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Proceedings Paper

Sub-100-nm isolated line formation for logic device with KrF lithography
Author(s): Shuji Nakao; Tohru Kanai; Hirosi Matsubara; Kouichirou Tsujita; Wataru Wakamiya
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Proc. SPIE 3679, Optical Microlithography XII, ; doi: 10.1117/12.996122
Show Author Affiliations
Shuji Nakao, Mitsubishi Electric Corp. (Japan)
Tohru Kanai, Mitsubishi Electric Corp. (Japan)
Hirosi Matsubara, Mitsubishi Electric Corp. (Japan)
Kouichirou Tsujita, Mitsubishi Electric Corp. (Japan)
Wataru Wakamiya, Mitsubishi Electric Corp. (Japan)


Published in SPIE Proceedings Vol. 3679:
Optical Microlithography XII
Luc Van den Hove, Editor(s)

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