Hiroaki Sumitani, Association of Super-Advanced Electronics Technologies (Japan)
Yukiko Kikuchi, Association of Super-Advanced Electronics Technologies (Japan)
Yasuji Matsui, Association of Super-Advanced Electronics Technologies (Japan)


Published in SPIE Proceedings Vol. 3997:
Emerging Lithographic Technologies IV
Elizabeth A. Dobisz, Editor(s)

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