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Proceedings Paper

Analysis of optical aberrations on high-NA production steppers
Author(s): Steve K. Brainerd; Douglas A. Bernard; Juan C. Rey; Jiangwei Li; Victor V. Boksha
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Proc. SPIE 3332, Metrology, Inspection, and Process Control for Microlithography XII, ; doi: 10.1117/12.993165
Show Author Affiliations
Steve K. Brainerd, Maxim Integrated Products (United States)
Douglas A. Bernard, Technology Modeling Associates, Inc. (United States)
Juan C. Rey, Technology Modeling Associates, Inc. (United States)
Jiangwei Li, Technology Modeling Associates, Inc. (United States)
Victor V. Boksha, Technology Modeling Associates, Inc. (United States)


Published in SPIE Proceedings Vol. 3332:
Metrology, Inspection, and Process Control for Microlithography XII
Bhanwar Singh, Editor(s)

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