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Proceedings Paper

New family of nonchemically amplified resists for mask making applications
Author(s): Ari Aviram; Marie Angelopoulos; Edward D. Babich; Karen E. Petrillo; Thomas B. Faure
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Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, ; doi: 10.1117/12.994930
Show Author Affiliations
Ari Aviram, IBM Thomas J. Watson Research Ctr. (United States)
Marie Angelopoulos, IBM Thomas J. Watson Research Ctr. (United States)
Edward D. Babich, IBM Thomas J. Watson Research Ctr. (United States)
Karen E. Petrillo, IBM Thomas J. Watson Research Ctr. (United States)
Thomas B. Faure, IBM Microelectronics Div. (United States)


Published in SPIE Proceedings Vol. 3546:
18th Annual BACUS Symposium on Photomask Technology and Management
Brian J. Grenon; Frank E. Abboud, Editor(s)

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