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Proceedings Paper

Understanding effects of reticle lithography platform on CD control and wafer-induced CD errors
Author(s): Mircea V. Dusa; Robert John Socha; Matt Hankinson; Will Conley; Paul S. Chipman; Rosetta Costantino; Hugo A. Villa; J. Fung Chen
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Proc. SPIE 3873, 19th Annual Symposium on Photomask Technology, ; doi: 10.1117/12.997702
Show Author Affiliations
Mircea V. Dusa, National Semiconductor Corp. (United States)
Robert John Socha, National Semiconductor Corp. (United States)
Matt Hankinson, National Semiconductor Corp. (United States)
Will Conley, National Semiconductor Corp. (United States)
Paul S. Chipman, DuPont Photomasks, Inc. (United States)
Rosetta Costantino, DuPont Photomasks, Inc. (United States)
Hugo A. Villa, DuPont Photomasks, Inc. (United States)
J. Fung Chen, ASML MaskTools (United States)


Published in SPIE Proceedings Vol. 3873:
19th Annual Symposium on Photomask Technology
Frank E. Abboud; Brian J. Grenon, Editor(s)

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