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Proceedings Paper

Enhancement and reduction of soft x-ray emission from a two pulse produced line silicon plasma
Author(s): Ruxin Li; Pinzhong Fan; Zhengquan Zhang; Zhizhan Xu
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Proc. SPIE 3443, X-Ray and Ultraviolet Spectroscopy and Polarimetry II, ; doi: 10.1117/12.994152
Show Author Affiliations
Ruxin Li, Univ. of Tokyo (Japan)
Pinzhong Fan, Shanghai Institute of Optics and Fine Mechanics (China)
Zhengquan Zhang, Shanghai Institute of Optics and Fine Mechanics (China)
Zhizhan Xu, Shanghai Institute of Optics and Fine Mechanics (China)


Published in SPIE Proceedings Vol. 3443:
X-Ray and Ultraviolet Spectroscopy and Polarimetry II
Silvano Fineschi, Editor(s)

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