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Proceedings Paper

Proximity effect correction with EM iteration algorithm
Author(s): Shuang-ren Zhao; Thomas Waas; Hans Hartmann
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Date Published:
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Proc. SPIE 3748, Photomask and X-Ray Mask Technology VI, ; doi: 10.1117/12.996490
Show Author Affiliations
Shuang-ren Zhao, aiss GmbH (Germany)
Thomas Waas, aiss GmbH (Germany)
Hans Hartmann, aiss GmbH (Germany)


Published in SPIE Proceedings Vol. 3748:
Photomask and X-Ray Mask Technology VI
Hiroaki Morimoto, Editor(s)

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