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Proceedings Paper

Optimizing laser pattern generator performance via optical lithography simulation
Author(s): Mike Pochkowski; Henry Chris Hamaker; Gregory Valentin; Benjamen M. Rathsack; Cyrus Emil Tabery; C. Grant Willson
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Date Published:
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Proc. SPIE 3873, 19th Annual Symposium on Photomask Technology, ; doi: 10.1117/12.997703
Show Author Affiliations
Mike Pochkowski, Etec Systems, Inc. (United States)
Henry Chris Hamaker, Etec Systems, Inc. (United States)
Gregory Valentin, Etec Systems, Inc. (United States)
Benjamen M. Rathsack, Univ. of Texas/Austin (United States)
Cyrus Emil Tabery, Univ. of Texas/Austin (United States)
C. Grant Willson, Univ. of Texas/Austin (United States)


Published in SPIE Proceedings Vol. 3873:
19th Annual Symposium on Photomask Technology
Frank E. Abboud; Brian J. Grenon, Editor(s)

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