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Proceedings Paper

Characterizing optical proximity effect in defocus condition
Author(s): Chungwei Hsu; Ronfu Chu; Dunkirk Tsung
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Proc. SPIE 3679, Optical Microlithography XII, ; doi: 10.1117/12.996121
Show Author Affiliations
Chungwei Hsu, Nanya Technology Co., Ltd. (Taiwan)
Ronfu Chu, Nan Ya Technologies Co. (Taiwan)
Dunkirk Tsung, Nanya Technology Co., Ltd. (Taiwan)


Published in SPIE Proceedings Vol. 3679:
Optical Microlithography XII
Luc Van den Hove, Editor(s)

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